公开(公告)号：JP2013021320A

公开(公告)日：2013-01-31

申请号：JP2012147331

申请日：2012-06-29

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： FRANK JOHANNES JACOBUS VAN BOXTEL ,  GOSEN JEROEN GERARD ,  KUIPER ANTONY ,  MARTENS ARJAN HUBRECHT JOSEF ANNA ,  JEAN-PHILIPPE XAVIER VAN DAMME ,  PETER SCHOENMAKERS ,  FRANCISCUS JOANNES ANTHONIUS EVERS ,  JAAP WILHELMUS PETRUS VAN EMPEL ,  LEON HUBERT JOSEPH COUMANS ,  JUSTIN JOHANNES HERMANUS GERRITZEN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70866 ,  G03F7/70916 ,  G03F7/70933

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus having a component that moves in a first direction, the component including a passive gas flow system.SOLUTION: The passive gas flow system has a gas inlet to drive gas into the passive gas flow system when the component moves in the first direction and a gas outlet, connected to the gas inlet by a gas conduit, to direct the gas that is driven into the passive gas flow system in a certain direction.

Abstract translation: 要解决的问题：为了提供具有沿第一方向移动的部件的光刻设备，该部件包括被动气体流动系统。 解决方案：被动气体流动系统具有气体入口，当组件沿第一方向移动时，将气体驱动到被动气体流动系统中，气体出口通过气体导管连接到气体入口，以引导气体 被驱动到一定方向的被动气体流动系统中。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2012209555A

公开(公告)日：2012-10-25

申请号：JP2012069038

申请日：2012-03-26

Applicant: Asml Holding Nv ,  Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ. ,  エーエスエムエル ホールディング エヌ.ブイ.

Inventor： HERMAN VOGEL ,  GOSEN JEROEN GERARD ,  PAARHUIS BART DINAND ,  VAN BOXTEL FRANK JOHANNES JACOBUS ,  LI JINGGAO

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70908 ,  G03F7/70866

Abstract: PROBLEM TO BE SOLVED: To provide, for example, an arrangement which addresses some problems associated with movement of a support.SOLUTION: An apparatus, in an embodiment, has a patterning device support including a first planar element having a first flow-restricting surface; a second planar element including a second flow-restricting surface facing the first flow-restricting surface; a support driver to linearly move the support along a certain direction relative to the second planar element. The first and/or second flow-restricting surface has one or more projections and/or recesses between the first and second flow-restricting surfaces. The projection and/or recess on the first and/or second flow-restricting surface is arranged to provide a flow resistance, per unit width of the first and/or second flow-restricting surface perpendicular to a flow, that is lower against a flow that is parallel to the certain direction than against a flow that is perpendicular to the certain direction. The flow-restricting surfaces may direct a gas flow onto a driver part that generates heat.

Abstract translation: 要解决的问题：提供例如解决与支撑件的移动有关的一些问题的装置。 解决方案：在一个实施例中，一种装置具有包括具有第一流动限制表面的第一平面元件的图案形成装置支撑件; 第二平面元件，包括面向第一流动限制表面的第二流动限制表面; 支撑驱动器，用于沿着相对于第二平面元件的一定方向线性地移动支撑件。 第一和/或第二流动限制表面在第一和第二流动限制表面之间具有一个或多个突起和/或凹部。 第一和/或第二流动限制表面上的突起和/或凹槽被布置成提供垂直于流动的第一和/或第二流动限制表面的每单位宽度的流动阻力，其相对于流动较低 其平行于一定方向，而不是垂直于该方向的流动。 流动限制表面可以将气流引导到产生热量的驱动器部件上。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2011129913A

公开(公告)日：2011-06-30

申请号：JP2010276685

申请日：2010-12-13

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： GOSEN JEROEN GERARD ,  JANSEN ALBERT JOHANNES MARIA ,  KATE NICOLAAS TEN ,  STAVENGA MARCO KOERT ,  STEFFENS KOEN ,  VAN BOKHOVEN LAURENTIUS JOHANNES ADRIANUS ,  CASTELIJNS HENRICUS JOZEF ,  CUYPERS KOEN

