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公开(公告)号：WO2016134892A2
公开(公告)日：2016-09-01
申请号：PCT/EP2016/051174
申请日：2016-01-21
Applicant: ASML NETHERLANDS B.V.
Inventor： DE VRIES, Gosse, Charles , DONKER, Rilpho, Ludovicus , NIENHUYS, Han-Kwang , VAN OOSTEN, Anton, Bernhard , KRUIZINGA, Borgert
CPC classification number: G03F7/70158 , G02B5/1861 , G02B27/4222 , G02B27/4255 , G03F7/702 , G03F7/70558 , G03F7/70991
Abstract: An apparatus for receiving an input radiation beam at a beam receiving location and outputting from the beam receiving location one or more output radiation beams. The apparatus comprises: an optical element; and a movement mechanism. The optical element comprises a plurality of portions for receiving the input radiation beam. The movement mechanism is operable to move the plurality of portions so as selectively position each of the plurality of portions at the beam receiving location. When one of the plurality of portions is disposed in the beam receiving location it is configured to receive the input radiation beam and to scatter the input radiation beam so as to form the one or more output radiation beams. A direction of each of the one or more output radiation beams formed by each of the plurality of portions is substantially the same as a direction of a corresponding output radiation beam formed by each of the other portions. One or more properties of each of the plurality of portions differs from that of the other portions such that a power of at least one of the one or more output radiation beams formed by each of the plurality of portions is different to that of the corresponding output radiation beam formed by at least one of the other portions.
Abstract translation: 一种用于在光束接收位置接收输入辐射光束并从光束接收位置输出一个或多个输出辐射光束的设备。 该设备包括：光学元件; 和一个运动机制。 光学元件包括用于接收输入辐射束的多个部分。 移动机构可操作以移动多个部分，从而选择性地将多个部分中的每一个定位在光束接收位置处。 当多个部分中的一个部分布置在光束接收位置时，其被配置为接收输入辐射束并散射输入辐射束以形成一个或多个输出辐射束。 由多个部分中的每一个形成的一个或多个输出辐射束中的每一个的方向基本上与由其他部分中的每一个形成的对应的输出辐射束的方向相同。 多个部分中的每个部分的一个或多个特性不同于其他部分的特性，使得由多个部分中的每个部分形成的一个或多个输出辐射束中的至少一个的功率不同于对应输出 辐射束由至少一个其他部分形成。
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2.发明申请INSPECTION APPARATUS, INSPECTION METHOD, LITHOGRAPHIC APPARATUS, PATTERNING DEVICE AND MANUFACTURING METHOD 审中-公开检查装置，检查方法，平面设备，绘图装置和制造方法
公开(公告)号：WO2016198283A1
公开(公告)日：2016-12-15
申请号：PCT/EP2016/062259
申请日：2016-05-31
Applicant: ASML NETHERLANDS B.V.
Inventor： VAN OOSTEN, Anton, Bernhard , HINNEN, Paul, Christiaan , DE KRUIF, Robertus, Cornelis, Martinus , SOCHA, Robert, John
CPC classification number: G03F7/70558 , G03F1/44 , G03F7/70516 , G03F7/70525 , G03F7/70625 , G03F7/70641
Abstract: Disclosed is a method of monitoring a focus parameter during a lithographic process. The method comprises acquiring first and second measurements of, respectively first and second targets, wherein the first and second targets have been exposed with a relative best focus offset. The method then comprises determining the focus parameter from first and second measurements. Also disclosed are corresponding measurement and lithographic apparatuses, a computer program and a method of manufacturing devices.
Abstract translation: 公开了一种在光刻工艺期间监测焦点参数的方法。 该方法包括获取第一和第二目标的第一和第二测量，其中第一和第二目标已经以相对最佳的聚焦偏移曝光。 该方法然后包括从第一和第二测量确定焦点参数。 还公开了相应的测量和光刻设备，计算机程序和制造设备的方法。
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公开(公告)号：WO2019121486A1
公开(公告)日：2019-06-27
申请号：PCT/EP2018/085159
申请日：2018-12-17
Applicant: ASML NETHERLANDS B.V.
