公开(公告)号：WO2014082813A3

公开(公告)日：2014-06-05

申请号：PCT/EP2013/072719

申请日：2013-10-30

Applicant: ASML NETHERLANDS B.V.

Inventor： GROOTJANS, Willem, Jan ,  GARCIA GRANDA, Miguel ,  KRIST, Jouke ,  MEGENS, Henricus ,  XU, Lu

IPC: G03F7/20 ,  G01N21/47 ,  G01N21/956

Abstract: Method for determining lithographic quality of a structure produced by a lithographic process using a periodic pattern, such as a grating, detects lithographic process window edges and optimum process conditions. Method steps are: 602: printing a structure using a lithographic process using a grating pattern; 604: selecting a first characteristic, such as a polarization direction, for the illumination; 606: illuminating the structure with incident radiation with the first characteristic; 608: detecting scattered radiation; 610: selecting a second characteristic, such as a different polarization direction, for the illumination; 612: illuminating the structure with incident radiation with the second characteristic; 614: detecting scattered radiation; 616: rotating one or more angularly resolved spectrum to line up the polarizations, thus correcting for different orientations of the polarizations; 618: determining a difference between the measured angularly resolved spectra; and 620: determining a value of lithographic quality of the structure using the determined difference.