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    Lithographic apparatus and device manufacturing method
    1.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2012094917A

    公开(公告)日：2012-05-17

    申请号：JP2012027223

    申请日：2012-02-10

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： TROOST KARS ZEGER ,  BLEEKER ARNO JAN

    IPC: G02B26/08 ,  H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70058 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70383 ,  G03F7/70425

    Abstract: PROBLEM TO BE SOLVED: To provide a method of exposure to an uniform radiation dose in a lithographic apparatus using a programmable array.SOLUTION: The method comprises: when projecting a patterned beam of radiation, which was patterned using individually controllable elements, onto a target portion of a substrate, (a) ordinarily controlling the elements, such that each pixel delivers a radiation dose no greater than a predetermined normal maximum dose to the target portion in an exposure step; and (b) exceptionally controlling the elements, such that at least one selected pixel delivers an increased radiation dose, greater than the normal maximum dose. The increased dose may be delivered to compensate for the effect of a defective element at a known position in the array on a pixel adjacent to a selected pixel. Furthermore, it may compensate for underexposure of the target portion at the location of the selected pixel resulting from exposure of that location to a pixel affected by a known defective element.

    Abstract translation: 要解决的问题：提供使用可编程阵列在光刻设备中暴露于均匀辐射剂量的方法。 解决方案：该方法包括：当使用单独可控元件将图案化的辐射束投影到基板的目标部分上时，（a）通常控制元件，使得每个像素传递辐射剂量 大于在曝光步骤中对目标部分的预定正常最大剂量; 和（b）异常地控制元件，使得至少一个所选择的像素传递大于正常最大剂量的增加的辐射剂量。 可以递送增加的剂量以补偿阵列中与所选像素相邻的像素上的已知位置处的有缺陷元素的影响。 此外，它可以补偿由于将该位置曝光到受已知缺陷元件影响的像素而导致的所选像素的位置处的目标部分的曝光不足。 版权所有（C）2012，JPO＆INPIT

    Lithographic apparatus and device manufacturing method
    2.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2009296004A

    公开(公告)日：2009-12-17

    申请号：JP2009210018

    申请日：2009-09-11

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： TROOST KARS ZEGER ,  BLEEKER ARNO JAN

    IPC: G02B26/08 ,  H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70058 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70383 ,  G03F7/70425

    Abstract: PROBLEM TO BE SOLVED: To provide a method for performing exposure in even radiation in a lithographic apparatus using a programmable array. SOLUTION: If a patterned beam of radiation which was patterned using an individually controllable elements is projected onto a target portion of a substrate, (a) each pixel ordinarily controls elements so as to deliver a radiation dose no greater than a predetermined normal maximum dose to the target portion in an exposure step, and (b) at least one selected pixel exceptionally controls the elements so as to deliver an increased radiation dose greater than the normal maximum dose. The increased dose may be delivered to compensate for the effect of a defective pixel at a known position in the array on a pixel adjacent a selected pixel. Further, it may compensate for underexposure of the target portion at the location of a selected pixel resulting from exposure of that location to a pixel affected by a known defective element. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种在使用可编程阵列的光刻设备中以均匀辐射进行曝光的方法。 解决方案：如果使用独立可控元件图案化的图案化的辐射束投影到基板的目标部分上，（a）每个像素通常控制元件以便传送不大于预定的正常值的辐射剂量 在曝光步骤中对目标部分的最大剂量，和（b）至少一个所选择的像素异常地控制元件，以便递送大于正常最大剂量的增加的辐射剂量。 可以递送增加的剂量以补偿阵列中与选定像素相邻的像素上的已知位置处的有缺陷像素的影响。 此外，其可以补偿由于该位置暴露于受已知缺陷元件影响的像素而导致的所选像素的位置处的目标部分的曝光不足。 版权所有（C）2010，JPO＆INPIT

    Lithography apparatus utilizing a plurality of pattern forming devices and device manufacturing method
    4.
    发明专利
    Lithography apparatus utilizing a plurality of pattern forming devices and device manufacturing method 有权
    利用图形形成装置的多样性的装置和装置的制造方法

    公开(公告)号：JP2006295167A

    公开(公告)日：2006-10-26

    申请号：JP2006104869

    申请日：2006-04-06

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： TROOST KARS ZEGER

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70291 ,  G03F7/70275 ,  G03F7/70283

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus comprising an illumination system, a patterning system, a projection system, and a combining system. SOLUTION: The illumination system supplies beams of radiation. The pattern forming system forms patterns in the beams. The patterning system comprises arrays of at least two components which are structured to be illuminated by a corresponding part of the beams and are individually controllable, with each array forming patterns in the corresponding part of the beams. The combination system combines patterned parts into the patterned beam. The projection system projects the patterned beam onto a target part of a substrate. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种包括照明系统，图案形成系统，投影系统和组合系统的光刻设备。

    解决方案：照明系统提供辐射束。 图案形成系统在梁中形成图案。 图案形成系统包括至少两个部件的阵列，其被构造为由相应部分的光束照射并且可单独地控制，每个阵列在光束的相应部分中形成图案。 组合系统将图案化部件组合到图案化的梁中。 投影系统将图案化的光束投影到基板的目标部分上。 版权所有（C）2007，JPO＆INPIT

    Lithographic device and manufacturing method of device
    5.
    发明专利
    Lithographic device and manufacturing method of device 审中-公开
    装置的制造装置和制造方法

    公开(公告)号：JP2005354059A

    公开(公告)日：2005-12-22

    申请号：JP2005166338

    申请日：2005-06-07

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： TROOST KARS ZEGER ,  BLEEKER ARNO JAN