Inventor： SLACHTER, Abraham , HUNSCHE, Stefan , TEL, Wim, Tjibbo , VAN OOSTEN, Anton, Bernhard , VAN INGEN SCHENAU, Koenraad , RISPENS, Gijsbert , PETERSON, Brennan
IPC: G03F7/20
Abstract: Described herein is a method. The method includes steps for obtaining (i) measurements of a parameter of the feature, (ii) data related to a process variable of a patterning process, (iii) a functional behavior of the parameter defined as a function of the process variable based on the measurements of the parameter and the data related to the process variable, (iv) measurements of a failure rate of the feature, and (v) a probability density function of the process variable for a setting of the process variable, converting the probability density function of the process variable to a probability density function of the parameter based on a conversion function, where the conversion function is determined based on the function of the process variable, and determining a parameter limit of the parameter based on the probability density function of the parameter and the measurements of the failure rate.
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4.发明申请INSPECTION APPARATUS, INSPECTION METHOD, LITHOGRAPHIC APPARATUS AND MANUFACTURING METHOD 审中-公开检验设备，检验方法，平面设备和制造方法
公开(公告)号：WO2017016839A1
公开(公告)日：2017-02-02
申请号：PCT/EP2016/066110
申请日：2016-07-07
Applicant: ASML NETHERLANDS B.V.
Inventor： STAALS, Frank , LUIJTEN, Carlo, Cornelis, Maria , HINNEN, Paul, Christiaan , VAN OOSTEN, Anton, Bernhard
IPC: G03F7/20
CPC classification number: G03F7/70633 , G01B11/02 , G01B11/272 , G01B2210/56 , G03F7/70625 , G03F7/70641
Abstract: Disclosed is a method of monitoring a lithographic process parameter, such as focus and/or dose, of a lithographic process. The method comprises acquiring a first and a second target measurement using respectively a first measurement configuration and a second measurement configuration, and determining the lithographic process parameter from a first metric derived from said first target measurement and said second target measurement. The first metric may be difference. Also disclosed are corresponding measurement and lithographic apparatuses, a computer program and a method of manufacturing devices.
Abstract translation: 公开了一种监测光刻工艺参数的方法，例如光刻工艺的焦点和/或剂量。 该方法包括分别采用第一测量配置和第二测量配置获取第一和第二目标测量，以及根据从所述第一目标测量和所述第二目标测量导出的第一度量来确定光刻处理参数。 第一个度量可能是不同的。 还公开了相应的测量和光刻设备，计算机程序和制造设备的方法。
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5.发明申请
公开(公告)号：WO2019233738A1
公开(公告)日：2019-12-12
申请号：PCT/EP2019/062767
申请日：2019-05-17
Applicant: ASML NETHERLANDS B.V.
Inventor： TRIPODI, Lorenzo , WARNAAR, Patrick , GRZELA, Grzegorz , HAJIAHMADI, Mohammadreza , FARHADZADEH, Farzad , TINNEMANS, Patricius, Aloysius Jacobus , MIDDLEBROOKS, Scott, Anderson , KOOPMAN, Adrianus, Cornelis, Matheus , STAALS, Frank , PETERSON, Brennan , VAN OOSTEN, Anton, Bernhard
IPC: G03F7/20
Abstract: Disclosed is a method of determining a characteristic of interest relating to a structure on a substrate formed by a lithographic process, the method comprising: obtaining an input image of the structure; and using a trained neural network to determine the characteristic of interest from said input image. Also disclosed is a reticle comprising a target forming feature comprising more than two sub-features each having different sensitivities to a characteristic of interest when imaged onto a substrate to form a corresponding target structure on said substrate. Related methods and apparatuses are also described.
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Patent Agency Ranking
公开(公告)号：WO2019048147A1
公开(公告)日：2019-03-14
申请号：PCT/EP2018/071103
申请日：2018-08-03
Applicant: ASML NETHERLANDS B.V.
Inventor： DE WINTER, Laurentius, Cornelius , STOLK, Roland, Pieter , STAALS, Frank , VAN OOSTEN, Anton, Bernhard , HINNEN, Paul, Christiaan , JOCHEMSEN, Marinus , THEEUWES, Thomas , VAN SETTEN, Eelco
Abstract: Disclosed is a method of measuring focus performance of a lithographic apparatus, and corresponding patterning device and lithographic apparatus. The method comprises using the lithographic apparatus to print one or more first printed structures and second printed structures. The first printed structures are printed by illumination having a first non-telecentricity and the second printed structures being printed by illumination having a second non-telecentricity, different to said first non-telecentricity. A focus dependent parameter related to a focus- dependent positional shift between the first printed structures and the second printed structures on said substrate is measured and a measurement of focus performance based at least in part on the focus dependent parameter is derived therefrom.
