中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

54 records (took 0.031 seconds)

    Inspection method and apparatus, lithography apparatus, method of manufacturing lithography processing cell and device, and substrate used for the methods
    5.
    发明专利
    Inspection method and apparatus, lithography apparatus, method of manufacturing lithography processing cell and device, and substrate used for the methods 有权
    检查方法和装置，光刻设备，制造光刻处理细胞和装置的方法以及用于该方法的底物

    公开(公告)号：JP2008258593A

    公开(公告)日：2008-10-23

    申请号：JP2008049050

    申请日：2008-02-29

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： MOS EVERHARDUS CORNELIS ,  DEN BOEF ARIE JEFFREY ,  SCHAAR MAURITS VAN DER

    IPC: H01L21/027 ,  G01B11/02 ,  G01B11/24 ,  G03F7/20

    CPC classification number: G03F7/70633

    Abstract: PROBLEM TO BE SOLVED: To provide a method of measuring an overlay and a target which is used for measuring the overlay, requires just a small space on a substrate, and prevents crosstalk between measuring directions. SOLUTION: An overlay marker used with a scatterometer has two two-dimensional gratings overlapping each other. The two gratings have the same pitch, and the duty ratio of the upper grating is smaller than that of the lower grating. Thus it is possible to prevent crosstalk between an X overlay measured value and a Y overlay measured value. The gratings may directly overlap each other or may be displaced from each other so as to be alternately placed in one direction or two directions. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：为了提供用于测量覆盖层的覆盖层和目标物的测量方法，在基板上仅需要较小的空间，并且防止测量方向之间的串扰。 解决方案：与散射仪一起使用的叠加标记有两个彼此重叠的二维光栅。 两个光栅具有相同的间距，并且上部光栅的占空比小于下部光栅的占空比。 因此，可以防止X叠加测量值和Y重叠测量值之间的串扰。 光栅可以直接彼此重叠，或者可以彼此相对移位，以便沿一个方向或两个方向交替放置。 版权所有（C）2009，JPO＆INPIT

    Method and device for angular-resolved spectroscopic lithography characterization
    7.
    发明专利
    Method and device for angular-resolved spectroscopic lithography characterization 有权
    用于角分辨光谱光刻特征的方法和装置

    公开(公告)号：JP2008109104A

    公开(公告)日：2008-05-08

    申请号：JP2007240597

    申请日：2007-09-18

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： DEN BOEF ARIE JEFFREY ,  MOS EVERHARDUS CORNELIS ,  SCHAAR MAURITS VAN DER

    IPC: H01L21/027

    CPC classification number: G03F7/70633

    Abstract: PROBLEM TO BE SOLVED: To provide a method for distinguishing a false low overlay calculation. SOLUTION: Both first and 0-th diffraction orders are detected in a scatterometer. The first diffraction order is used to detect an overlay error. The 0-th diffraction order is then used to flag if this is a false overlay error calculation of magnitude greater than a bias but smaller than a pitch of a grating. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供用于区分虚假低覆盖计算的方法。

    解决方案：在散射仪中检测第一和第0衍射级。 第一个衍射顺序用于检测重叠误差。 然后使用第0衍射级来标记是否是大于偏置但小于光栅的间距的幅度的错误重叠误差计算。 版权所有（C）2008，JPO＆INPIT

    Lithography device using overlay measurement and method for manufacturing the same
    8.
    发明专利
    Lithography device using overlay measurement and method for manufacturing the same 有权
    使用覆盖测量的平面图设备及其制造方法

    公开(公告)号：JP2007266601A

    公开(公告)日：2007-10-11

    申请号：JP2007071757

    申请日：2007-03-20

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： DEN BOEF ARIE JEFFREY ,  MOS EVERHARDUS CORNELIS ,  SCHAAR MAURITS VAN DER ,  KEIJ STEFAN CAROLUS J A