    IPC: G02B26/08 ,  G03F7/20 ,  H01L21/027

    CPC classification number: G03F7/70058 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70383 ,  G03F7/70425

    Abstract: PROBLEM TO BE SOLVED: To provide a method of performing exposure in even radiation in a lithographic device using a programmable array. SOLUTION: If a pattern forming beam of radiation where a pattern is formed by using individually controllable elements is projected onto the target portion of a substrate, (a) each pixel controls elements as usual so as to send the radiation not exceeding a predetermined standard maximum radiation to the targeted portion in an exposure step, and (b) at least one selected pixel exceptionally controls the elements so as to send an increased radiation more than the standard maximum radiation. The increased radiation is sent so as to compensate an effect that affects a pixel adjacent to the pixel where a defective element is selected at the existing position of an array. Further, the pixel that is affected by the existing defective element compensates the shortage of exposure on the targeted portion at the position of the selected pixel generated by an exposure at the position. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种使用可编程阵列在平版印刷装置中以均匀辐射进行曝光的方法。 解决方案：如果通过使用独立可控元件形成图案的图案形成光束被投影到基板的目标部分上，（a）每个像素照常控制元件，以便发送不超过 在曝光步骤中对目标部分的预定的标准最大辐射，以及（b）至少一个所选择的像素异常地控制这些元件，以便发射比标准最大辐射更多的辐射。 发送增加的辐射以补偿影响与在阵列的现有位置处选择缺陷元件的像素相邻的像素的效果。 此外，受现有缺陷元件影响的像素补偿在该位置处的曝光所产生的所选像素的位置处的目标部分的曝光不足。 版权所有（C）2006，JPO＆NCIPI

    Lithographic apparatus and method for manufacturing device
    7.
    发明专利
    Lithographic apparatus and method for manufacturing device 有权
    平面设备和制造设备的方法

    公开(公告)号：JP2006173629A

    公开(公告)日：2006-06-29

    申请号：JP2005362907

    申请日：2005-12-16

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： VAN DER MAST KAREL DIEDERICK ,  TROOST KARS ZEGER

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70183 ,  G03F7/70216 ,  G03F7/70258 ,  G03F7/70291 ,  G03F7/70425

    Abstract: PROBLEM TO BE SOLVED: To provide a system and a method which improves an efficiency of a mask-less lithography system, and improves a throughput of the system. SOLUTION: A projection system PS has a plurality of elements 11, 21, 12, and moveable lenses which can be arranged inside or outside of a radiation beam, and the radiation beam can be projected with a plurality of magnifications. By changing the magnification of the projection system an area of a substrate exposed per pixel can be adjusted, and the throughput of the system is optimized. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种提高无掩模光刻系统的效率并提高系统的吞吐量的系统和方法。 解决方案：投影系统PS具有多个元件11,21,12，以及可以布置在辐射束内部或外部的可移动透镜，并且辐射束可以以多个放大倍率投影。 通过改变投影系统的放大倍率，可以调整每像素曝光的衬底的面积，并优化系统的生产量。 版权所有（C）2006，JPO＆NCIPI

    Light patterning device using tilting mirror in superpixel form
    9.
    发明专利
    Light patterning device using tilting mirror in superpixel form 有权
    使用倾斜反射镜在超级形式中的光图案设备

    公开(公告)号：JP2006309243A

    公开(公告)日：2006-11-09

    申请号：JP2006123340

    申请日：2006-04-27

    Applicant: Asml Holdings Nv ,  Asml Netherlands Bv ,  エイエスエムエル ホールディング ナムローゼ フエンノートシャップ ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BABA-ALI NABILA ,  BLEEKER ARNO JAN ,  TROOST KARS ZEGER

    IPC: G02B26/08 ,  B81B3/00 ,  B81B7/04 ,  G03F7/20 ,  H01L21/027 ,  H04N1/113

    CPC classification number: G03F7/70291 ,  G02B26/0833 ,  G03F7/70283 ,  G03F7/70308 ,  G09G3/346 ,  H04N5/7458

    Abstract: PROBLEM TO BE SOLVED: To provide an optical patterning device and its method that improves luminance and phase modulation characteristics of an individually controllable element array. SOLUTION: A light patterning system comprises an illumination system that supplies a beam of radiation having a certain wavelength λ. An array of reflective pixels patterns the beam, wherein the array includes pixels having at least a first tilting mirror that is logically coupled to a second tilting mirror. In an embodiment, the first and second tilting mirrors are (i) substantially adjacent to each other, and (ii) offset in height from each other by a first mirror displacement. A projection system is included that projects the patterned beam onto a target. In alternate embodiment, the array of reflective pixels includes pixels having first through fourth tilting mirrors that are logically coupled to each other. The first through fourth tilting mirrors are (i) respectively offset in height from a reference plane by first through fourth mirror displacements, and (ii) are respectively arranged clockwise in a substantially square pattern. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种改善单独可控元件阵列的亮度和相位调制特性的光学图案形成装置及其方法。 解决方案：光图案化系统包括提供具有一定波长λ的辐射束的照明系统。 反射像素阵列对光束进行图案化，其中阵列包括至少具有逻辑耦合到第二倾斜镜的第一倾斜镜的像素。 在一个实施例中，第一和第二倾斜镜是（i）基本上彼此相邻，以及（ii）通过第一反射镜位移使高度彼此偏移。 包括将图案化的光束投影到目标上的投影系统。 在替代实施例中，反射像素阵列包括具有彼此逻辑耦合的第一至第四倾斜镜的像素。 第一至第四倾斜镜（i）分别通过第一到第四镜面位移而偏离参考平面，并且（ii）分别以基本上正方形的图案顺时针地布置。 版权所有（C）2007，JPO＆INPIT

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