-
公开(公告)号：WO2015101458A1
公开(公告)日：2015-07-09
申请号：PCT/EP2014/076542
申请日：2014-12-04
Applicant: ASML NETHERLANDS B.V.
Inventor： CHEN, Guangqing , KENT, Eric, Richard , WANG, Jen-Shiang , ADAM, Omer, Abubaker, Omer
IPC: G03F7/20
CPC classification number: G03F7/706 , G03F7/70625 , G03F7/70633 , G03F7/70641 , G03F7/70683 , G06F17/5009 , G06F17/5068 , G06F2217/12 , G06F2217/14
Abstract: A method of metrology target design is described. The method includes determining a sensitivity of a parameter for a metrology target design to an optical aberration, determining a difference between an impact on the parameter for the metrology target design and an impact on the parameter for a product design exposed using an optical system of a lithographic apparatus based on the product of the sensitivity and the aberration of the optical system. The method further includes determining a sensitivity of a parameter for a metrology target design to each aberration of a plurality of aberrations and determining an impact on the parameter for the metrology target design based on the sum of the sensitivities multiplied by the respective aberrations of the optical system. The parameter may be overlay error, critical dimension and focus. The aberration may be different across the exposure slit but the sensitivity is substantially independent of the slit position.
Abstract translation: 描述了一种计量目标设计方法。 该方法包括确定用于度量目标设计的参数对光学像差的灵敏度，确定对度量目标设计的参数的影响与对使用光学系统的光学系统曝光的产品设计的参数的影响之间的差异 基于光学系统的灵敏度和像差的乘积的光刻设备。 该方法还包括确定用于度量目标设计的参数对多个像差的每个像差的灵敏度，并且基于灵敏度乘以光学相应像差的总和来确定对度量目标设计的参数的影响 系统。 该参数可能是重叠错误，关键维度和焦点。 像差可能在曝光狭缝上不同，但灵敏度基本上与狭缝位置无关。
-
公开(公告)号：WO2016078861A1
公开(公告)日：2016-05-26
申请号：PCT/EP2015/074450
申请日：2015-10-22
Applicant: ASML NETHERLANDS B.V.
Inventor： CHEN, Guangqing , BAI, Shufeng , KENT, Eric, Richard , LU, Yen-Wen , TUFFY, Paul, Anthony , WANG, Jen-Shiang , ZHANG, Youping , ZWARTJES, Gertjan , BIJLSMA, Jan, Wouter
IPC: G03F7/20
CPC classification number: G06F17/5009 , G03F7/705 , G03F7/70633 , G03F7/70683 , G06F17/12 , G06F17/14
Abstract: The present disclosure teaches methods and systems for automatically generating robust metrology targets which can accommodate a variety of lithography processes and process perturbations. The methodology is referred to as "Design for Control". Individual steps of an overall lithography process are modeled into a single process sequence to simulate the physical wafer processing. That process sequence drives the creation of a three-dimensional device geometry as a whole, rather than "building" the device geometry element-by-element.
Abstract translation: 本公开教导了用于自动生成可容纳各种光刻处理和处理扰动的鲁棒测量目标的方法和系统。 该方法被称为“控制设计”。 整个光刻过程的各个步骤被建模为单个过程序列以模拟物理晶片处理。 该过程顺序驱动了整体的三维设备几何的创建，而不是逐个“构建”设备几何。
-
Patent Agency Ranking
公开(公告)号：WO2015101461A2
公开(公告)日：2015-07-09
申请号：PCT/EP2014/076545
申请日：2014-12-04
Applicant: ASML NETHERLANDS B.V.
Inventor： CHEN, Guangqing , BAI, Shufeng , WANG, Jen-Shiang
IPC: G03F7/20
CPC classification number: G03F7/70633 , G03F7/705 , G03F7/70625 , G03F7/70641 , G03F7/70683
Abstract: A system to, and a method to, select a metrology target for use on a substrate including performing a lithographic simulation for a plurality of points on a process window region for each proposed target, identifying a catastrophic error for any of the plurality of points for each proposed target, eliminating each target having a catastrophic error at any of the plurality of points, performing a metrology simulation to determine a parameter over the process window for each target not having a catastrophic error at any of the plurality of points, and using the one or more resulting determined simulated parameters to evaluate target quality.
