Patent search ap:("ASML NETHERLANDS BV") AND inv:"SYTINA OLGA" Page 1

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发明专利
LASER RADIATION SYSTEM, PLASMA RADIATION SYSTEM FOR LITHOGRAPHIC APPARATUS AND ASSOCIATED METHODS. 未知

公开(公告)号：NL2012846A

公开(公告)日：2014-12-15

申请号：NL2012846

申请日：2014-05-20

Applicant: ASML NETHERLANDS BV

Inventor： SYTINA OLGA , BUURMAN ERIK , HOFSTRA RAMON , KLEEMANS NIEK

IPC: G03F7/20 , H05G2/00

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