公开(公告)号：WO2018188859A1

公开(公告)日：2018-10-18

申请号：PCT/EP2018/055699

申请日：2018-03-08

Applicant: ASML NETHERLANDS B.V.

Inventor： STEEGHS, Marco, Matheus, Louis ,  GANG, Tian ,  YOUSEFI MOGHADDAM, Mehdi

IPC: G03F7/20

Abstract: A mirror array, at least some of the mirrors of the array comprising a reflective surface and an arm which extends from a surface opposite to the reflective surface, wherein the mirror array further comprises a support structure provided with a plurality of sensing apparatuses, the sensing apparatuses being configured to measure gaps between the sensing apparatuses and the arms which extend from the mirrors.

公开(公告)号：WO2022199969A1

公开(公告)日：2022-09-29

申请号：PCT/EP2022/054615

申请日：2022-02-24

Applicant: ASML NETHERLANDS B.V.

Inventor： SOTIROPOULOS, Nikolaos ,  HARTGERS, Albertus ,  YPMA, Michael, Frederik ,  STEEGHS, Marco, Matheus, Louis

IPC: G03F7/20

Abstract: A lithographic apparatus comprising an illumination system configured to condition a radiation beam and a uniformity correction system configured to adjust an intensity profile of the radiation beam. The lithographic apparatus comprises a control system configured to control the uniformity correction system at least partially based on a thermal status criterion that is indicative of a thermal state of a part of the lithographic apparatus.

公开(公告)号：WO2022268679A1

公开(公告)日：2022-12-29

申请号：PCT/EP2022/066669

申请日：2022-06-20

Applicant: ASML NETHERLANDS B.V.

Inventor： HARTGERS, Albertus ,  STEEGHS, Marco, Matheus, Louis ,  SWINKELS, Gerardus, Hubertus, Petrus, Maria ,  IMPONENTE, Giovanni ,  PLANTZ, Nicholas, William, Maria ,  ENGELEN, Wouter, Joep ,  VAN DE KERKHOF, Marcus, Adrianus

IPC: G03F7/20 ,  G03F7/706

Abstract: A plate for use in an imaging system to determine two optical properties of an illumination beam of the imaging system, the imaging system configured to illuminate an illumination region with the illumination beam, the plate comprising a plurality of markers, wherein a first subset of the plurality of markers comprises a first type of markers for determining a first optical property of the illumination beam, a second subset of the plurality of markers comprises a second type of markers for determining a second optical property of the illumination beam, the plurality of markers are located within a marker region of the plate and the marker region generally corresponds to the illumination region.

公开(公告)号：EP4386479A1

公开(公告)日：2024-06-19

申请号：EP22212833.2

申请日：2022-12-12

Applicant: ASML Netherlands B.V.

Inventor： HARTGERS, Albertus ,  STEEGHS, Marco, Matheus, Louis

IPC: G03F7/00 ,  G02B26/08

CPC classification number: G03F7/70091 ,  G03F7/70116 ,  G02B26/0833 ,  G02B5/09

Abstract: A lithographic apparatus comprises: a support structure; an illumination system; a substrate table configured to support a substrate; and a projection system. The support structure (reticle stage) is configured to support a patterning device such that the patterning device is positionable in an illumination region. The illumination system operable to receive radiation, condition it and to direct at least a portion of the received radiation to the illumination region. The substrate table (wafer stage) is configured to support a substrate. The projection system is operable to form an image of a patterning device supported by the support structure on a substrate supported by the substrate table. The illumination system is configured to control the received radiation such that at least two different portions of the patterning device receive radiation having different angular distributions.

公开(公告)号：EP4314947A1

公开(公告)日：2024-02-07

申请号：EP22707457.2

申请日：2022-02-24

Applicant: ASML Netherlands B.V.

Inventor： SOTIROPOULOS, Nikolaos ,  HARTGERS, Albertus ,  YPMA, Michael, Frederik ,  STEEGHS, Marco, Matheus, Louis

IPC: G03F7/20

公开(公告)号：EP4124910A1

公开(公告)日：2023-02-01

申请号：EP21188452.3

申请日：2021-07-29

Applicant: ASML Netherlands B.V.

Inventor： STEEGHS, Marco, Matheus, Louis ,  HARTGERS, Albertus ,  PASVEER, Willem, Franke

IPC: G03F7/20 ,  G02B26/08

Abstract: The invention relates to a system comprising a micromirror array including:
- a substrate,
- a plurality of moveable micromirrors for reflecting incident light and supported from the substrate,
- an actuator system configured to position each of the plurality of micromirrors based on one or more actuator control signals,
- a measurement system configured to measure a position of each of the plurality of micromirrors, and
- a control unit configured to generate the one or more actuator control signals based on an output of the measurement system.
At least some of the micromirrors of the array comprise a temperature sensor configured to measure a temperature of the respective micromirror. The system further includes a processor, wherein the processor is configured to receive the measured temperatures of the at least some micromirrors and to determine an incident light related energy parameter.