公开(公告)号：NL2011476A

公开(公告)日：2014-04-07

申请号：NL2011476

申请日：2013-09-20

Applicant: ASML NETHERLANDS BV ,  ASML HOLDING NV

Inventor： BOEF ARIE JEFFREY ,  KREUZER JUSTIN ,  MATHIJSSEN SIMON GIJSBERT JOSEPHUS ,  NIJMEIJER GERRIT ,  SWINDAL J CHRISTIAN ,  TINNEMANS PATRICIUS ALOYSIUS JACOBUS ,  HAREN RICHARD JOHANNES FRANCISCUS

IPC: G03F7/20 ,  G03F9/00

公开(公告)号：NL2013668A

公开(公告)日：2015-07-13

申请号：NL2013668

申请日：2014-10-23

Applicant: ASML NETHERLANDS BV

Inventor： CEKLI HAKKI ERGÜN ,  LIU XING LAN ,  SLOTBOOM DAAN MAURITS ,  TEL WIM TJIBBO ,  SANDEN STEFAN CORNELIS THEODORUS ,  HAREN RICHARD JOHANNES FRANCISCUS

IPC: H01L21/68 ,  G03F7/20

Abstract: A lithographic apparatus applies a pattern repeatedly to target portions across a substrate. Prior to applying the pattern an alignment sensor measures positions of marks in the plane of the substrate and a level sensor measures height deviations in a direction normal to the plane of the substrate. The apparatus applies the pattern to the substrate while positioning the applied pattern using the positions measured by the alignment sensor and using the height deviations measured by the level sensor. The apparatus is further arranged to calculate and apply corrections in the positioning of the applied pattern, based on derivatives of the measured height deviations. The corrections may be calculated on an intrafield and/or interfield basis. The corrections may be based on changes between the observed height deviations and height deviations measured previously on the same substrate.