公开(公告)号：WO2015101459A1

公开(公告)日：2015-07-09

申请号：PCT/EP2014/076543

申请日：2014-12-04

Applicant: ASML NETHERLANDS B.V.

Inventor： CHEN, Guangqing ,  GHAN, Justin ,  WHYSONG, David, Harold

IPC: G03F7/20 ,  G03F9/00

CPC classification number: G06F17/5068 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70641 ,  G03F7/70683 ,  G03F9/7046 ,  G03F9/7076

Abstract: A method of metrology target design is described. The method includes providing a range or a plurality of values for design parameter of a metrology target and by a processor, selecting, by solving for and/or sampling within the range or the plurality of values for the design parameters, a plurality of metrology target designs having one or more design parameters meeting a constraint for a design parameter of the metrology target.

Abstract translation: 描述了一种计量目标设计方法。 该方法包括提供测量目标的设计参数的范围或多个值，并且由处理器通过在设计参数的范围或多个值内求解和/或采样来选择多个度量目标 具有满足度量目标的设计参数的约束的一个或多个设计参数的设计。

公开(公告)号：EP4538793A1

公开(公告)日：2025-04-16

申请号：EP23202984.3

申请日：2023-10-11

Applicant: ASML Netherlands B.V.

Inventor： FU, Jiyou ,  ZHAO, Wangshi ,  WHYSONG, David, Harold ,  ZHANG, Chenji ,  BAI, Shufeng ,  LI, Pengcheng

IPC: G03F7/00

Abstract: Disclosed is a method for designing a focus target for determining a focus setting of a lithographic apparatus used to form said target. The method comprises determining an initial target design, the initial target design being configure to enhance a mask 3D effect, resultant from the effect of three dimensional reticle features and an off-axis beam incidence on a reticle comprising target features arranged in accordance to said target design; modeling an exposure a target according to said initial target design and measurement of said target for at least a plurality of different focus settings; varying the target design based on said modeling so as to improve said target design in terms of at least one performance indicator; and determining a final target design based on said at least one performance indicator.