公开(公告)号：US20240347311A1

公开(公告)日：2024-10-17

申请号：US18580152

申请日：2022-06-23

Applicant: ASML Netherlands B.V.

Inventor： Bruno LA FONTAINE ,  Juying DOU ,  Zhidong DU ,  Che-Chia KUO

IPC: H01J37/065

CPC classification number: H01J37/065 ,  H01J2237/06375

Abstract: Apparatuses and systems for stabilizing electron sources in charged particle beam inspection systems are provided. In some embodiments, a system may include an electron source comprising an emitting tip electrically connected to two electrodes and configured to emit an electron; and a base coupled to the emitting tip, wherein the base is configured to stabilize the emitting tip via the coupling.

公开(公告)号：US20240347313A1

公开(公告)日：2024-10-17

申请号：US18751031

申请日：2024-06-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Zhidong DU ,  Xuedong LIU

IPC: H01J37/22

CPC classification number: H01J37/22 ,  H01J2237/022

Abstract: Systems and methods of removing a contaminant from an emitter tip of an electron source in an electron beam apparatus are disclosed. An electron beam apparatus may include an electron source comprising an emitter tip configured to emit electrons and an optical source configured to generate an optical beam illuminating a portion of the emitter tip to excite a surface mode of the optical beam, wherein the excited surface mode facilitates removal of a contaminant from a surface of the illuminated portion of the emitter tip. The excited surface mode may comprise a propagating surface wave or a localized surface wave. The emitter tip may comprise a grating structure, wherein a characteristic of the grating structure matches a wavevector of the optical beam.