Abstract:
PROBLEM TO BE SOLVED: To provide a system in which outputs of as many drive systems as possible can be used when a lithographing position moves from one target to next target on a substrate. SOLUTION: The drive system plays a role in moving a substrate, for example, in a lower location of an illumination system or a measuring radiation beam. The first drive system drives the substrate in a direction of X, and the second drive system drives the substrate in a direction of Y. Targets are arranged in a lattice form in order to measure a form of a surface of the substrate. It is not performed that directions of the lattice are aligned along the direction of X and the direction of Y and thereby only one drive system is required to act for moving a lithographing position from one target to next target, but it is performed that the directions of the lattice are aligned along directions having some angles to the X and the Y axes and thereby both the drive systems are required to act for moving a lithographing position between targets. Also targets (or sub-targets in a target) can be reciprocally arranged in such a way that spaces of scribing lanes are saved and the routes most economical are formed among them. COPYRIGHT: (C)2008,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a fault detection/classification system without increasing complicatedness in calculation and a calculation time caused thereby, in other words, that uses as many data points as possible without reducing a throughput of substrates in a lithographic device. SOLUTION: An abnormality detection/classification method that checks dispersion in a raw data using a raw back-focal-plane image data of radiation from a substrate surface detected by a scatterometer detector, and associates the variation in the raw data that may possibly occur in the lithographic device or a fault that may possibly occur in a process where the substrate surface is patterned is disclosed. The association is performed by comparing the variation in the raw data with known metrological data. After the fault is checked, a user can receive the information on the fault. COPYRIGHT: (C)2008,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a method for compensating for the effect of flare due to stray radiation in use of a projection system of lithographic apparatus to produce a pattern image on an image plane with a patterned radiation beam. SOLUTION: The method comprises: establishing a power spectral density (PSD) indicative of the spatial frequency of the stray radiation produced by the projection system; and determining, from the PSD, a modulation transfer function (MTF) relating the PSD to the pattern applied by the patterning device in such a way that the effect of flare on the pattern image is taken into account. The MTF is then used to determine the effect of flare on a critical dimension (CD) of the pattern image, and a relationship is established between any change in the CD of the pattern image and a change in the CD of the pattern. Offsetting the effect of flare on the CD of the pattern image enables the imaging performance in terms of CD uniformity for multiple pattern features to be as constant as possible. COPYRIGHT: (C)2006,JPO&NCIPI
Abstract:
Inspection Method and Apparatus, Lithographic Apparatus,Lithographic Processing Cell and Device Manufacturing Method A fault detection and classification method is disclosed that uses raw back- focal-plane image data of radiation from a substrate surface, detected by a scatterometer detector, to determine a variation in the raw data and correlate the variation in the raw data with a possible fault in a lithographic apparatus or a process that patterned the substrate surface. The correlation is carried out by comparing the variation in the raw data with known metrology data. Once a fault has been determined, a user may be notified of the fault.