公开(公告)号：JP2006261667A

公开(公告)日：2006-09-28

申请号：JP2006067063

申请日：2006-03-13

Applicant: Asml Holdings Nv ,  Asml Netherlands Bv ,  Lsi Logic Corp ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ ,  エイエスエムエル ホールディング ナムローゼ フエンノートシャップ ,  エルエスアイ ロジック コーポレイション

Inventor： TROOST KARS Z ,  BASELMANS JOHANNES JACOBUS MAT ,  BLEEKER ARNO JAN ,  MARKOYA LOUIS J ,  CALLAN NEAL ,  EIB NICHOLAS K

IPC: H01L21/027 ,  G03F7/20

Abstract: PROBLEM TO BE SOLVED: To provide a system which can change a pattern more quickly and at less cost compared with a mask base system.
SOLUTION: Wide range contrast can be attained in such a way that an inclination and location of individually controllable element are adjusted simultaneously. This can be used to compensate a cupping of the individually controllable element. Simultaneous adjustment of location and inclination of the individually controllable element can be attained by two electrodes capable of operating over a range of values.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种与掩模基础系统相比可以更快更便利地改变图案的系统。

解决方案：可以以同时调节独立可控元件的倾斜度和位置的方式获得宽范围的对比度。 这可以用于补偿单独可控元件的拔罐。 可以通过能够在一定范围内操作的两个电极来实现单独可控元件的位置和倾斜的同时调节。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006186365A

公开(公告)日：2006-07-13

申请号：JP2005371869

申请日：2005-12-26

Applicant: ASML NETHERLANDS BV ,  ASML HOLDINGS NV

Inventor： BLEEKER ARNO JAN ,  BASELMANS JOHANNES JACOBUS MAT ,  DIERICHS MARCEL MATHIJS T M ,  WAGNER CHRISTIANE ,  RYZHIKOV LEV ,  STANISLAV SMIRNOV Y ,  TROOST KARS ZEGER

IPC: H01L21/027 ,  G03F7/20

Abstract: PROBLEM TO BE SOLVED: To provide a system and a method used to direct a radiation beam to illuminate non-perpendicularly a patterning array of individually controllable elements used for patterning the radiation beam. SOLUTION: The individually controllable elements can change a telecentricity of the radiation beam. Projection of the radiation beam onto the individually controllable elements can be by a concave mirror or use a folding mirror placed in an object field of the individually controllable elements. Alternatively, the individually controllable elements can change the optical axis of the radiation beam. COPYRIGHT: (C)2006,JPO&NCIPI

公开(公告)号：JP2009302549A

公开(公告)日：2009-12-24

申请号：JP2009174603

申请日：2009-07-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： TINNEMANS PATRICIUS ALOYSIUS J ,  BASELMANS JOHANNES JACOBUS MAT

IPC: H01L21/027

CPC classification number: G03F7/70191 ,  G03F7/70291 ,  G03F7/70433 ,  G03F7/70508

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus and method that more efficiently and effectively performs maskless lithography. SOLUTION: The apparatus and method comprise a projection system, a patterning device, a low-pass filter, and a data manipulation device. The projection system projects a beam of radiation onto the substrate as an array of sub-beams of radiation. The patterning device modulates the sub-beams of radiation to substantially generate a requested dose pattern on the substrate. The low-pass filter operates on pattern data derived from the requested dose pattern in order to form a frequency-clipped target dose pattern that includes only spatial frequency components below a selected threshold frequency. The data manipulation device generates a control signal comprising spot exposure intensities to be generated by the patterning device, based on a direct algebraic least-squares fit of the spot exposure intensities to the frequency-clipped target dose pattern. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供更有效和更有效地执行无掩模光刻的装置和方法。 解决方案：该装置和方法包括投影系统，图案形成装置，低通滤波器和数据操作装置。 投影系统将辐射束投射到基板上作为辐射子束阵列。 图案形成装置调制辐射的子光束，以基本上在衬底上产生所要求的剂量图案。 低通滤波器对从所请求的剂量图案导出的图形数据进行操作，以便形成仅包括低于选定阈值频率的空间频率分量的限幅目标剂量图案。 数据处理装置基于斑点曝光强度对频率削减的目标剂量图案的直接代数最小二乘拟合，产生包括由图案形成装置产生的点曝光强度的控制信号。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009060127A

公开(公告)日：2009-03-19

申请号：JP2008274725

申请日：2008-10-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KOLESNYCHENKO ALEKSEY YURIEVIC ,  BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  JEROEN JOHANNES SOPHIA MARIA M ,  MULKENS JOHANNES CATHARINUS HU ,  PEETERS FELIX GODFRIED PETER ,  STREEFKERK BOB ,  TEUNISSEN FRANCISCUS JOHANNES ,  VAN SANTEN HELMAR

