公开(公告)号：KR20210009445A

公开(公告)日：2021-01-26

申请号：KR20217001688

申请日：2017-08-28

Applicant: ASML NETHERLANDS BV

Inventor： VAN DEN EIJNDEN PEPIJN ,  ROPS CORNELIUS MARIA ,  POLET THEODORUS WILHELMUS ,  KEUKENS FLOOR LODEWIJK ,  TANASA GHEORGHE ,  CORTIE ROGIER HENDRIKUS MAGDALENA ,  CUYPERS KOEN ,  BUDDENBERG HAROLD SEBASTIAAN ,  GATTOBIGIO GIOVANNI LUCA ,  VAN VLIET EVERT ,  TEN KATE NICOLAAS ,  FRENCKEN MARK JOHANNES HERMANUS ,  VAN ERVE JANTIEN LAURA ,  TEUNISSEN MARCEL MARIA CORNELIUS FRANCISCUS

IPC: G03F7/20

Abstract: 침지유체를리소그래피장치의일부영역에국한시키도록구성된유체처리구조물(12)은, 침지액체를통해투영비임이통과하도록형성된구멍(15); 제 1 부분(100); 및제 2 부분(200)을포함하고, 제 1 부분과제 2 부분중의적어도하나는영역으로부터침지유체를빼내기위한표면(20)을형성하고, 유체처리구조물은유체처리구조물의표면에출입하는유체유동을제공하고, 제 2 부분에대한제 1 부분의운동은구멍에대한표면에출입하는유체유동의위치를변화시키는데효과적이고, 제 1 부분과제 2 부분중의하나는유체유동이통과하는적어도하나의관통공(51, 61)을포함하고, 제 1 부분과제 2 부분중의다른하나는유체유동이통과하는적어도하나의개구(55, 65)를포함하며, 적어도하나의관통공및 적어도하나의개구는서로정렬되면유체연통하고, 운동에의해적어도하나의개구가적어도하나의관통공중의하나와정렬되어, 구멍에대한표면에출입하는유체유동의위치가변하게된다.

公开(公告)号：JP2011129913A

公开(公告)日：2011-06-30

申请号：JP2010276685

申请日：2010-12-13

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： GOSEN JEROEN GERARD ,  JANSEN ALBERT JOHANNES MARIA ,  KATE NICOLAAS TEN ,  STAVENGA MARCO KOERT ,  STEFFENS KOEN ,  VAN BOKHOVEN LAURENTIUS JOHANNES ADRIANUS ,  CASTELIJNS HENRICUS JOZEF ,  CUYPERS KOEN

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/7085

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus that reduces an latent harmful influence of a droplet left on a sensor and/or a target for the sensor.
SOLUTION: An immersion lithographic apparatus is disclosed that includes a table having a surface and the sensor, or the target for the sensor, or both, the sensor and/or target having a first area which is lyophobic to immersion liquid and a second area which is lyophilic to immersion liquid, and a liquid displacement device configured to displace liquid on the sensor and/or target, wherein the liquid displacement device includes a gas outlet opening configured to direct a gas flow toward the first and second areas. A property of a part of the gas flow introduced into the first area is different from a property of a part of the gas flow introduced into the second area.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种降低传感器和/或传感器目标上剩下的液滴的潜在有害影响的光刻设备。 解决方案：公开了一种浸没式光刻设备，其包括具有表面和传感器的表，或用于传感器的目标或两者，传感器和/或目标具有与浸没液体疏液的第一区域和 第二区域，其与浸没液体是亲液性的;以及液体置换装置，其构造成在所述传感器和/或目标物上移置液体，其中所述液体置换装置包括气体出口，所述气体出口被配置为引导气流朝向所述第一和第二区域。 引入第一区域的气流的一部分的性质与引入第二区域的气流的一部分的性质不同。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011119725A

公开(公告)日：2011-06-16

申请号：JP2010261888

申请日：2010-11-25

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： GOSEN JEROEN GERARD ,  CUYPERS KOEN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/7085 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To prevent defect caused by water remaining on a surface where it is difficult to move water while water is not preferable, in a lithographic apparatus. SOLUTION: An immersion lithographic apparatus having a table constituted so as to support a substrate is provided. A sensor or a sensor target is provided on a table surface, and a cover extending from an edge of the table is provided. Furthermore, a liquid moving device including a gas outlet is provided, wherein the gas outlet is constituted so as to guide local gas flow toward the sensor or the target in order to move a liquid from the sensor or the target over the cover and off the table. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了防止在水不是优选的地方移动水的表面上残留的缺陷，在光刻设备中。 提供一种具有构成为支撑基板的工作台的浸没式光刻设备。 传感器或传感器目标设置在台面上，并且提供从桌子的边缘延伸的盖。 此外，提供了包括气体出口的液体移动装置，其中，气体出口被构造成引导局部气体朝向传感器或目标物流动，以便将液体从传感器或目标物移动到盖上并且离开 表。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：NL2014159A

公开(公告)日：2015-08-25

申请号：NL2014159

申请日：2015-01-20

Applicant: ASML NETHERLANDS BV

Inventor： NAKIBOGLU GÜNES ,  BAREN MARTIJN ,  BOXTEL FRANK JOHANNES JACOBUS ,  CUYPERS KOEN ,  GOSEN JEROEN GERARD ,  BOKHOVEN LAURENTIUS JOHANNES ADRIANUS

IPC: G03F7/20

Abstract: A lithographic apparatus including a barrier system and a device manufacturing method using such a lithographic apparatus. The barrier system is used to maintain a protected volume of gas within a barrier. The protected volume may be maintained when different components of the lithographic apparatus move relative to each other. The barrier system may be used in different locations within the lithographic apparatus. The geometry of the barrier affects how efficiently the protected volume is maintained, especially at high speeds. The geometry reduces the amount of ambient gas entering the protected volume from outside the barrier.

公开(公告)号：NL2012291A

公开(公告)日：2014-08-21

申请号：NL2012291

申请日：2014-02-19

Applicant: ASML NETHERLANDS BV ,  ASML HOLDING NV

Inventor： CUYPERS KOEN ,  ANDRADE OLIVEIRA MARCELO ,  REMIE MARINUS ,  SINGH CHATTARBIR ,  BOKHOVEN LAURENTIUS ,  VEN HENRICUS ,  FONSECA JUNIOR JOS ,  BOXTEL FRANK ,  BURBANK DANIEL ,  LOOPSTRA ERIK ,  ONVLEE JOHANNES ,  SCHUSTER MARK ,  BALLEGOIJ ROBERTUS ,  WARD CHRISTOPHER ,  WESTERLAKEN JAN

IPC: G03F7/20

公开(公告)号：NL2005528A

公开(公告)日：2011-06-07

申请号：NL2005528

申请日：2010-10-15

Applicant: ASML NETHERLANDS BV

Inventor： GOSEN JEROEN ,  CUYPERS KOEN

IPC: G03F7/20

公开(公告)号：NL2005717A

公开(公告)日：2011-06-21

申请号：NL2005717

申请日：2010-11-18

Applicant: ASML NETHERLANDS BV

Inventor： GOSEN JEROEN ,  JANSEN ALBERT ,  KATE NICOLAAS ,  STAVENGA MARCO ,  STEFFENS KOEN ,  BOKHOVEN LAURENTIUS ,  CASTELIJNS HENRICUS ,  CUYPERS KOEN

IPC: G03F7/20