公开(公告)号：US20220100102A1

公开(公告)日：2022-03-31

申请号：US17427412

申请日：2020-01-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Arend Johannes DONKERBROEK ,  Yassin CHOWDHURY ,  Maurice Henricus Franciscus JANSSEN

IPC: G03F7/20

Abstract: A lithographic apparatus including a projection system having an optical axis and configured to project a radiation beam. The apparatus includes a measurement unit arranged to measure the radiation beam projected by the projection system, the measurement unit having an opening through which the radiation beam passes in use, and a sensing surface extending transverse to the optical axis and arranged to measure the radiation beam passing through the opening. The apparatus is configured to move the sensing surface in a plane transverse to the optical axis between a plurality of measurement positions. The radiation beam defines a view in the plane, and the measurement unit is configured such that the sensing surface captures, in each measurement position, a portion of the view smaller than 100% of the view.

公开(公告)号：US20210349398A1

公开(公告)日：2021-11-11

申请号：US17282871

申请日：2019-09-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Vahid MOHAMMADI ,  Yassin CHOWDHURY ,  Pieter Cristiaan DE GROOT ,  Wouter Joep ENGELEN ,  Marcel Johannes Petrus Theodorus VAN DER HOORN

IPC: G03F7/20 ,  H01L31/02 ,  H01L31/0216 ,  H01L31/18

Abstract: A radiation filter for reducing transmission of an unwanted wavelength of radiation. The radiation filter includes zirconium and SiN3. The radiation filter may form part of a radiation sensor including a passivation layer arranged to receive radiation transmitted by the radiation filter, a photodiode arranged to receive radiation transmitted by the passivation layer, and circuit elements connected to the photodiode. The radiation sensor may perform optical measurements as part of an extreme ultraviolet lithographic apparatus or a lithographic tool.