公开(公告)号：JP2004186691A

公开(公告)日：2004-07-02

申请号：JP2003404012

申请日：2003-12-03

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VAN DE KERKHOF MARCUS ADRIANUS ,  DE BOEIJ WILHELMUS PETRUS ,  HEMERIK MARCEL MAURICE

IPC: G21K5/00 ,  G01J1/42 ,  G01J1/58 ,  G01T1/20 ,  G02B5/26 ,  G03F7/20 ,  G21K5/02 ,  H01L21/027

CPC classification number: G03F7/70558 ,  G01J1/429 ,  G01J1/58 ,  G03F7/7085

Abstract: PROBLEM TO BE SOLVED: To improve the detection property of a present photodetector having a transformation layer so as to achieve the higher yield and restrain the generation of any ghost. SOLUTION: A lithography projector is provided with a radiation system for supplying a projection beam of primary radiation, a supporting structure for supporting a patterning means which acts to patternize a projection beam according to the required pattern, a substrate table for holding a substrate, a projection system for projecting the patternized beam on the target part of the substrate, and a radiation sensor which can move in a path in which the projection beam traverses, to accept the primary radiation from the projection beam. The sensor is provided with a radiation sensitive material which converts the incident primary radiation into the secondary radiation, a sensing means which can detect the secondary radiation from the radiation sensitive material, and a filter material for substantially blocking the secondary radiation from propagating in the direction that the secondary radiation gets away from the sensing means. COPYRIGHT: (C)2004,JPO&NCIPI

公开(公告)号：SG120965A1

公开(公告)日：2006-04-26

申请号：SG200307146

申请日：2003-12-03

Applicant: ASML NETHERLANDS BV

Inventor： KERKHOF VAN DE MARCUS ADRIANUS ,  BOEIJ DE WILHELMUS PETRUS ,  HEMERIK MARCEL MAURICE

IPC: G21K5/00 ,  G01J1/42 ,  G01J1/58 ,  G01T1/20 ,  G02B5/26 ,  G03F7/20 ,  G21K5/02 ,  H01L21/027 ,  H01L31/00

Abstract: A lithographic projection apparatus comprising: a radiation system for providing a projection beam of primary radiation; a support structure for supporting patterning means, the patterning means serving to pattern the projection beam according to a desired pattern; a substrate table for holding a substrate; a projection system for projecting the patterned beam onto a target portion of the substrate; a radiation sensor which is moveable in a path traversed by the projection beam, for receiving primary radiation out of the projection beam, said sensor comprising: a radiation-sensitive material which converts incident primary radiation into secondary radiation; sensing means capable of detecting said secondary radiation emerging from said material; and a filter material for preventing secondary radiation from traveling in a direction away from the sensing means.