公开(公告)号：US09599908B2

公开(公告)日：2017-03-21

申请号：US14879852

申请日：2015-10-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Anthonius Martinus Cornelis Petrus De Jong ,  Hans Jansen ,  Martinus Hendrikus Antonius Leenders ,  Antonius Johannus Van Der Net ,  Peter Franciscus Wanten ,  Jacques Cor Johan Van Der Donck ,  Robert Douglas Watso ,  Teunis Cornelis Van Den Dool ,  Nadja Schuh ,  Jan Willem Cromwijk

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).

公开(公告)号：US10175585B2

公开(公告)日：2019-01-08

申请号：US14473643

申请日：2014-08-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Robert Douglas Watso ,  Youri Johannes Laurentius Maria Van Dommelen ,  Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Peter Paul Steijaert ,  Antonius Martinus Cornelis Petrus De Jong ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Joao Paulo Da Paz Sena ,  Maurice Martinus Johannes Van Der Lee ,  Henricus Martinus Dorotheus Van Lier ,  Gheorghe Tanasa

IPC: G06F7/20 ,  G03F7/20

Abstract: A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.