公开(公告)号：JP2006191060A

公开(公告)日：2006-07-20

申请号：JP2005374829

申请日：2005-12-27

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： JOERI LOF ,  DE SMIT JOANNES T

IPC: H01L21/027 ,  G02B7/28 ,  G03F7/20

CPC classification number: G03F7/70275 ,  G03F7/70258 ,  G03F7/70291

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic device improved to be controllable of a distance between an array and a substrate by using an individually controllable position of a member or a microlense array to rectify the change in a thickness of the substrate that brings inaccuracies in exposure in the lithographic device.
SOLUTION: The lithographic device of the present invention includes: a lens array arranged in a plane to project a patterned radiation beam onto a target position of a substrate and to have individual lenses transmit different parts of the radiation beam; a measuring device configured to measure a distance between a portion of said substrate and a part of the lens array; and an actuator system adapted to adjust the overall position and tilt of the lens array based on the measurement made by the measuring device.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：为了提供通过使用元件或微透镜阵列的独立可控位置来改善阵列和基板之间的距离而可改进的光刻设备，以矫正基板的厚度变化， 在光刻设备中的曝光带来不准确之处。 解决方案：本发明的光刻设备包括：透镜阵列，布置在平面中以将图案化的辐射束投影到基板的目标位置上，并且具有单独的透镜透射辐射束的不同部分; 测量装置，被配置为测量所述基板的一部分与所述透镜阵列的一部分之间的距离; 以及适于基于由测量装置进行的测量来调整透镜阵列的总体位置和倾斜的致动器系统。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006186370A

公开(公告)日：2006-07-13

申请号：JP2005372597

申请日：2005-12-26

Applicant: ASML NETHERLANDS BV

Inventor： BIJNEN FRANCISCUS GODEFRIDUS C ,  DE SMIT JOANNES T

IPC: H01L21/027 ,  G03F7/20

Abstract: PROBLEM TO BE SOLVED: To provide a system and a method that can compensate for temperature during manufacture of a substrate by reducing an alignment error due to thermal expansion on the basis of a plurality of standards by a lithography device for manufacturing a large-sized device. SOLUTION: A pattern 2 of array marks 20 widely distributed on a substrate 1, and arrays 21 and 22 of dots, are projected on the substrate 1 by a beam patterning and projection system 3 with a patterning radiation beam. An operation system 4 places in the substrate and projection system in relative motion, and a detection system 5 detects the array marks individually. The operation system 4 positions the substrate 1 relatively to the projection system 3, projects the patterning radiation beam on a target portion of the substrate 1, and adjusts pattern data based upon the detection result to perform temperature compensation. COPYRIGHT: (C)2006,JPO&NCIPI

公开(公告)号：JP2010068002A

公开(公告)日：2010-03-25

申请号：JP2009285201

申请日：2009-12-16

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JOERI LOF ,  DE SMIT JOANNES T

IPC: H01L21/027

CPC classification number: G03F7/70275 ,  G03F7/70258 ,  G03F7/70291

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic device improved so as to control the interval distance between the array and the substrate using the position of individually controllable members or a micro-lens array for correcting the thickness change of a substrate, which may cause inaccuracy in exposure in a lithographic device.
SOLUTION: The lithographic device includes a lens array arranged in a plane so that a patterned radiation beam is projected to a target position of a substrate and each lens transmits a different portion of the radiation beam, a measurement device for measuring the interval distance between part of the substrate and part of the lens array, and a driving system for adjusting the entire position and the inclination of the lens array based on the measurement with the measurement device.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种改进的光刻设备，以便使用单独可控制的构件的位置或用于校正衬底的厚度变化的微透镜阵列的位置来控制阵列和衬底之间的间隔距离，其中 可能会导致光刻设备曝光不准确。 光刻设备包括布置在平面中的透镜阵列，使得图案化的辐射束投影到基板的目标位置，并且每个透镜透射辐射束的不同部分，用于测量间隔的测量装置 基板的一部分与透镜阵列的一部分之间的距离，以及基于测量装置的测量来调整透镜阵列的整体位置和倾斜度的驱动系统。 版权所有（C）2010，JPO＆INPIT