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03B27/42 ,  G03F7/70633

    Abstract: PROBLEM TO BE SOLVED: To provide a method for measuring an overlay of a lithography device that more efficiently uses a space on a substrate and gives quick and correct results. SOLUTION: The lithography device includes a reference diffraction grating set 14 provided in the substrate, the reference diffraction grating set includes two reference diffraction gratings having a first directional line element and one reference diffraction grating having a second directional line element. A measurement diffraction grating set 12 is provided on the reference diffraction grating set, the reference diffraction grating set is provided with three measurement diffraction gratings similar to a reference diffraction grating. Two out of the measurement diffraction gratings are reversely deviated to each reference diffraction grating in the second direction. An overlay measuring device is provided to measure the asymmetry of three diffraction gratings in the reference set and the measuring set and obtain overlays in both the first and the second directions from the measured asymmetry. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种用于测量更有效地使用基板上的空间并提供快速和正确结果的光刻设备的覆盖层的方法。 解决方案：光刻设备包括设置在基板中的参考衍射光栅组14，参考衍射光栅组包括具有第一方向线元件和一个具有第二方向线元件的参考衍射光栅的两个参考衍射光栅。 在参考衍射光栅组上设置测量衍射光栅组12，参考衍射光栅组具有类似于参考衍射光栅的三个测量衍射光栅。 两个测量衍射光栅在第二个方向上反向偏离到每个参考衍射光栅。 提供覆盖测量装置以测量参考组和测量组中的三个衍射光栅的不对称性，并从测量的不对称性获得第一和第二方向上的重叠。 版权所有（C）2008，JPO＆INPIT

    Method of measurement, inspection apparatus, and lithographic apparatus
    9.
    发明专利
    Method of measurement, inspection apparatus, and lithographic apparatus 有权
    测量方法，检查装置和平面设备

    公开(公告)号：JP2008166755A

    公开(公告)日：2008-07-17

    申请号：JP2007320546

    申请日：2007-12-12

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： SCHAAR MAURITS VAN DER ,  DEN BOEF ARIE JEFFREY ,  MOS EVERHARDUS CORNELIS

    IPC: H01L21/66 ,  G03F9/00 ,  H01L21/027

    CPC classification number: G03F7/70633 ,  H01L22/12

    Abstract: PROBLEM TO BE SOLVED: To provide an improved method for detecting an overlay error.
    SOLUTION: A first layer of a substrate includes a plurality of diffraction gratings each having the periodicity of P. A second layer of the substrate includes a plurality of diffraction gratings that overlap a first set of diffraction gratings and having the periodicity of NP (here, N is two or greater integer). The first set of diffraction gratings have a bias +d and a second set of diffraction gratings have a bias -d. Radiation beams are projected to the diffraction gratings and an angular resolution spectrum of the reflected radiation is detected. Next, an overlay error is calculated using the angular resolution spectrum of the reflected radiation.
    COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种用于检测重叠误差的改进方法。 解决方案：衬底的第一层包括多个周期为P的衍射光栅。衬底的第二层包括与第一组衍射光栅重叠并具有NP的周期性的多个衍射光栅 （这里，N为2以上的整数）。 第一组衍射光栅具有偏压+ d，第二组衍射光栅具有偏压-d。 辐射光束投影到衍射光栅，并检测反射辐射的角度分辨率光谱。 接下来，使用反射辐射的角度分辨率光谱来计算重叠误差。 版权所有（C）2008，JPO＆INPIT

    Method and equipment for characterizing angle-resolved spectral lithography
    10.
    发明专利
    Method and equipment for characterizing angle-resolved spectral lithography 有权
    用于表征角度分辨率光谱的方法和设备

    公开(公告)号：JP2008042200A

    公开(公告)日：2008-02-21

    申请号：JP2007200475

    申请日：2007-08-01

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： MOS EVERHARDUS CORNELIS ,  DEN BOEF ARIE JEFFREY ,  SCHAAR MAURITS VAN DER ,  KEIJ STEFAN CAROLUS J A

    IPC: H01L21/027

    CPC classification number: G03B27/42 ,  G01N21/4788 ,  G01N21/95607 ,  G03F7/70516 ,  G03F7/70616 ,  G03F7/70633

    Abstract: PROBLEM TO BE SOLVED: To provide a compound alignment overlay target given on the substrate so as to enable the measurement of the alignment of a substrate to surroundings and the measurement of the relative alignment of a series of layers on the substrate.
    SOLUTION: The target is provided with an array of a structure at substantially equal intervals except a part of a structure which is an offset with the same size to a first direction and a second part of a structure which is an offset with the same size to the opposite direction. The target on the substrate can be used for the measurement of the alignment, and the same target, which is given to the second layer superimposed on the first layer, can be used for the measurement of the overlay.
    COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供在基板上给出的复合对准覆盖目标，以便能够测量基板与周围环境的对准以及基板上的一系列层的相对取向的测量。 解决方案：除了作为与第一方向具有相同尺寸的偏移的结构的一部分和与第一方向偏移的结构的第二部分之外，目标具有基本相等的间隔的结构的阵列， 相同大小相反的方向。 基板上的目标可以用于对准的测量，并且给予叠加在第一层上的第二层的相同目标可用于覆盖层的测量。 版权所有（C）2008，JPO＆INPIT

Patent Agency Ranking