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/7085

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus that reduces an latent harmful influence of a droplet left on a sensor and/or a target for the sensor.
SOLUTION: An immersion lithographic apparatus is disclosed that includes a table having a surface and the sensor, or the target for the sensor, or both, the sensor and/or target having a first area which is lyophobic to immersion liquid and a second area which is lyophilic to immersion liquid, and a liquid displacement device configured to displace liquid on the sensor and/or target, wherein the liquid displacement device includes a gas outlet opening configured to direct a gas flow toward the first and second areas. A property of a part of the gas flow introduced into the first area is different from a property of a part of the gas flow introduced into the second area.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种降低传感器和/或传感器目标上剩下的液滴的潜在有害影响的光刻设备。 解决方案：公开了一种浸没式光刻设备，其包括具有表面和传感器的表，或用于传感器的目标或两者，传感器和/或目标具有与浸没液体疏液的第一区域和 第二区域，其与浸没液体是亲液性的;以及液体置换装置，其构造成在所述传感器和/或目标物上移置液体，其中所述液体置换装置包括气体出口，所述气体出口被配置为引导气流朝向所述第一和第二区域。 引入第一区域的气流的一部分的性质与引入第二区域的气流的一部分的性质不同。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011199284A

公开(公告)日：2011-10-06

申请号：JP2011055343

申请日：2011-03-14

Applicant: Asml Holding Nv ,  Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ. ,  エーエスエムエル ホールディング エヌ.ブイ.

Inventor： GOSEN JEROEN GERARD ,  VAN DER NET ANTONIUS JOHANNUS ,  PAARHUIS BART DINAND ,  VAN BOXTEL FRANK JOHANNES JACOBUS ,  LI JINGGAO

IPC: H01L21/027

CPC classification number: G03F7/70916

Abstract: PROBLEM TO BE SOLVED: To reduce or eliminate a risk of contamination in a lithographic apparatus.SOLUTION: A gas curtain is provided to separate a component of the lithographic apparatus from contaminated gas. The gas curtain is supplied by an opening. The opening is at a boundary of a protection environment with which a surface of the component comes into contact. The gas curtain may separate the component from a moving part of the apparatus.

Abstract translation: 要解决的问题：减少或消除光刻设备中污染的风险。解决方案：提供气幕以将光刻设备的组件与污染气体分离。 气幕由开口提供。 开口处于组件表面接触的保护环境的边界。 气幕可以将组件与设备的移动部分分离。

公开(公告)号：JP2011119725A

公开(公告)日：2011-06-16

申请号：JP2010261888

申请日：2010-11-25

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： GOSEN JEROEN GERARD ,  CUYPERS KOEN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/7085 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To prevent defect caused by water remaining on a surface where it is difficult to move water while water is not preferable, in a lithographic apparatus. SOLUTION: An immersion lithographic apparatus having a table constituted so as to support a substrate is provided. A sensor or a sensor target is provided on a table surface, and a cover extending from an edge of the table is provided. Furthermore, a liquid moving device including a gas outlet is provided, wherein the gas outlet is constituted so as to guide local gas flow toward the sensor or the target in order to move a liquid from the sensor or the target over the cover and off the table. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了防止在水不是优选的地方移动水的表面上残留的缺陷，在光刻设备中。 提供一种具有构成为支撑基板的工作台的浸没式光刻设备。 传感器或传感器目标设置在台面上，并且提供从桌子的边缘延伸的盖。 此外，提供了包括气体出口的液体移动装置，其中，气体出口被构造成引导局部气体朝向传感器或目标物流动，以便将液体从传感器或目标物移动到盖上并且离开 表。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：NL2014159A

公开(公告)日：2015-08-25

申请号：NL2014159

申请日：2015-01-20

Applicant: ASML NETHERLANDS BV

Inventor： NAKIBOGLU GÜNES ,  BAREN MARTIJN ,  BOXTEL FRANK JOHANNES JACOBUS ,  CUYPERS KOEN ,  GOSEN JEROEN GERARD ,  BOKHOVEN LAURENTIUS JOHANNES ADRIANUS

IPC: G03F7/20

Abstract: A lithographic apparatus including a barrier system and a device manufacturing method using such a lithographic apparatus. The barrier system is used to maintain a protected volume of gas within a barrier. The protected volume may be maintained when different components of the lithographic apparatus move relative to each other. The barrier system may be used in different locations within the lithographic apparatus. The geometry of the barrier affects how efficiently the protected volume is maintained, especially at high speeds. The geometry reduces the amount of ambient gas entering the protected volume from outside the barrier.