公开(公告)号：JP2009027165A

公开(公告)日：2009-02-05

申请号：JP2008184066

申请日：2008-07-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CORNELIS MARTIJN JOHANNES RICK ,  WONG PATRICK ,  DAVERVELD RALF MARTINUS MARINU ,  BEERENS JOS

IPC: H01L21/027 ,  B05C5/00 ,  B05C11/10

CPC classification number: H01L21/6715

Abstract: PROBLEM TO BE SOLVED: To provide a dispenser system for small amount of resist which can reduce contamination and/or defects of patterns. SOLUTION: A dispenser for small amount of resist includes a pressure operated valve capable of reverse aspiration which can be connected with a controller output portion which opens and closes a valve to control supply of liquid to a nozzle of a spin coater and the spin coater, wherein the dispenser comprises a holder for a bottle for pressurizing fluid in the bottle by applying gas pressure. The dispenser is suitable for using with a bottle which is filled with 100 ml to 300 ml of resist sample in advance. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供可以减少图案污染和/或缺陷的少量抗蚀剂的分配系统。 解决方案：用于少量抗蚀剂的分配器包括能够反向抽吸的压力操作阀，其可与控制器输出部分连接，该控制器输出部分打开和关闭阀门以控制向旋涂机的喷嘴供应液体， 旋转涂布机，其中分配器包括用于通过施加气体压力来对瓶中的流体加压的瓶的保持器。 分配器适用于预先用填充有100ml至300ml抗蚀剂样品的瓶子使用。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：NL1035684A1

公开(公告)日：2009-01-27

申请号：NL1035684

申请日：2008-07-11

Applicant: ASML NETHERLANDS BV

Inventor： RICKEN CORNELIS MARTIJN JOHANNES ,  WONG PATRICK ,  DAVERVELD RALF MARTINUS MARINUS ,  BEERENS JOS

IPC: B05B9/04