公开(公告)号：JP2011192990A

公开(公告)日：2011-09-29

申请号：JP2011048535

申请日：2011-03-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DEN BOEF ARIE JEFFREY ,  KHUAT DUY LAURENT ,  SARRI DIMITRA

IPC: H01L21/027 ,  G01B11/02 ,  G01B11/26

CPC classification number: G01B11/0608 ,  G03F9/7034 ,  G03F9/7096

Abstract: PROBLEM TO BE SOLVED: To provide an alternative level sensor for use in a lithographic apparatus which level sensor is preferably less sensitive for effects due to focus height of the measurement beam of the level sensor.
SOLUTION: There provided is a level sensor configured to measure a height level of a substrate comprising: a projection unit to project a measurement beam on the substrate; a detection unit to receive the measurement beam after reflection on the substrate; and a processing unit to calculate a height level on the basis of the reflected measurement beam received by the detection unit. The level sensor further comprises a tilt measuring device, wherein the tilt measuring device is arranged to receive at least partially the reflected measurement beam, and configured to provide a tilt signal representative for a tilt of the substrate with respect to a nominal plane.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了提供一种用于光刻设备的替代液位传感器，对于由于液位传感器的测量光束的焦点高度而言，液位传感器优选地不太敏感。 解决方案：提供了一种配置成测量衬底的高度水平的液位传感器，包括：投影单元，用于将测量光束投影在衬底上; 检测单元，用于在所述基板上反射后接收所述测量光束; 以及处理单元，用于基于由检测单元接收的反射测量光来计算高度水平。 水平传感器还包括倾斜测量装置，其中倾斜测量装置被布置成至少部分地接收反射的测量光束，并且被配置为提供代表基板相对于标称平面的倾斜的倾斜信号。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：NL2006131A

公开(公告)日：2011-09-13

申请号：NL2006131

申请日：2011-02-03

Applicant: ASML NETHERLANDS BV

Inventor： BOEF ARIE ,  KHUAT DUY LAURENT ,  SARRI DIMITRA

IPC: G03F7/20

Abstract: A level sensor configured to measure a height level of a substrate arranged in a measurement position is disclosed. The level sensor comprises a projection unit to project multiple measurement beams on multiple measurement locations on the substrate, a detection unit to receive the measurement beams after reflection on the substrate, and a processing unit to calculate a height level on the basis of the reflected measurement beams received by the detection unit, wherein the projection unit and the detection unit are arranged next to the substrate, when the substrate is arranged in the measurement position.