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    DISPLACEMENT MEASUREMENT SYSTEMS LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    1.
    发明公开
    DISPLACEMENT MEASUREMENT SYSTEMS LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    位移测量系统平台设备和设备制造方法

    公开(公告)号：KR20070095805A

    公开(公告)日：2007-10-01

    申请号：KR20070027566

    申请日：2007-03-21

    Applicant: ASML NETHERLANDS BV

    Inventor： KLAVER RENATUS GERARDUS ,  LOOPSTRA ERIK ROELOF ,  VAN DER PASCH ENGELBERTUS ANTO

    IPC: G01B11/02 ,  G01B9/02 ,  G03F7/20

    CPC classification number: G01D5/38 ,  G03F7/70775

    Abstract: A displacement measuring system, a lithography device, and a manufacturing method thereof are provided to reduce sensitivity against an error and to decrease an installation space thereof. A displacement measuring system comprises first and second diffraction lattices, a sensor(216), and at least one linear polarizer(217,218). The first diffraction lattice is used to divide a first beam of inputted radiation into first positive and negative diffraction radiation beams(212,213). The first positive and negative diffraction radiation beams are diffracted more by the second diffraction lattice. The sensor is used to decide a relative displacement between the first and second diffraction lattices from a decision of a phase difference between a first component of the second beam deduced from the first positive diffraction radiation beam, and a second component of the second beam deduced from the first negative diffraction radiation beam. The linear polarizer is formed to diffract the first and second components of the second beam linearly and to position and cross the first and second components mutually. A lithography device is used to detect the displacement of the first component thereof against the second component thereof.

    Abstract translation: 提供了位移测量系统，光刻设备及其制造方法，以降低对错误的灵敏度并减小其安装空间。 位移测量系统包括第一和第二衍射栅格，传感器（216）和至少一个线性偏振器（217,218）。 第一衍射栅格用于将第一射入的辐射束分成第一正和负衍射辐射束（212,213）。 第一正和负衍射辐射束被第二衍射晶格衍射更多。 该传感器用于根据从第一正衍射辐射束推断的第二光束的第一分量与从第一正衍射辐射束推导出的第二光束的第二分量之间的相位差的判定来确定第一和第二衍射光栅之间的相对位移 第一个负衍射辐射束。 线性偏振器被形成为线性地衍射第二光束的第一和第二分量并相互定位和交叉第一和第二分量。 光刻装置用于检测其第一部件相对于其第二部件的位移。

    Stage system, lithographic apparatus including such stage system, and correction method
    3.
    发明专利
    Stage system, lithographic apparatus including such stage system, and correction method 审中-公开
    阶段系统，包括这种系统的平面设备和校正方法

    公开(公告)号：JP2009135490A

    公开(公告)日：2009-06-18

    申请号：JP2008290451

    申请日：2008-11-13

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： KOENEN WILLEM HERMAN GERTRUDA ,  EUSSEN EMIEL JOZEF MELANIE ,  VAN DER PASCH ENGELBERTUS ANTO

    IPC: H01L21/027

    CPC classification number: G03F7/70775 ,  G03F7/70508 ,  G03F7/7085

    Abstract: PROBLEM TO BE SOLVED: To improve stage position measurement accuracy of a stage.
    SOLUTION: A position measurement system to measure a position of a movable stage includes: a reference plate; a plurality of sensors arranged such that, depending on a position of the movable stage relative to the reference plate, at least a subset of the plurality of sensors is configured to cooperate with the reference plate to provide, for each of the sensors in the subset, respective sensor signals representative of positions of the respective sensors relative to the reference plate; and a processor arranged to determine, from the sensor signals, a stage position. The processing device is configured to, when the stage is in a position where an over-determined number of sensor signals is provided by at least the subset of the sensors that are in operational cooperation with the reference plate, (a) determine the stage position from a subset of the over-determined number of sensor signals, and (b) correct a sensor signal of one or more of the sensors from a discrepancy between the determined stage position and a remainder of the sensors signals.
    COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提高舞台的舞台位置测量精度。 解决方案：用于测量可移动台的位置的位置测量系统包括：参考板; 多个传感器布置成使得根据可移动台相对于参考板的位置，多个传感器的至少一个子集被配置为与参考板协作以为子集中的每个传感器提供 各个传感器信号表示相应传感器相对于参考板的位置; 以及处理器，其布置成从传感器信号确定台位置。 所述处理装置被配置为当所述载物台位于所述传感器至少与所述参考板操作协作的至少子集中提供超过数量的传感器信号的位置时，（a）确定所述载物台位置 从传感器信号的超定数量的子集中，以及（b）根据确定的载台位置和传感器信号的其余部分之间的差异校正一个或多个传感器的传感器信号。 版权所有（C）2009，JPO＆INPIT

