中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

32 records (took 0.026 seconds)

    Lithographic apparatus
    4.
    发明专利
    Lithographic apparatus 有权
    LITHOGRAPHIC设备

    公开(公告)号：JP2012124539A

    公开(公告)日：2012-06-28

    申请号：JP2012071249

    申请日：2012-03-27

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： JACOBS JOHANNES HENRICUS WILHELMUS ,  TEN KATE NICOLAAS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LOOPSTRA ERIK ROELOF ,  VERHAGEN MARTINUS CORNELIS MARIA ,  BOOM HERMAN ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  BOUCHOMS IGOR PETRUS MARIA ,  KEMPER NICOLAAS R ,  OTTENS JOOST JEROEN ,  KOEK YUECEL ,  VAN ES JOHANNES

    IPC: H01L21/027

    CPC classification number: G03F7/70341 ,  G03F7/70716 ,  G03F7/70875

    Abstract: PROBLEM TO BE SOLVED: To provide a system that efficiently and effectively eliminates such energy loss in a lithographic apparatus as occurs by evaporation of a provided liquid which locally cools associated components leading to deformations and deterioration that may cause defocus and lens aberration in immersion lithography where a space between a projection system and a substrate is filled with an immersion liquid to increase the numerical aperture.SOLUTION: A timetable 34 is prepared which comprises information regarding the time and the position, the speed, the acceleration etc. of the substrate W at which evaporation of a provided liquid 11 is most likely to occur. A liquid evaporation controller 30 heats at least a part of the substrate W by a heater or sends humidified air to prevent local evaporation, according to the timetable 34.

    Abstract translation: 要解决的问题：提供一种系统，其有效地和有效地消除光刻设备中的这种能量损失，如通过蒸发局部冷却相关部件的所提供的液体而发生的，导致变形和劣化，这可能导致散焦和透镜像差 浸没光刻，其中投影系统和衬底之间的空间被浸没液体填充以增加数值孔径。 解决方案：制备时间表34，其包括关于最可能发生所提供的液体11的蒸发的基板W的时间和位置，速度，加速度等的信息。 液体蒸发控制器30根据时间表34通过加热器加热至少一部分基板W或者发送加湿空气以防止局部蒸发。版权所有（C）2012，JPO＆INPIT

    Lithographic equipment and substrate manufacturing method
    5.
    发明专利
    Lithographic equipment and substrate manufacturing method 审中-公开
    立体设备和基板制造方法

    公开(公告)号：JP2010080980A

    公开(公告)日：2010-04-08

    申请号：JP2009287219

    申请日：2009-12-18

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： OTTENS JOOST JEROEN ,  GILISSEN NOUD J ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  ZAAL KOEN JACOBUS JOHANNES MARIA

    IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

    CPC classification number: G03F7/70725 ,  G03F7/70341 ,  G03F7/7075 ,  G03F9/7046

    Abstract: PROBLEM TO BE SOLVED: To improve a production yield of a lithographic apparatus and improve a method of manufacturing a device. SOLUTION: The lithographic apparatus includes an optical element, such as, immersion fluid reservoir, supported at least in part by a gas bearing etc. A surrounding structure is provided that surrounds a substrate to enable an edge of the substrate to be illuminated by the lithographic apparatus. A level parameter for substrate, such as the thickness of the substrate, is measured by a thickness sensor etc. By means of an actuator, a substrate table is positioned with respect to the surrounding structure, so that the surface of the substrate is placed at a substantially same level as that of the surface of the surrounding structure, thereby enabling the optical element to be transferred between the surface of the substrate and the surface of the surrounding structure. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：为了提高光刻设备的生产成本并改进制造器件的方法。 解决方案：光刻设备包括至少部分地由气体轴承等支撑的诸如浸没式流体储存器的光学元件。提供围绕基底的周围结构，以使基底的边缘能够照亮 通过光刻设备。 衬底的等级参数，例如衬底的厚度，通过厚度传感器等测量。借助致动器，衬底台相对于周围结构定位，使得衬底的表面被置于 与周围结构的表面基本相同的水平，从而使得光学元件能够在基板的表面和周围结构的表面之间传递。 版权所有（C）2010，JPO＆INPIT

    Lithographic apparatus and device manufacturing method
    8.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2012182498A

    公开(公告)日：2012-09-20

    申请号：JP2012135571

    申请日：2012-06-15

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： LUIJTEN CARLO CORNELIS MARIA ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  KEMPER NICOLAAS R ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LOOPSTRA ERIK ROELOF ,  STREEFKERK BOB ,  BECKERS MARCEL ,  BOOM HERMAN ,  MOERMAN RICHARD

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic apparatus in which generation of bubbles in the immersion liquid is reduced.SOLUTION: An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate. The confinement structure having a buffer surface, when in use, is positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface. The recess, when in use, is normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.

    Abstract translation: 要解决的问题：提供一种浸没式光刻设备，其中浸没液体中的气泡产生减少。 解决方案：浸没式光刻投影设备具有液体限制结构，其被配置为至少部分地将液体限制在投影系统和基板之间的空间。 具有缓冲表面的约束结构在使用时位于基本上包括基板的上表面的平面和保持基板的基板台之间，以限定具有流动阻力的通道。 在缓冲表面设有凹槽。 当使用时，凹槽通常充满浸没液体，以便当间隙在缓冲表面下移动时，能够快速填充衬底和衬底台之间的间隙。 凹部可以是环形的或径向的，并且可以设置多个凹部。 版权所有（C）2012，JPO＆INPIT

    Lithographic apparatus
    10.
    发明专利
    Lithographic apparatus 有权
    LITHOGRAPHIC设备

    公开(公告)号：JP2010118713A

    公开(公告)日：2010-05-27

    申请号：JP2010048947

    申请日：2010-03-05

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： STREEFKERK BOB ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  GRAAF ROELOF FREDERICK DE ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  RIEPEN MICHEL

    IPC: H01L21/027

    CPC classification number: G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic apparatus suitable for preventing or reducing production of bubbles by preventing the bubbles from escaping from one or more gaps in a substrate table to a path of a radiation beam, or extracting the bubbles that may be produced in the gaps. SOLUTION: This lithographic apparatus is configured to project an image of a desired pattern on a substrate W, which is held on a substrate table WT, through a liquid. In the lithographic apparatus, gaps 22 are formed inside a surface of the substrate table between the substrate table and an outer edge of a substrate, or between the substrate table and another component that is arranged thereon and brought into contact with the liquid in normal use. The lithographic apparatus is composed by arranging, in the gap, a bubble holding device configured to hold bubbles 24 that may be produced in the gap. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种浸没式光刻设备，其适用于通过防止气泡从衬底台中的一个或多个间隙逸出到辐射束的路径来防止或减少气泡的产生，或提取气泡， 可能在间隙中产生。 解决方案：该光刻设备被配置为通过液体将保持在衬底台WT上的衬底W投影所需图案的图像。 在光刻设备中，间隙22形成在衬底台的表面之间，衬底台与衬底的外边缘之间，或衬底台与另一部件之间，在正常使用中与其配置并与液体接触 。 光刻设备通过在间隙中布置构造成保持可能在间隙中产生的气泡24的气泡保持装置而构成。 版权所有（C）2010，JPO＆INPIT

Patent Agency Ranking