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公开(公告)号:US20140351773A1
公开(公告)日:2014-11-27
申请号:US14456586
申请日:2014-08-11
Applicant: ASML NETHERLANDS B.V.
Inventor: Yu CAO , Wenjin SHAO , Ronaldus Johannes Gijsbertus GOOSSENS , Jun YE , James Patrick KOONMEN
IPC: G06F17/50
CPC classification number: B29C67/0088 , B29C64/386 , G03F7/70091 , G03F7/70458 , G03F7/705 , G03F7/70516 , G03F7/70525 , G06F17/50 , G06F17/5009 , G06F17/5081
Abstract: Systems and methods for process simulation are described. The methods may use a reference model identifying sensitivity of a reference scanner to a set of tunable parameters. Chip fabrication from a chip design may be simulated using the reference model, wherein the chip design is expressed as one or more masks. An iterative retuning and simulation process may be used to optimize critical dimension in the simulated chip and to obtain convergence of the simulated chip with an expected chip. Additionally, a designer may be provided with a set of results from which an updated chip design is created.
Abstract translation: 描述了过程仿真的系统和方法。 这些方法可以使用标识参考扫描仪对一组可调谐参数的灵敏度的参考模型。 可以使用参考模型来模拟来自芯片设计的芯片制造,其中芯片设计被表示为一个或多个掩模。 可以使用迭代重调和仿真过程来优化模拟芯片中的关键尺寸,并获得模拟芯片与预期芯片的收敛。 此外,可以向设计者提供一组结果,从中创建更新的芯片设计。
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公开(公告)号:US20150045935A1
公开(公告)日:2015-02-12
申请号:US14525704
申请日:2014-10-28
Applicant: ASML NETHERLANDS B.V.
Inventor: Yu CAO , Wenjin SHAO , Ronaldus Johannes Gijsbertus GOOSSENS , Jun YE , James Patrick KOONMEN
IPC: B29C67/00
CPC classification number: B29C64/386 , G03F7/70091 , G03F7/70458 , G03F7/705 , G03F7/70516 , G03F7/70525 , G06F17/50 , G06F17/5009 , G06F17/5081
Abstract: Systems and methods for tuning photolithographic processes are described. A model of a target scanner is maintained defining sensitivity of the target scanner with reference to a set of tunable parameters. A differential model represents deviations of the target scanner from the reference. The target scanner may be tuned based on the settings of the reference scanner and the differential model. Performance of a family of related scanners may be characterized relative to the performance of a reference scanner. Differential models may include information such as parametric offsets and other differences that may be used to simulate the difference in imaging behavior.
Abstract translation: 描述用于调整光刻工艺的系统和方法。 保持目标扫描仪的型号,参考一组可调谐参数来定义目标扫描仪的灵敏度。 差分模型表示目标扫描器与参考值的偏差。 可以基于参考扫描仪和差分模型的设置来调整目标扫描仪。 可以相对于参考扫描仪的性能来表征相关扫描仪系列的性能。 差分模型可能包括诸如参数偏移和可能用于模拟成像行为差异的其他差异的信息。
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