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Patent Agency Ranking
公开(公告)号：WO2022069420A1
公开(公告)日：2022-04-07
申请号：PCT/EP2021/076550
申请日：2021-09-28
Applicant: ASML NETHERLANDS B.V.
Inventor： WANG, Erheng , VERDONCK, Adrianus, Marinus , SCHEERHOORN, Arjan, Gerrard, Pieter, Ivo , WANG, Xu , SUI, Jianzi , TU, Chin-Fa , VAN HEUMEN, Martijn, Petrus, Christianus
Abstract: Described herein is a vacuum system configured to mitigate damage or risk associated with a pump malfunction (e.g., an imbalance, a catastrophic failure, etc.). An exemplary vacuum pump includes a housing; a vibration isolator coupled to the vacuum pump housing and configured to isolate vibrations generated by the vacuum pump during operation; and a stop structure (a first component) disposed between the vacuum pump housing and an adjacent fixture (a second component). The stop structure configured to prevent displacement of the vacuum pump housing relative to the fixture above a threshold amount, wherein the displacement of the vacuum pump housing is configured to be within the threshold amount during normal operation. The vacuum system may further include a collar (a third component) configured to limit an axial displacement of the pump.
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公开(公告)号：WO2022038080A1
公开(公告)日：2022-02-24
申请号：PCT/EP2021/072691
申请日：2021-08-16
Applicant: ASML NETHERLANDS B.V.
Inventor： YU, Dongchi , WANG, Erheng
IPC: H01J37/18
Abstract: A load-lock system (300) includes a chamber (302) enclosing a supporting structure (308) configured to support a wafer (310); a gas vent (312) arranged at a ceiling (304) of the chamber (302) and configured to vent gas into the chamber (302) with a flow rate of at least twenty normal liters per minute; and a plate (314) fixed to the ceiling (304) between the gas vent (312) and the wafer (310).
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公开(公告)号：WO2021165167A1
公开(公告)日：2021-08-26
申请号：PCT/EP2021/053573
申请日：2021-02-15
Applicant: ASML NETHERLANDS B.V.
Inventor： VAN DE KERKHOF, Marcus, Adrianus , ZHANG, Jing , VAN HEUMEN, Martijn, Petrus, Christianus , BRUURS, Patriek, Adrianus, Alphonsus, Maria , WANG, Erheng , SHARMA, Vineet , SEFA, Makfir , FU, Shao-Wei , SCOLARI, Simone, Maria , JACOBS, Johannes, Andreas, Henricus, Maria
Abstract: Apparatuses, systems, and methods for transferring fluid to a stage in a charged particle beam system are disclosed. In some embodiments, a stage may be configured to secure a wafer; a chamber may be configured to house the stage; and a tube may be provided within the chamber to transfer fluid between the stage and outside of the chamber. The tube may include a first tubular layer of first material, wherein the first material is a flexible polymer; and a second tubular layer of second material, wherein the second material is configured to reduce permeation of fluid or gas through the tube. In some embodiments, a system may include a degasser system outside of the chamber, where the degasser system may be configured to remove gases from the transfer fluid before the transfer fluid enters the tube.
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公开(公告)号：WO2020016087A1
公开(公告)日：2020-01-23
申请号：PCT/EP2019/068637
申请日：2019-07-11
Applicant: ASML NETHERLANDS B.V.
Inventor： GOSEN, Jeroen, Gerard , CHEN, Te-Yu , VAN BANNING, Dennis, Herman, Caspar , KADIJK, Edwin, Cornelis , VAN HEUMEN, Martijn, Petrus, Christianus , WANG, Erheng , JACOBS, Johannes, Andreas, Henricus, Maria
IPC: H01L21/67 , H01L21/677
Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved load lock unit is disclosed. An improved load lock system may comprise a plurality of supporting structures configured to support a wafer and a conditioning plate including a heat transfer element configured to adjust a temperature of the wafer. The load lock system may further comprise a gas vent configured to provide a gas between the conditioning plate and the wafer and a controller configured to assist with the control of the heat transfer element.
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公开(公告)号：EP4107772A1
公开(公告)日：2022-12-28
申请号：EP21706205.8
申请日：2021-02-15
Applicant: ASML Netherlands B.V.
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