    Measurement system for measuring position dependent signal of movable object, and lithographic apparatus and method
    4.
    发明专利
    Measurement system for measuring position dependent signal of movable object, and lithographic apparatus and method 有权
    用于测量可移动物体的相关信号的测量系统和平面设备和方法

    公开(公告)号：JP2009004737A

    公开(公告)日：2009-01-08

    申请号：JP2008072789

    申请日：2008-03-21

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VAN DER WIJST MARC WILHELMUS M ,  VAN DER PASCH ENGELBERTUS ANTO ,  ZAAL KOEN JACOBUS J M

    IPC: H01L21/027 ,  G01B7/00 ,  G03F7/20 ,  H01L21/68

    CPC classification number: G03F7/7085 ,  G03F7/70425 ,  G03F7/70775 ,  G03F7/70783

    Abstract: PROBLEM TO BE SOLVED: To provide an encoder-type high accuracy measurement system configured to measure a position signal, wherein measurement accuracy is substantially almost unaffected by disturbance brought about by the movement of a movable object. SOLUTION: The measurement system is configured to measure a position signal of a movable object, including at least one sensor mountable on the movable object, a sensor target object mountable on a substantially stationary frame, and a mounting device configured for mounting the sensor target object on the substantially stationary frame. The measurement system further includes a compensation device, configured for compensating the movements and/or the deformations of the sensor target object with respect to the substantially stationary frame. The compensation device may include a passive or an active damping device and/or a feedback position control system. The compensation device can include a gripping device which fixes the position of the sensor target object during a movement of the movable object. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种构造成测量位置信号的编码器型高精度测量系统，其中测量精度基本上几乎不受可移动物体的运动引起的干扰的影响。 解决方案：测量系统被配置为测量可移动物体的位置信号，包括可安装在可移动物体上的至少一个传感器，可安装在基本上固定的框架上的传感器目标物体，以及安装装置， 传感器目标物体在基本上固定的框架上。 测量系统还包括补偿装置，其被配置为补偿传感器目标物体相对于基本上固定的框架的运动和/或变形。 补偿装置可以包括无源或主动阻尼装置和/或反馈位置控制系统。 补偿装置可以包括夹持装置，其在可移动物体的运动期间固定传感器目标物体的位置。 版权所有（C）2009，JPO＆INPIT

    Manufacturing method of lithographic apparatus and device
    6.
    发明专利
    Manufacturing method of lithographic apparatus and device 有权
    LITHOGRAPHIC装置和装置的制造方法

    公开(公告)号：JP2008139289A

    公开(公告)日：2008-06-19

    申请号：JP2007284937

    申请日：2007-11-01

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： LOOPSTRA ERIK R ,  EUSSEN EMIEL JOZEF MELANIE ,  VAN DER PASCH ENGELBERTUS ANTO ,  LOOPSTRA ONNO BRAM

    IPC: G01B11/00 ,  H01L21/027 ,  H01L21/68

    CPC classification number: G03F9/7011 ,  G03F7/70516 ,  G03F7/70775 ,  G03F9/7019

    Abstract: PROBLEM TO BE SOLVED: To provide method for calibration of diffraction gratings on encoder measurement system between two adjacent calibrated positions. SOLUTION: This method intends to relocate sensor object containing encoder type sensor and one of the diffraction gratings along the sensor object and the other diffraction grating at a regular speed. It includes the process of such a relocation in which the above speed is selected so that disorder substantially-elongated throughout the span shorter than distance between the two adjacent calibrated positions may not followed by the above sensor object and one of the diffraction gratings or may only partially be followed, and the process of measuring location of the sensor object to the diffraction grating in a plurality of locations between the two adjacent calibrated positions during the above relocation. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供在两个相邻校准位置之间的编码器测量系统上的衍射光栅的校准方法。 解决方案：该方法旨在以常规速度沿着传感器对象和其他衍射光栅重新定位包含编码器型传感器的传感器对象和衍射光栅之一。 它包括这样的重新定位的过程，其中选择上述速度，使得整个跨度短于两个相邻的校准位置之间的距离的紊乱可能不在上述传感器对象和衍射光栅之一或者仅可以 并且在上述重新定位期间在两个相邻校准位置之间的多个位置中测量传感器对象到衍射光栅的位置的过程。 版权所有（C）2008，JPO＆INPIT

