公开(公告)号：US20230063156A1

公开(公告)日：2023-03-02

申请号：US17794897

申请日：2020-12-24

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Ronald Peter ALBRIGHT ,  Kursat BAL ,  Vadim Yevgenyevich BANINE ,  Richard Joseph BRULS ,  Sjoerd Frans DE VRIES ,  Olav Waldemar Vladimir FRIJNS ,  Yang-Shan HUANG ,  Zhuangxiong HUANG ,  Johannes Henricus Wilhelmus JACOBS ,  Johannes Hubertus Josephina MOORS ,  Georgi Nanchev NENCHEV ,  Andrey NIKIPELOV ,  Thomas Maarten RAASVELD ,  Manish RANJAN ,  Edwin TE SLIGTE ,  Karl Robert UMSTADTER ,  Eray UZGÖREN ,  Marcus Adrianus VAN DE KERKHOF ,  Parham YAGHOOBI

IPC: G03F7/20

Abstract: An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus.

公开(公告)号：US20230083834A1

公开(公告)日：2023-03-16

申请号：US17909348

申请日：2021-03-01

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Joseph Harry LYONS ,  Jimi HENDRIKS ,  Ping ZHOU ,  Zhuangxiong HUANG ,  Reinier Theodorus Martinus JILISEN

IPC: G03F7/20

Abstract: Embodiments herein describe methods, devices, and systems for rupture detection and end-of-life monitoring of dynamic gas lock (DGL) membranes and pupil facet mirrors in lithographic apparatuses. A method for detecting rupture of a dynamic gas lock membrane in a lithographic apparatus includes illuminating the dynamic gas lock membrane with a measurement beam using a radiation source, in which the dynamic gas lock membrane is arranged between a wafer and projection optics of the lithography apparatus, and determining whether any radiation from the measurement beam is reflected from the dynamic gas lock membrane by using reflection collection optics, in which the reflection collection optics are arranged above the dynamic gas lock membrane. A rupture in the dynamic gas lock membrane is detected if no radiation is reflected from the dynamic gas lock membrane. If radiation is reflected from the dynamic gas lock membrane, the dynamic gas lock membrane is not ruptured.

公开(公告)号：US20230205102A1

公开(公告)日：2023-06-29

申请号：US18008409

申请日：2021-04-30

Applicant: ASML Netherlands B.V.

Inventor： José Nilton FONSECA JUNIOR ,  Franciscus Johannes Leonardus HEUTZ ,  Zhuangxiong HUANG ,  Ferdy MIGCHELBRINK

IPC: G03F7/20 ,  G02B27/00

CPC classification number: G03F7/70933 ,  G02B27/0006 ,  G03F7/70833

Abstract: The present invention provides a fluid purging system (100) for an optical element (30), comprising a ring and a fluid supply system (40). The ring being formed of a body entirely surrounding the optical element, the ring defining a space (5) radially inwards thereof and adjacent to the optical element. The ring is formed by at least one first wall portion (10) and at least one second wall portion (20A;20B), wherein an average height of the first wall portion is greater than an average height of the second wall portion. The fluid supply system is positioned radially outwards of the ring and configured to supply fluid to pass over the at least one second wall portion to the space.

公开(公告)号：US20250021022A1

公开(公告)日：2025-01-16

申请号：US18682883

申请日：2021-07-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Tiannan GUAN ,  Zhuangxiong HUANG ,  Johannes Bernardus Charles ENGELEN ,  Günes NAKIBOGLU ,  Matthias KRUIZINGA ,  Petrus Jacobus Maria VAN GILS ,  Aldo TRALLI ,  Sjoerd Frans DE VRIES ,  Marcel Maria Cornelius Franciscus TEUNISSEN ,  Richard Joseph BRULS ,  Frits VAN DER MEULEN

IPC: G03F7/00

Abstract: The invention relates to an electrostatic holder comprising: a body, and a clamping element attached to the body, said clamping element comprising an electrode for applying an attractive force between the clamping element and a first to be clamped object, wherein an outer edge of the body is configured to provide a gap between the outer edge of the body and the first to be clamped object, which gap is configured for outputting a fluid for reducing dust particles reaching the first to be clamped object or a second to be clamped object on an opposite side of the holder.

公开(公告)号：US20230314964A1

公开(公告)日：2023-10-05

申请号：US18001256

申请日：2021-05-10

Applicant: ASML Netherlands B.V.

Inventor： José Nilton FONSECA JUNIOR ,  Zhuangxiong HUANG ,  Franciscus Johannes Leonardus HEUTZ ,  Ferdy MIGCHELBRINK ,  Henricus Anita Jozef Wilhelmus VAN DE VEN ,  Ramo OMEROVIC ,  Emericus Antoon Theodorus VAN DEN AKKER

IPC: G03F7/20 ,  G03F1/48 ,  G03F1/46

CPC classification number: G03F7/70933 ,  G03F7/70958 ,  G03F7/70808 ,  G03F1/48 ,  G03F1/46

Abstract: The present invention provides a fluid purging system (100) for an optical element (120), comprising a fluid guiding unit arranged to guide a fluid, provided by a fluid supply system, over at least a curved portion of an optical surface (122) of the optical element. The fluid guiding unit comprises a fluid inlet and a first nozzle unit (110) for providing a fluid to the optical surface. The fluid guiding unit being formed by at least a first wall portion (102) and at least a second wall portion (104), wherein the second wall portion being configured to face the optical surface and to follow a contour of the optical surface. The second wall portion comprises a second nozzle unit (112).

公开(公告)号：US20250060681A1

公开(公告)日：2025-02-20

申请号：US18721251

申请日：2022-12-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Dzmitry LABETSKI ,  Emericus Antoon Theodorus VAN DEN AKKER ,  Joost DE HOOGH ,  Zhuangxiong HUANG ,  Sjoerd Frans DE VRIES ,  Syed Aaquib HAZARI

IPC: G03F7/00

Abstract: A system for use in a lithographic, the system includes: a substrate table; another device; and at least one deformable partition. The substrate table (for example a wafer stage) is arranged to support a substrate. The system is configurable in a first configuration such that a surface of the device faces and is adjacent to the substrate and the substrate table. The at least one deformable partition either: (a) extends partially from the substrate table towards the surface of the device when the system is in the first configuration; or (b) extends partially from the surface of the device that faces and is adjacent to the substrate and the substrate table when the system is in the first configuration towards the substrate table.

公开(公告)号：US20230305407A1

公开(公告)日：2023-09-28

申请号：US18018065

申请日：2021-07-06

Applicant: ASML Netherlands B.V.

Inventor： Fei LIU ,  Jin LIAN ,  Zhuangxiong HUANG ,  Laurentius Cornelius DE WINTER ,  Frank STAALS

IPC: G03F7/20 ,  G01N21/47 ,  G03F7/00

CPC classification number: G03F7/70641 ,  G01N21/4738 ,  G01N21/4788 ,  G03F7/706851

Abstract: Disclosed is a method for focus measurement of a lithographic process. The method comprises receiving a substrate on which a metrology pattern has been printed with a lithographic apparatus with an illumination pupil, illuminating the metrology pattern with a metrology tool to measure a signal based on radiation scattered by the metrology pattern, and determining or monitoring a focus of the lithographic process based on the measured signal. Position of at least part of the metrology pattern is focus dependent. At least part of the metrology pattern has been printed by the lithography apparatus with an angular asymmetric illumination pupil.