公开(公告)号：WO2019037953A1

公开(公告)日：2019-02-28

申请号：PCT/EP2018/069265

申请日：2018-07-16

Applicant: ASML NETHERLANDS B.V.

Inventor： LI, Fahong ,  GARCIA GRANDA, Miguel ,  LUIJTEN, Carlo, Cornelis, Maria ,  SEGERS, Bart, Peter, Bert ,  VAN DER POEL, Cornelis, Andreas, Franciscus, Johannes ,  STAALS, Frank ,  VAN OOSTEN, Anton, Bernhard ,  RIDANE, Mohamed

IPC: G03F7/20

Abstract: Focus performance of a lithographic apparatus is measured using pairs of targets that have been exposed (1110) with an aberration setting (e.g. astigmatism) that induces a relative best focus offset between them. A calibration curve (904) is obtained in advance by exposing similar targets on FEM wafers (1174, 1172). In a set-up phase, calibration curves are obtained using multiple aberration settings, and an anchor point (910) is recorded, where all the calibration curves intersect. When a new calibration curve is measured (1192), the anchor point is used to produce an adjusted updated calibration curve (1004') to cancel focus drift and optionally to measure drift of astigmatism. Another aspect of the disclosure (Fig. 13-15) uses two aberration settings (+AST, -AST) in each measurement, reducing sensitivity to astigmatism drift. Another aspect (Fig. 16-17) uses pairs of targets printed with relative focus offsets, by double exposure in one resist layer.

公开(公告)号：EP4361727A1

公开(公告)日：2024-05-01

申请号：EP22203387.0

申请日：2022-10-24

Applicant: ASML Netherlands B.V.

Inventor： ANUNCIADO, Roy ,  DZAFIC, Harun ,  RIDANE, Mohamed

IPC: G03F7/20

CPC classification number: G03F7/70633 ,  G03F7/70525 ,  G03F7/70625 ,  G03F7/70683

Abstract: Disclosed is metrology method comprising: obtaining metrology data relating to a measurement of at least one target, each said at least one target comprising a plurality of features; said metrology data describing a placement error of one or more pairs of corresponding features of said at least one target, each one or more pairs of corresponding features comprising pairs of features which are substantially equidistant from a reference point on the target in a measurement direction of the target; determining an asymmetric component of said placement error from said metrology data; and determining a tilt parameter from said asymmetric component.