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    Lithographic method
    1.
    发明专利
    Lithographic method 审中-公开
    光刻方法

    公开(公告)号：JP2009163237A

    公开(公告)日：2009-07-23

    申请号：JP2008318284

    申请日：2008-12-15

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： FONG ALEX F ,  VAN BUEL HENRICUS WILHELMUS MA ,  CONSOLINI JOSEPH J ,  VAN DE MOOSDIJK MICHAEL JOSEPH ,  ROBLES MICHAEL CHARLES

    IPC: G03F9/00 ,  H01L21/027 ,  H01L21/68

    CPC classification number: G03F9/7011 ,  B01J21/04 ,  G03F9/7019 ,  G03F9/7084 ,  G03F9/7088

    Abstract: PROBLEM TO BE SOLVED: To project a pattern onto an upper surface of a substrate, the pattern to be aligned to an alignment mark on a lower surface of the substrate, when patterned layers are provided on both faces of a substrate. SOLUTION: A calibration method for a lithographic device aligning top and back surfaces is disclosed, the method comprising: attaching a substrate having a plurality of alignment marks to a carrier with the alignment marks opposing to the carrier; reducing the thickness of the substrate; measuring the position of an alignment mark image formed by an optical system in a substrate table of the apparatus by using an alignment system of the apparatus; projecting a pattern onto the substrate at a position of the pattern determined by the measured position of the alignment mark; measuring the position of an alignment mark provided in the opposite face of the substrate to the projected pattern, the measurement of the position of the alignment mark on the opposite side of the substrate being carried out by an alignment system that induces radiation through the substrate; and comparing the measured positions to determine an overlay error. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：当在基板的两个表面上设置图案层时，将图案投影到基板的上表面上，该图案将与基板的下表面上的对准标记对准。 公开了一种用于对准顶表面和后表面的光刻设备的校准方法，所述方法包括：将具有多个对准标记的衬底附接到具有与所述载体相对的所述对准标记的载体上; 减小基板的厚度; 通过使用所述装置的对准系统来测量由所述装置的衬底台中的光学系统形成的对准标记图像的位置; 在由对准标记的测量位置确定的图案的位置处将图案投影到基板上; 测量在基板的相对面上设置的对准标记的位置与投射图案的对准标记的位置的测量，通过引导通过基板的辐射的对准系统来执行; 并比较测量位置以确定重叠误差。 版权所有（C）2009，JPO＆INPIT

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