公开(公告)号：US20240004307A1

公开(公告)日：2024-01-04

申请号：US18039484

申请日：2021-11-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Pioter NIKOLSKI ,  Rick Jeroen MEIJERINK

IPC: G03F7/00

CPC classification number: G03F7/706 ,  G03F7/70575

Abstract: A method of forming a pattern on a substrate using a lithographic apparatus provided with a patterning device and a projection system having chromatic aberrations, the method including: providing a radiation beam having a plurality of wavelength components to the patterning device; forming an image of the patterning device on the substrate using the projection system to form the pattern, wherein a position of the pattern is dependent on a wavelength of the radiation beam due to the chromatic aberrations; and controlling a spectrum of the radiation beam to control the position of the pattern.