    Lithographic apparatus and device manufacturing method
    8.
    发明专利
    Lithographic apparatus and device manufacturing method 审中-公开
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2007251160A

    公开(公告)日：2007-09-27

    申请号：JP2007054987

    申请日：2007-03-06

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： LOOPSTRA ERIK R ,  VAN DER PASCH ENGELBERTUS ANTO

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70775 ,  G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To continuously measure the positions of a first substrate stage and a second substrate stage, in a lithographic apparatus for confining a liquid in a space between a final element of a projecting system and a substrate. SOLUTION: The lithographic apparatus includes the first and second substrate stages, and is configured and arranged so as to cooperate in performing a joint movement for making the lithographic apparatus transit from a first arrangement in which the liquid is confined between a first substrate held by the first substrate stage and the final element, to a second arrangement in which the liquid is confined between a second substrate held by the second substrate stage and the final element. In this way, during the joint movement, the liquid is essentially confined within the space with respect to the final element. The lithographic apparatus also includes a position measurement system configured, at least during the joint movement, to measure the positions of the first and second substrate stages. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：为了连续测量第一基板台和第二基板台的位置，用于将液体限制在投影系统的最终元件和基板之间的空间中的光刻设备中。 解决方案：光刻设备包括第一和第二衬底台，并且被配置和布置成协作以执行关节运动，以使光刻设备从其中限定液体的第一布置转移到第一衬底 由第一衬底台和最终元件固定到第二布置，其中液体被限制在由第二衬底台保持的第二衬底和最终元件之间。 以这种方式，在关节运动期间，液体基本上被限制在相对于最终元件的空间内。 光刻设备还包括位置测量系统，其至少在关节运动期间被配置为测量第一和第二基底台的位置。 版权所有（C）2007，JPO＆INPIT

    Lithography apparatus and method of manufacturing device
    9.
    发明专利
    Lithography apparatus and method of manufacturing device 有权
    平面设备及其制造方法

    公开(公告)号：JP2007165875A

    公开(公告)日：2007-06-28

    申请号：JP2006325814

    申请日：2006-12-01

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： SCHOORMANS CAROLUS JOHANNES C ,  EUSSEN EMIEL JOZEF M ,  KOENEN WILLEM HERMAN GERTRUDA ,  LALLEMANT NICOLAS A ,  VAN DER PASCH ENGELBERTUS ANTO ,  ADRIAENS JOHANNES MATHIAS T A

    IPC: H01L21/027 ,  G01B11/00 ,  G03F9/00

    CPC classification number: G03F7/70775

    Abstract: PROBLEM TO BE SOLVED: To provide a method and an apparatus having high accuracy in determining a position of a movable object. SOLUTION: The method of manufacturing a device includes projecting a patterned radiation beam to a substrate wherein a position of a movable object is determined with multiple degrees of freedom using many sensors, the number of sensors is larger than the number of degrees of freedom, the position of the movable object is determined with the degrees of freedom using a signal from each of the sensors, and the signal from the sensor is weighed based on difference in noise level of each sensor. The lithography apparatus has improved accuracy in measurement of a position of the movable object and/or superposition ability and focusing ability. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种在确定可移动物体的位置时具有高精度的方法和装置。 解决方案：制造装置的方法包括将图案化的辐射束投影到基板，其中使用许多传感器以多个自由度确定可移动物体的位置，传感器的数量大于 自由度，使用来自每个传感器的信号，利用自由度来确定可移动物体的位置，并且基于每个传感器的噪声水平的差异来称量来自传感器的信号。 光刻装置提高了可移动物体的位置的测量精度和/或叠加能力和聚焦能力。 版权所有（C）2007，JPO＆INPIT

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