公开(公告)号：SG125238A1

公开(公告)日：2006-09-29

申请号：SG200601220

申请日：2006-02-24

Applicant: ASML NETHERLANDS BV

Inventor： KOK HAICO VICTOR ,  KERKHOF VAN DE MARCUS ADRIANUS ,  KRUIZINGA BORGERT ,  SENGERS TIMOTHEUS FRANCISCUS ,  MOEST BEARRACH ,  HAAST MARC ANTONIUS MARIA ,  WEISSBRODT PETER WERNER ,  SCHRENK MANFRED HELMUT GUSTAV ,  HARZENDORF TORSTEN

Abstract: A sensor for use at substrate level in a high-NA lithographic apparatus has a transparent plate covering a sensing element and arrangements to improve coupling of radiation into the sensing element, including Fresnel lenses, holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.

公开(公告)号：SG120965A1

公开(公告)日：2006-04-26

申请号：SG200307146

申请日：2003-12-03

Applicant: ASML NETHERLANDS BV

Inventor： KERKHOF VAN DE MARCUS ADRIANUS ,  BOEIJ DE WILHELMUS PETRUS ,  HEMERIK MARCEL MAURICE

IPC: G21K5/00 ,  G01J1/42 ,  G01J1/58 ,  G01T1/20 ,  G02B5/26 ,  G03F7/20 ,  G21K5/02 ,  H01L21/027 ,  H01L31/00

Abstract: A lithographic projection apparatus comprising: a radiation system for providing a projection beam of primary radiation; a support structure for supporting patterning means, the patterning means serving to pattern the projection beam according to a desired pattern; a substrate table for holding a substrate; a projection system for projecting the patterned beam onto a target portion of the substrate; a radiation sensor which is moveable in a path traversed by the projection beam, for receiving primary radiation out of the projection beam, said sensor comprising: a radiation-sensitive material which converts incident primary radiation into secondary radiation; sensing means capable of detecting said secondary radiation emerging from said material; and a filter material for preventing secondary radiation from traveling in a direction away from the sensing means.

公开(公告)号：SG123712A1

公开(公告)日：2006-07-26

申请号：SG200508042

申请日：2005-12-13

Applicant: ASML NETHERLANDS BV

Inventor： SENGERS TIMOTHEUS FRANCISCUS ,  KERKHOF VAN DE MARCUS ADRIANUS

Abstract: An analyser plate (AP) between a projection system (PL) and a radiation sensor (DS) is illuminated by a beam of projection radiation. The analyser plate contains 2 crossing regions, each of which transmits radiation with a different polarisation direction. The beam of projection radiation is patterned without influencing the polarisation of the beam. By patterning the beam of projection radiation so that one region receives more radiation than the other region, the radiation sensor (DS) is given polarisation selectivity.

公开(公告)号：SG125245A1

公开(公告)日：2006-09-29

申请号：SG200601339

申请日：2006-03-01

Applicant: ASML NETHERLANDS BV

Inventor： KERKHOF VAN DE MARCUS ADRIANUS ,  VOS HARALD PETRUS CORNELIS

Abstract: A system and method are used to detect parameters regarding an exposure portion or an exposure beam. The system comprising a substrate stage and a metrology stage. The substrate stage is configured to position a substrate to receive an exposure beam from an exposure portion of a lithography system. The metrology stage has a sensor system thereon that is configured to detected parameters of the exposure system or the exposure beam. In one example, the system is within a lithography system, which further comprises an illumination system, a patterning device, and a projection system. The patterning device patterns a beam of radiation from the illumination system. The projection system, which is located within the exposure portion, projects that pattered beam onto the substrate or the sensor system.