公开(公告)号：US20250021022A1

公开(公告)日：2025-01-16

申请号：US18682883

申请日：2021-07-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Tiannan GUAN ,  Zhuangxiong HUANG ,  Johannes Bernardus Charles ENGELEN ,  Günes NAKIBOGLU ,  Matthias KRUIZINGA ,  Petrus Jacobus Maria VAN GILS ,  Aldo TRALLI ,  Sjoerd Frans DE VRIES ,  Marcel Maria Cornelius Franciscus TEUNISSEN ,  Richard Joseph BRULS ,  Frits VAN DER MEULEN

IPC: G03F7/00

Abstract: The invention relates to an electrostatic holder comprising: a body, and a clamping element attached to the body, said clamping element comprising an electrode for applying an attractive force between the clamping element and a first to be clamped object, wherein an outer edge of the body is configured to provide a gap between the outer edge of the body and the first to be clamped object, which gap is configured for outputting a fluid for reducing dust particles reaching the first to be clamped object or a second to be clamped object on an opposite side of the holder.

公开(公告)号：US20170131643A1

公开(公告)日：2017-05-11

申请号：US15029565

申请日：2015-06-03

Applicant: ASML Netherlands B.V.

Inventor： Paul JANSSEN ,  Richard Joseph BRULS ,  Petrus Jacobus Maria VAN GILS

IPC: G03F7/20

CPC classification number: G03F7/70708 ,  G03F7/707 ,  G03F7/70783 ,  G03F7/70866 ,  G03F7/70916 ,  H01L21/6831 ,  H01L21/6875

Abstract: A lithographic apparatus includes a first object holder and a second object holder. The first object holder is arranged to hold an object at a holder-facing surface. The object has the holder-facing surface. The second object holder is arranged to hold the object at the holder-facing surface. The lithographic apparatus is arranged to deform a contaminating particle at the holder-facing surface more when the object is held at the second object holder than when the object is held at the first object holder.