公开(公告)号：JP2013165271A

公开(公告)日：2013-08-22

申请号：JP2013015532

申请日：2013-01-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MICHAEL MATTHEW M CROUSE ,  VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA ,  LIU PENG ,  LIU HUA-YU ,  JIANG AIQIN ,  HUANG WENJIN

IPC: H01L21/027 ,  G03F1/36

CPC classification number: G06F17/5081 ,  G03F7/70125 ,  G03F7/70433 ,  G03F7/705 ,  G03F7/70891

Abstract: PROBLEM TO BE SOLVED: To provide tools for optimizing illumination sources and mask design layouts for use in lithographic apparatuses and processes.SOLUTION: Provided is a computer-implemented method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus comprising an illumination source and projection optics, the method including: computing a multi-variable cost function of a plurality of design variables that are characteristics of the lithographic process, at least some of the design variables being characteristics of the illumination source and the design layout, the computation of the multi-variable cost function accounting for lens heating effects; and reconfiguring the characteristics of the lithographic process by adjusting the design variables until a predefined termination condition is satisfied.

Abstract translation: 要解决的问题：提供用于优化用于光刻设备和工艺的照明源和掩模设计布局的工具。解决方案：提供了一种计算机实现的方法，用于改进用于将设计布局的一部分成像到基板上的光刻处理 包括照明源和投影光学器件的光刻投影设备，该方法包括：计算作为光刻工艺特征的多个设计变量的多变量成本函数，至少一些设计变量是照明源的特征 和设计布局，多变量成本函数的计算占透镜加热效果; 并且通过调整设计变量来重新配置光刻处理的特性，直到满足预定的终止条件。

公开(公告)号：NL2010196A

公开(公告)日：2013-08-13

申请号：NL2010196

申请日：2013-01-29

Applicant: ASML NETHERLANDS BV

Inventor： CROUSE MICHAEL ,  DOMMELEN YOURI ,  LIU PENG ,  JIANG AIQIN ,  HUANG WENJIN ,  LIU HUA-YU

IPC: G03F7/20

Abstract: A computer-implemented method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus comprising an illumination source and projection optics, the method including computing a multi-variable cost function of a plurality of design variables that are characteristics of the lithographic process, at least some of the design variables being characteristics of the illumination source and the design layout, the computing of the multi-variable cost function accounting for lens heating effects; and reconfiguring the characteristics of the lithographic process by adjusting the design variables until a predefined termination condition is satisfied.