公开(公告)号：US20160377996A1

公开(公告)日：2016-12-29

申请号：US15039795

申请日：2014-11-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Peter Paul HEMPENIUS ,  Martijn HOUBEN ,  Nicolaas Rudolf KEMPER ,  Robertus Mathijs Gerardus RIJS ,  Paul Corné Henri DE WIT ,  Stijn Willem BOERE ,  Youssef Karel Maria DE VOS ,  Frits VAN DER MEULEN

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70775 ,  G03F7/709

Abstract: A lithographic apparatus includes: an object that is moveable in at least one direction; a control system to move the object in the at least one direction, wherein the control system is arranged to control movement of the object in the at least one direction in a frequency range of interest; and a conduit provided with a fluid, wherein the conduit is arranged on or in the object in a pattern, and wherein the pattern is such that an acceleration of the object in the at least one direction causes an acceleration pressure profile in the fluid along the conduit, the acceleration pressure profile not matching with a resonance pressure profile that corresponds to a standing wave mode in the fluid with a resonance frequency in the frequency range of interest.

Abstract translation: 光刻设备包括：可在至少一个方向上移动的物体; 控制系统，用于在所述至少一个方向上移动所述物体，其中所述控制系统被布置成控制所述物体在感兴趣的频率范围内的所述至少一个方向上的移动; 以及设置有流体的导管，其中所述导管以图案布置在所述物体上或所述物体中，并且其中所述图案使得所述物体在所述至少一个方向上的加速度沿着所述流体沿着所述流体的加速度压力分布 导管，加速度压力分布不符合共振压力分布，其对应于在感兴趣的频率范围内的共振频率的流体中的驻波模式。