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    DIFFRACTION GRATING FOR MEASUREMENTS IN EUV-EXPOSURE APPARATUSES
    2.
    发明申请
    DIFFRACTION GRATING FOR MEASUREMENTS IN EUV-EXPOSURE APPARATUSES 审中-公开

    公开(公告)号：WO2022248154A1

    公开(公告)日：2022-12-01

    申请号：PCT/EP2022/061398

    申请日：2022-04-28

    Applicant: ASML NETHERLANDS B.V.

    Inventor： CHONG, Derick, Yun, Chek ,  REDDY, Bogathi, Vishnu, Vardhana ,  ENGELEN, Wouter, Joep ,  DE GROOT, Pieter, Cristiaan

    IPC: G02B5/18 ,  G03F7/20

    Abstract: Diffraction gratings for a phase-stepping measurement system for determining an aberration map for a projection system are disclosed. The gratings are two-dimensional diffraction gratings for use as wafer level gratings in an EUV lithographic apparatus. In particular, the diffraction gratings comprise a substrate provided with a two-dimensional array of circular through-apertures (51) and are self-supporting. In some embodiments, a ratio of the radius of the circular apertures to the distance between the centres of adjacent apertures may be selected to minimize the gain and cross-talk errors of a wavefront reconstruction algorithm. For example, the ratio may be between 0,34 and 0,38. In some embodiments, the circular apertures are distributed such that a distance between the centres of adjacent apertures is non-uniform and varies across the diffraction grating. For example, a local pitch of the grating may vary randomly across the diffraction grating.

    RADIATION SOURCE
    4.
    发明申请
    RADIATION SOURCE 审中-公开
    辐射源

    公开(公告)号：WO2016023740A2

    公开(公告)日：2016-02-18

    申请号：PCT/EP2015/067159

    申请日：2015-07-27

    Applicant: ASML NETHERLANDS B.V.

    Inventor： NIKIPELOV, Andrey, Alexandrovich ,  COENEN, Teis, Johan ,  VAN HELVOORT, Jeroen, Johannes, Michiel ,  ENGELEN, Wouter, Joep ,  BRUSSAARD, Gerrit, Jacobus, Hendrik ,  POORTER, Gijsbertus, Geert ,  LOOPSTRA, Erik, Roelof

    IPC: H01S3/09

    CPC classification number: H01S3/0903 ,  H01S3/0071 ,  H01S3/0959 ,  H01S3/1024 ,  H01S3/11 ,  H01S3/1103

    Abstract: Passage through LINACs of electron bunches in their acceleration phase is co-ordinated with passage through the LINACs of electron bunches in their deceleration phase. Each successive pair of electron bunches are spaced in time by a respective bunch spacing, in accordance with a repeating electron bunch sequence. The electron source provides clearing gaps in the electron bunch sequence to allow clearing of ions at the undulator. The electron source provides the clearing gaps in accordance with a clearing gap sequence such that, for each of the plurality of energy recovery LINACS, and for substantially all of the clearing gaps:- for each passage of the clearing gap through the LINAC in an acceleration phase or deceleration phase the clearing gap is co-ordinated with a further one of the clearing gaps passing through the LINAC in a deceleration phase or acceleration phase thereby to maintain energy recovery operation of the LINAC.

    Abstract translation: 在加速阶段通过电子束的LINAC通道在其减速阶段通过电子束的LINAC进行协调。 根据重复的电子束序列，每个连续的一对电子束在时间上由相应的束间隔隔开。 电子源提供电子束序列中的清除间隙，以允许在波动器处清除离子。 电子源根据清除间隙序列提供清除间隙，使得对于多个能量回收LINACS中的每一个以及基本上所有的清除间隙： - 对于通过加速度的LINAC的清除间隙的每次通过 相位或减速阶段，清除间隙与在减速阶段或加速阶段通过LINAC的另一个清除间隙进行协调，从而保持LINAC的能量回收操作。

    OPTICAL MEASUREMENT METHOD AND SENSOR APPARATUS
    6.
    发明申请
    OPTICAL MEASUREMENT METHOD AND SENSOR APPARATUS 审中-公开

    公开(公告)号：WO2019134787A1

    公开(公告)日：2019-07-11

    申请号：PCT/EP2018/084099

    申请日：2018-12-10

    Applicant: ASML NETHERLANDS B.V.