Abstract translation: 一种用于选择在基板上使用的测量目标的系统和方法，包括对于每个所提出的目标对于处理窗口区域上的多个点进行光刻模拟，识别多个点中的任何一个点的灾难性误差 每个所提出的目标，消除每个目标在多个点中的任一点具有灾难性错误，执行度量模拟以确定在多个点中的任一点上没有灾难性错误的每个目标的处理窗口上的参数，并且使用 一个或多个产生的确定的模拟参数来评估目标质量。
-
公开(公告)号：WO2015101460A1
公开(公告)日：2015-07-09
申请号：PCT/EP2014/076544
申请日：2014-12-04
Applicant: ASML NETHERLANDS B.V.
Inventor： CHEN, Guangqing , LIU, Wei , VAN DER SCHAAR, Maurits
IPC: G03F7/20
CPC classification number: G03F7/70633 , G01B11/00 , G01B11/303 , G03F7/70641 , G03F7/70683
Abstract: A method of metrology target design is described. The method includes determining a sensitivity of a parameter of a metrology target design to a perturbation of a process parameter for forming, or measuring the formation of, the metrology target, and determining a robustness of the metrology target design based on the sum of the sensitivity multiplied by the perturbation of at least one of the process parameters.
Abstract translation: 描述了一种计量目标设计方法。 该方法包括将测量目标设计的参数的灵敏度确定为用于形成或测量计量目标的形成的过程参数的扰动，以及基于灵敏度之和确定度量目标设计的鲁棒性 乘以至少一个过程参数的扰动。
-
公开(公告)号：WO2016162228A1
公开(公告)日：2016-10-13
申请号：PCT/EP2016/056662
申请日：2016-03-24
Applicant: ASML NETHERLANDS B.V.
Inventor： WILLEMS, Lotte, Marloes , BHATTACHARYYA, Kaustuve , BINTEVINOS, Panagiotis, Pieter , CHEN, Guangqing , EBERT, Martin , KNELISSEN, Pieter, Jacob, Mathias, Hendrik , MORGAN, Stephen , VAN DER SCHAAR, Maurits , VERSTAPPEN, Leonardus, Henricus, Marie , WANG, Jen-Shiang , WARDENIER, Peter, Hanzen
CPC classification number: G06F17/5009 , G03F7/705 , G03F7/70625 , G03F7/70633 , G03F7/70683 , G03F9/7046 , G06F2217/16
Abstract: A method including performing a simulation to evaluate a plurality of metrology targets and/or a plurality of metrology recipes used to measure a metrology target, identifying one or more metrology targets and/or metrology recipes from the evaluated plurality of metrology targets and/or metrology recipes, receiving measurement data of the one or more identified metrology targets and/or metrology recipes, and using the measurement data to tune a metrology target parameter or metrology recipe parameter.
Abstract translation: 一种方法，包括执行模拟以评估用于测量度量目标的多个度量目标和/或多个计量学方案，从所评估的多个度量目标和/或计量学中识别一个或多个测量目标和/或计量配方 接收所述一个或多个识别的度量目标和/或度量配方的测量数据，以及使用所述测量数据来调整度量目标参数或度量配方参数。
-
公开(公告)号：WO2015101459A1
公开(公告)日：2015-07-09
申请号：PCT/EP2014/076543
申请日：2014-12-04
Applicant: ASML NETHERLANDS B.V.
Inventor： CHEN, Guangqing , GHAN, Justin , WHYSONG, David, Harold
CPC classification number: G06F17/5068 , G03F7/70625 , G03F7/70633 , G03F7/70641 , G03F7/70683 , G03F9/7046 , G03F9/7076
Abstract: A method of metrology target design is described. The method includes providing a range or a plurality of values for design parameter of a metrology target and by a processor, selecting, by solving for and/or sampling within the range or the plurality of values for the design parameters, a plurality of metrology target designs having one or more design parameters meeting a constraint for a design parameter of the metrology target.
Abstract translation: 描述了一种计量目标设计方法。 该方法包括提供测量目标的设计参数的范围或多个值，并且由处理器通过在设计参数的范围或多个值内求解和/或采样来选择多个度量目标 具有满足度量目标的设计参数的约束的一个或多个设计参数的设计。
-
公开(公告)号：EP4449205A1
公开(公告)日：2024-10-23
申请号：EP22835390.0
申请日：2022-12-13
Applicant: ASML Netherlands B.V.
Inventor： FU, Jiyou , SU, Jing , LIN, Chenxi , LIANG, Jiao , CHEN, Guangqing , ZOU, Yi
-
-
-
-
-
-
Search Results
7
records
(took 0.025 seconds)
