公开(公告)号：SG152197A1

公开(公告)日：2009-05-29

申请号：SG2008079998

申请日：2008-10-28

Applicant: ASML NETHERLANDS BV

Inventor： DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS ,  HANS JANSEN ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  PAUL BLOM ,  KRAMER RONALD HARM GUNTHER ,  MICHEL VAN PUTTEN ,  ARIEL DE GRAAF

Abstract: A cleaning apparatus for cleaning a substrate or component of an immersion lithographic apparatus is disclosed. The cleaning apparatus comprise may comprise a plasma radical source, a conduit and a radical confinement system. The plasma radical source may provide a flow of radicals. The conduit may supply radicals from the plasma radical source to the surface to be cleaned. The radical confinement system may direct the radicals to clean a localized portion of said surface. The cleaning apparatus may comprise a rotator and may be configured to clean a substrate edge. An immersion lithographic apparatus comprising the apparatus for cleaning one or more surfaces is also disclosed. The immersion lithographic apparatus may comprise a substrate table for supporting a substrate and a fluid confinement structure for confining immersion fluid between a projection system and substrate table and/or substrate. An immersion lithographic apparatus is disclosed. [Fig. 7]