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70341 ,  G03F7/70733 ,  G03F7/70866 ,  G03F7/70908

Abstract: PROBLEM TO BE SOLVED: To provide a substrate table of an immersion lithographic apparatus, which is so configured as to prevent contamination with immersion liquid. SOLUTION: A substrate table WT is provided with a drainage ditch, namely, a barrier 40 surrounding an outer peripheral edge of a substrate W, and a barrier 100 surrounding another object 20 like a sensor existing on practically the same plane as an upper face of the substrate W. Since the barriers 40 and 100 can collect any liquid spilt from a liquid supply system during exposure of the substrate W, the risk of contamination of delicate components of a lithographic projection apparatus is reduced. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供浸没式光刻设备的基板台，其被设置为防止浸没液体的污染。 解决方案：衬底台WT设置有排水沟，即围绕衬底W的外围边缘的阻挡层40，以及围绕另一物体20的阻挡物100，像传感器存在于与实际上相同的平面上的传感器 由于障碍物40和100可以收集在衬底W暴露期间从液体供应系统溢出的任何液体，所以降低了光刻投影设备的微妙部件污染的风险。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009044186A

公开(公告)日：2009-02-26

申请号：JP2008274721

申请日：2008-10-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KOLESNYCHENKO ALEKSEY YURIEVIC ,  BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  JEROEN JOHANNES SOPHIA MARIA M ,  MULKENS JOHANNES CATHARINUS HU ,  PEETERS FELIX GODFRIED PETER ,  STREEFKERK BOB ,  TEUNISSEN FRANCISCUS JOHANNES ,  VAN SANTEN HELMAR

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70341 ,  G03F7/70733 ,  G03F7/70866 ,  G03F7/70908

Abstract: PROBLEM TO BE SOLVED: To provide a substrate table of an immersion lithographic apparatus which is configured to prevent contamination with immersion liquid. SOLUTION: The substrate table WT is provided with a drainage ditch or barrier 40 surrounding an outer circumferential edge of the substrate W and a barrier 100 surrounding other objects 20 like sensors positioned in the same plane substantially the upper surface of the substrate W. The barriers 40 and 100 are configured to collect all of liquid spilled from a liquid supply system while the substrate W is exposed, so thereby reducing the risk of contamination of fine components in the lithographic projection apparatus. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种浸没式光刻设备的基板台，其被配置为防止浸没液体的污染。 解决方案：衬底台WT设置有围绕衬底W的外周边缘的排水沟或屏障40，以及围绕基本上位于衬底W的上表面的同一平面中的诸如传感器的其它物体20的阻挡层100 挡板40和100被配置为在基板W暴露的同时收集从液体供应系统溢出的所有液体，从而降低光刻投影装置中的细小部件污染的风险。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009033200A

公开(公告)日：2009-02-12

申请号：JP2008274726

申请日：2008-10-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KOLESNYCHENKO ALEKSEY YURIEVIC ,  BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  JEROEN JOHANNES SOPHIA MARIA M ,  MULKENS JOHANNES CATHARINUS HU ,  PEETERS FELIX GODFRIED PETER ,  STREEFKERK BOB ,  TEUNISSEN FRANCISCUS JOHANNES ,  VAN SANTEN HELMAR

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70341 ,  G03F7/70733 ,  G03F7/70866 ,  G03F7/70908

Abstract: PROBLEM TO BE SOLVED: To provide a substrate table of an immersion lithographic apparatus configured to prevent contamination with immersion liquid. SOLUTION: The substrate table WT includes a drainage groove, i.e. a barrier 40 which surrounds an outer peripheral edge of the substrate W and a barrier 100 which surrounds another object 20 like a sensor present on substantially the same plane with a top surface of the substrate. The barriers 40 and 100 can collect any liquid which is spilt from the liquid supply system while the substrate W is exposed to reduce the risk of contamination of delicate components of the lithographic projection apparatus. COPYRIGHT: (C)2009,JPO&INPIT

公开(公告)号：JP2008070866A

公开(公告)日：2008-03-27

申请号：JP2007196523

申请日：2007-07-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BASELMANS JOHANNES JACOBUS MAT ,  TINNEMANS PATRICIUS ALOYSIUS J