    Inventor： LOOMAN, Joris, Maria, Gerardus ,  OVERES, Theodorus, Franciscus, Emilius, Maria ,  ENGELEN, Wouter, Joep

    IPC: G03F7/20 ,  G01M11/02

    Abstract: An optical measurement method using an optical sensor apparatus (15), the optical sensor apparatus comprising an optical element (20) comprising a mark (22) configured to selectively transmit incident radiation (24), a photodetector (26) configured to receive radiation transmitted by the mark and provide an output signal that is indicative of the received radiation, and a support (30) which supports the optical element and is in thermal contact with the optical element. A thermal conductivity of the support is greater than a thermal conductivity of the optical element and a coefficient of thermal expansion of the support is greater than a coefficient of thermal expansion of the optical element. The method comprises performing a first measurement using the optical sensor apparatus, the first measurement including illuminating the mark with radiation. The temperature of the optical element changes during the first measurement. The temperature of the support is substantially constant throughout the first measurement.

    ELECTRON SOURCE, WITH PHOTOCATHODE ILLUMINATED OFF-AXIS
    7.
    发明申请
    ELECTRON SOURCE, WITH PHOTOCATHODE ILLUMINATED OFF-AXIS 审中-公开
    电子源，光电阴极照射离轴

    公开(公告)号：WO2017071878A1

    公开(公告)日：2017-05-04

    申请号：PCT/EP2016/072004

    申请日：2016-09-16

    Applicant: ASML NETHERLANDS B.V.

    Inventor： BRUSSAARD, Gerrit, Jacobus, Hendrik ,  ENGELEN, Wouter, Joep

    IPC: G03F7/20 ,  H01J37/073 ,  H01S3/09

    CPC classification number: G03F7/70025 ,  G03F7/70033 ,  H01S3/0903

    Abstract: An electron source configured to provide a beam of electrons which propagate substantially along an axis (100). The electron source comprising a photocathode (101) including a target region (105) configured to emit electrons when illuminated with radiation, wherein the target region is separated from the axis and an anode (103), wherein the photocathode and the anode are configured to generate an electric field (127) which causes electrons (106) emitted from the target region of the photocathode to be accelerated away from the photocathode and wherein the photocathode and the anode are configured such that the electric field direction is substantially the same throughout the target region, and is inclined towards the axis.

    Abstract translation: 配置成提供基本上沿着轴线（100）传播的电子束的电子源。 所述电子源包括光阴极（101），所述光阴极包括被配置为当用辐射照射时发射电子的目标区域（105），其中所述目标区域与所述轴线分离，阳极（103），其中光电阴极和阳极被配置为 产生电场（127），该电场使得从光阴极的目标区域发射的电子（106）加速离开光阴极，并且其中光阴极和阳极被配置成使得电场方向在整个目标中基本相同 区域，并且倾向于轴线。

    A LITHOGRAPHY APPARATUS AND A METHOD OF DETECTING A RADIATION BEAM
    10.
    发明申请
    A LITHOGRAPHY APPARATUS AND A METHOD OF DETECTING A RADIATION BEAM 审中-公开

    公开(公告)号：WO2021069147A1

    公开(公告)日：2021-04-15

    申请号：PCT/EP2020/074318

    申请日：2020-09-01

    Applicant: ASML NETHERLANDS B.V.

    Inventor： IMPONENTE, Giovanni ,  ENGELEN, Wouter, Joep ,  PLANTZ, Nicholas, William, Maria

    IPC: G03F7/20

    Abstract: A substrate table configured to hold a substrate, comprising: a plurality of sensor elements configured to detect a radiation beam from a projection system, the radiation beam forming an illuminated region having an elongate shape at substrate level, the elongate shape having long edges and short edges and defining a longitudinal direction and a transverse direction perpendicular to the longitudinal direction, the sensor elements arranged along the longitudinal direction, wherein the plurality of the sensor elements are arranged at different distances in the transverse direction from one of the long edges of the elongate shape.

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