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公开(公告)号：WO2019037953A1
公开(公告)日：2019-02-28
申请号：PCT/EP2018/069265
申请日：2018-07-16
Applicant: ASML NETHERLANDS B.V.
Inventor： LI, Fahong , GARCIA GRANDA, Miguel , LUIJTEN, Carlo, Cornelis, Maria , SEGERS, Bart, Peter, Bert , VAN DER POEL, Cornelis, Andreas, Franciscus, Johannes , STAALS, Frank , VAN OOSTEN, Anton, Bernhard , RIDANE, Mohamed
IPC: G03F7/20
Abstract: Focus performance of a lithographic apparatus is measured using pairs of targets that have been exposed (1110) with an aberration setting (e.g. astigmatism) that induces a relative best focus offset between them. A calibration curve (904) is obtained in advance by exposing similar targets on FEM wafers (1174, 1172). In a set-up phase, calibration curves are obtained using multiple aberration settings, and an anchor point (910) is recorded, where all the calibration curves intersect. When a new calibration curve is measured (1192), the anchor point is used to produce an adjusted updated calibration curve (1004') to cancel focus drift and optionally to measure drift of astigmatism. Another aspect of the disclosure (Fig. 13-15) uses two aberration settings (+AST, -AST) in each measurement, reducing sensitivity to astigmatism drift. Another aspect (Fig. 16-17) uses pairs of targets printed with relative focus offsets, by double exposure in one resist layer.
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公开(公告)号：WO2020038756A1
公开(公告)日：2020-02-27
申请号：PCT/EP2019/071614
申请日：2019-08-12
Applicant: ASML NETHERLANDS B.V.
Inventor： VAN OOSTEN, Anton, Bernhard
Abstract: Described herein is a method for reducing apparatus performance variation. The method includes obtaining (i) a reference performance (e.g., CD) of a reference apparatus (e.g., a reference scanner), (ii) a set of initial leading degrees of freedom selected from a plurality of degrees of freedom of a plurality of pupil facet mirrors of an apparatus (e.g., to be matched scanner) that is selected to reproduce the reference performance, and (iii) exposure data related to one or more parameters (e.g., CD, overlay, focus, etc.) of the patterning process indicating a performance of the apparatus based on the set of initial leading degrees of freedom; and determining a matching pupil of the apparatus based on the set of initial leading degrees of freedom and the exposure data such that the matching pupil reduces a difference between the performance of the apparatus and the reference performance.
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公开(公告)号：WO2019162280A1
公开(公告)日：2019-08-29
申请号：PCT/EP2019/054110
申请日：2019-02-19
Applicant: ASML NETHERLANDS B.V.
Inventor： VAN OOSTEN, Anton, Bernhard , VAENKATESAN, Vidya , WILEY, James, Norman , PLUG, Reinder, Teun
Abstract: Described herein is a method for inspection of a patterning device. The method includes obtaining (i) patterning device apparatus data of a patterning device making process, (ii) a patterning device substrate map based on the patterning device apparatus data, and (iii) predicted process window limiting pattern locations corresponding to the patterning device based on the patterning device substrate map, and based on the process window limiting pattern locations, guiding, by a hardware computer system, a patterning device inspection apparatus to the process window limiting pattern locations for defect inspection.
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公开(公告)号：WO2019115426A1
公开(公告)日：2019-06-20
申请号：PCT/EP2018/084100
申请日：2018-12-10
Applicant: ASML NETHERLANDS B.V.
Inventor： LA FONTAINE, Bruno , VAN OOSTEN, Anton, Bernhard , CHEONG, Lin, Lee , GENIN, Maxime, Philippe, Frederic
Abstract: A method including: obtaining a value of a characteristic of a physical item instance of a physical system or object, using a non-probabilistic model; obtaining an attribute of a distribution of a residue of the non-probabilistic model with respect to an ensemble of physical item instances that is based on an attribute of a distribution of a residue of the non-probabilistic model with respect to at least one physical item instance corresponding to at least one physical item type of the ensemble; determining an attribute of a distribution of the characteristic based on the attribute of the distribution of the residue with respect to an ensemble of physical item instances and on the value of the characteristic of the physical item instance; and determining a probability that the physical item instance is out of specification, based on the attribute of the distribution of the characteristic.
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