IPC: G03F7/20 ,  G02B26/06 ,  H01L21/027

CPC classification number: G03F7/70291 ,  G03F7/70283

Abstract: PROBLEM TO BE SOLVED: To independently control multiple parameters of a patterned beam.
SOLUTION: The present invention provides a patterning device configured to pattern a beam of radiation comprising a controller and an array of stepped mirrors. The array comprises a plurality of sets of four of the stepped mirrors that are controlled with respect to each other by the controller. Adjacent ones of the stepped mirrors in each of the sets have perpendicular axes of rotation and perpendicular steps. In one example, the patterning device is used to pattern the beam of radiation, which patterned beam is projected onto an object. For example, the object can be a substrate (e.g. semiconductor substrate or flat panel display substrate) or a display device.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：独立地控制图案化束的多个参数。 解决方案：本发明提供一种图案形成装置，其构造成对包括控制器和阶梯式反射镜阵列的辐射束进行图案化。 阵列包括由控制器相对于彼此控制的多组四个阶梯式反射镜组。 每组中相邻的阶梯式反射镜具有垂直的旋转轴线和垂直方向的轴线。 在一个示例中，图案形成装置用于对辐射束进行图案化，该图案束被投影到物体上。 例如，该物体可以是基板（例如半导体基板或平板显示基板）或显示装置。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007133382A

公开(公告)日：2007-05-31

申请号：JP2006274002

申请日：2006-10-05

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JORRITSMA LAURENTIUS C ,  BASELMANS JOHANNES JACOBUS MAT

IPC: G03F7/20 ,  G02F1/13 ,  H01L21/027

CPC classification number: G02B27/0025 ,  G02B3/0006 ,  G03F7/2008 ,  G03F7/70275 ,  G03F7/70308

Abstract: PROBLEM TO BE SOLVED: To reduce focal plane errors of a projected beam onto a substrate in beam scanning exposure. SOLUTION: Focal plane errors across the field of an array of focusing elements are reduced by using a non-planar correction surface 15, shaped such that focal points 13' of the focusing elements lie closer to a single plane than they would if the correction surface were planar. For example, the correction surface is shaped so as to minimize the average distance between the focus and a given plane. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：在光束扫描曝光中减少投影光束到基板上的焦平面误差。 解决方案：通过使用非平面校正表面15来减少聚焦元件阵列的场的焦平面误差，该非平面校正表面15成形为使得聚焦元件的焦点13'靠近单个平面比它们将如 校正表面是平面的。 例如，校正表面被成形为使聚焦和给定平面之间的平均距离最小化。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006191063A

公开(公告)日：2006-07-20

申请号：JP2005375393

申请日：2005-12-27

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： DE JAGER PIETER WILLEM HERMAN ,  BASELMANS JOHANNES JACOBUS MAT ,  BRUINSMA ANASTASIUS JACOBUS AN ,  MUNNIG SCHMIDT ROBERT-HAN ,  VINK HENRI JOHANNES PETRUS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/7005

Abstract: PROBLEM TO BE SOLVED: To provide an improved system and a method for lithographic illumination that provides a projection beam with a desired output. SOLUTION: The device and the method for the lithographic illumination include steps of: receiving radiation beams of a plurality of radiation sources from a plurality of corresponding radiation sources; deflecting the radiation beams of the plurality of radiation sources along a common beam path; thereby generating a projection beam of radiation; providing the projection beam of radiation with a cross-section pattern; and projecting the patterned projection beam of radiation to a target portion of a substrate. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种提供具有期望输出的投影光束的改进的光刻照明系统和方法。 解决方案：用于光刻照明的装置和方法包括以下步骤：从多个对应的辐射源接收多个辐射源的辐射束; 沿着共同的光束路径使多个辐射源的辐射束偏转; 从而产生投影射束; 提供具有横截面图案的辐射投影光束; 以及将所述图案化的投影辐射束投射到基板的目标部分。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006165550A

公开(公告)日：2006-06-22

申请号：JP2005347652

申请日：2005-12-01

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS H ,  STREEFKERK BOB

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus capable of moving a substrate in a different direction without switching the direction of a liquid flowing between a projection system of the lithographic apparatus and the substrate, in the lithography apparatus having a liquid supplying system. SOLUTION: This lithographic apparatus has an input port for supplying the liquid to a space between the projection system of the lithography apparatus and the substrate, and an output port for removing at least one part of the liquid. The lithographic apparatus has a liquid supplying system for rotating any one or both of the input port and output port around an axis line substantially perpendicular to an exposure plane of the substrate. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种光刻设备，其能够在不改变在光刻设备的投影系统和基板之间流动的液体的方向的方向上移动基板，而在具有液体供应的光刻设备中 系统。 解决方案：该光刻设备具有用于将液体供应到光刻设备的投影系统与基板之间的空间的输入端口和用于去除至少一部分液体的输出端口。 光刻设备具有一个液体供应系统，用于围绕基本上垂直于衬底的曝光平面的轴线旋转输入端口和输出端口中的任何一个或两个。 版权所有（C）2006，JPO＆NCIPI