公开(公告)号：JP2006019755A

公开(公告)日：2006-01-19

申请号：JP2005217968

申请日：2005-06-29

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： SCHOORMANS CAROLUS JOHANNES CA ,  ADRIAENS JOHANNES MATHIAS THEO

IPC: H01L21/027 ,  G01B11/00 ,  G03B27/32 ,  G03F7/23 ,  G03F9/00 ,  H01L21/68

CPC classification number: G03F9/7011 ,  G03F9/7015 ,  G03F9/7019 ,  G03F9/7049

Abstract: PROBLEM TO BE SOLVED: To provide a calibration method in order to support compensation for the action of non-ideal nature in a measurement system. SOLUTION: A calibration method according to one embodiment comprises the step of transporting a table to a plurality of exposure positions. In each position, the first portion of a measurement system measures the position of the table along two orthogonal axes in a plain surface. A mark is exposed on a substrate. The second portion of the measurement system measures the measurement position of the table corresponding to the mark for each mark or two different directions of the substrate. The characterization of error in the measurement of the position of the measurement system along one of the orthogonal axes is obtained as the function of the position along the orthogonal axes based on the measured position. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供校准方法以支持在测量系统中对非理想性质的作用的补偿。 解决方案：根据一个实施例的校准方法包括将表传送到多个曝光位置的步骤。 在每个位置，测量系统的第一部分在平坦表面中沿两个正交轴测量工作台的位置。 标记曝光在基材上。 测量系统的第二部分测量与基板的每个标记或两个不同方向的标记相对应的工作台的测量位置。 根据测量位置，沿着正交轴的位置获得测量系统沿着正交轴之一的位置的测量中的误差的表征。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2008219005A

公开(公告)日：2008-09-18

申请号：JP2008040761

申请日：2008-02-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： SCHOORMANS CAROLUS JOHANNES CA ,  ZON ALEX VAN ,  ADRIAENS JOHANNES MATHIAS THEO

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70725

Abstract: PROBLEM TO BE SOLVED: To provide an improved calibration process to compensate for the effects of imperfections in a measuring system. SOLUTION: The method to calibrate a substrate table position in a lithographic apparatus includes providing a substrate on a substrate table with a two dimensional arrangement of patterns; positioning the substrate table with a positioning system; measuring positions of the substrate table in at least two dimensions with a position measuring system; reading out the arrangement of patterns as a function of the measured positions of the substrate table with a pattern read out system to obtain pattern read out results; deriving position errors as a function of the measured positions of the substrate table compared with the pattern read out results; calibrating the positioning system by using the position errors, where the calibrating includes determining the influences on the positioning system; correcting the position errors as a function of the corresponding two dimensional position of the substrate table with the determined drift influences; and calibrating the positioning system with the corrected position errors. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供改进的校准过程以补偿测量系统中缺陷的影响。 解决方案：校准光刻设备中的衬底台位置的方法包括在衬底台上提供具有二维排列图案的衬底; 用定位系统定位基板台; 使用位置测量系统测量至少两个维度的基板台的位置; 通过图案读取系统读出作为衬底台的测量位置的函数的图案排列，以获得图案读出结果; 根据读出的结果，导出位置误差作为衬底台的测量位置的函数; 通过使用位置误差校准定位系统，其中校准包括确定对定位系统的影响; 根据确定的漂移影响，校正作为衬底台的对应二维位置的函数的位置误差; 并用校正的位置误差校准定位系统。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：SG115670A1

公开(公告)日：2005-10-28

申请号：SG200402025

申请日：2004-04-14

Applicant: ASML NETHERLANDS BV

Inventor： ADRIAENS JOHANNES MATHIAS THEO ,  BEEMS MARCEL HENDRIKUS MARIA ,  VAN DER PASCH ENGELBERTUS ANTO

IPC: G01B9/02 ,  G01B11/00 ,  G03F7/20 ,  H01L21/027

Abstract: In an interferometric displacement measuring system, a correction for beamshear is made. The correction may be a polynomial of a variable proportional to the length of the optical path traversed by the measurement beam and the angle of the measurement mirror. The correction compensates for errors caused by non-planarity of the wavefront of the measurement beam.