Method and equipment for inspection, lithographic apparatus, lithographic processing cell, and device manufacturing method
    1.
    发明专利
    Method and equipment for inspection, lithographic apparatus, lithographic processing cell, and device manufacturing method 有权
    用于检查的方法和设备,光刻设备,光刻处理单元和器件制造方法

    公开(公告)号:JP2008160107A

    公开(公告)日:2008-07-10

    申请号:JP2007322284

    申请日:2007-12-13

    CPC classification number: G03F7/70616

    Abstract: PROBLEM TO BE SOLVED: To provide a system in which outputs of as many drive systems as possible can be used when a lithographing position moves from one target to next target on a substrate.
    SOLUTION: The drive system plays a role in moving a substrate, for example, in a lower location of an illumination system or a measuring radiation beam. The first drive system drives the substrate in a direction of X, and the second drive system drives the substrate in a direction of Y. Targets are arranged in a lattice form in order to measure a form of a surface of the substrate. It is not performed that directions of the lattice are aligned along the direction of X and the direction of Y and thereby only one drive system is required to act for moving a lithographing position from one target to next target, but it is performed that the directions of the lattice are aligned along directions having some angles to the X and the Y axes and thereby both the drive systems are required to act for moving a lithographing position between targets. Also targets (or sub-targets in a target) can be reciprocally arranged in such a way that spaces of scribing lanes are saved and the routes most economical are formed among them.
    COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题:提供一种当平版印刷位置从基板上的一个目标移动到下一个目标时可以使用尽可能多的驱动系统的输出的系统。 解决方案:驱动系统在移动衬底(例如在照明系统的较低位置或测量辐射束)中起作用。 第一驱动系统沿X方向驱动基板,第二驱动系统沿Y方向驱动基板。为了测量基板的表面的形状,目标以格子形式布置。 不执行格子的方向沿着X的方向和Y的方向排列,从而仅需要一个驱动系统用于将平版印刷位置从一个目标移动到下一个目标,而是执行方向 的格子沿着与X和Y轴具有一定角度的方向排列,由此驱动系统需要用于在目标之间移动平版印刷位置。 目标(或目标中的子目标)也可以相互排列,以便节省刻划车道的空间,并在其间形成最经济的路线。 版权所有(C)2008,JPO&INPIT

    Method and device for inspection, lithographic device, lithographic processing cell, and method for manufacturing device
    2.
    发明专利
    Method and device for inspection, lithographic device, lithographic processing cell, and method for manufacturing device 有权
    用于检查的方法和装置,光刻设备,光刻处理单元及其制造方法

    公开(公告)号:JP2008166734A

    公开(公告)日:2008-07-17

    申请号:JP2007302404

    申请日:2007-11-22

    Abstract: PROBLEM TO BE SOLVED: To provide a fault detection/classification system without increasing complicatedness in calculation and a calculation time caused thereby, in other words, that uses as many data points as possible without reducing a throughput of substrates in a lithographic device. SOLUTION: An abnormality detection/classification method that checks dispersion in a raw data using a raw back-focal-plane image data of radiation from a substrate surface detected by a scatterometer detector, and associates the variation in the raw data that may possibly occur in the lithographic device or a fault that may possibly occur in a process where the substrate surface is patterned is disclosed. The association is performed by comparing the variation in the raw data with known metrological data. After the fault is checked, a user can receive the information on the fault. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题:提供故障检测/分类系统而不会增加计算的复杂性和由此引起的计算时间,换句话说,尽可能地使用尽可能多的数据点而不降低光刻设备中的基板的通过量 。 解决方案:一种异常检测/分类方法,其使用由散射仪检测器检测的来自基板表面的辐射的原始背焦平面图像数据来检查原始数据中的色散,并且将原始数据的变化与可能 可能发生在光刻设备中或可能在衬底表面被图案化的工艺中可能发生的故障。 通过将原始数据的变化与已知计量数据进行比较来进行关联。 检查故障后,用户可以接收故障信息。 版权所有(C)2008,JPO&INPIT

    Method of imaging using lithographic projection apparatus
    3.
    发明专利
    Method of imaging using lithographic projection apparatus 有权
    使用LITHOGRAPHIC投影设备成像的方法

    公开(公告)号:JP2006178458A

    公开(公告)日:2006-07-06

    申请号:JP2005366028

    申请日:2005-12-20

    CPC classification number: G03F7/705 G03F7/70433 G03F7/70625 G03F7/70941

    Abstract: PROBLEM TO BE SOLVED: To provide a method for compensating for the effect of flare due to stray radiation in use of a projection system of lithographic apparatus to produce a pattern image on an image plane with a patterned radiation beam. SOLUTION: The method comprises: establishing a power spectral density (PSD) indicative of the spatial frequency of the stray radiation produced by the projection system; and determining, from the PSD, a modulation transfer function (MTF) relating the PSD to the pattern applied by the patterning device in such a way that the effect of flare on the pattern image is taken into account. The MTF is then used to determine the effect of flare on a critical dimension (CD) of the pattern image, and a relationship is established between any change in the CD of the pattern image and a change in the CD of the pattern. Offsetting the effect of flare on the CD of the pattern image enables the imaging performance in terms of CD uniformity for multiple pattern features to be as constant as possible. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题:提供一种用于补偿在使用光刻设备的投影系统时由于杂散辐射引起的火炬的影响的方法,以在具有图案化的辐射束的图像平面上产生图案图像。 解决方案:该方法包括:建立指示由投影系统产生的杂散辐射的空间频率的功率谱密度(PSD); 以及从PSD确定将PSD与由图案形成装置施加的图案相关联的调制传递函数(MTF),使得考虑了对图案图像的耀斑的影响。 然后使用MTF来确定耀斑对图案图像的关键尺寸(CD)的影响,并且在图案图像的CD的任何变化与图案的CD的变化之间建立关系。 抵消图案图像的CD上的光斑的影响使得能够使针对多个图案特征的CD均匀性的成像性能尽可能地恒定。 版权所有(C)2006,JPO&NCIPI

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