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    Lithography equipment and method for manufacturing device
    4.
    发明专利
    Lithography equipment and method for manufacturing device 审中-公开
    LITHOGRAPHY EQUIPMENT AND METHOD FOR MANUFACTURING DEVICE

    公开(公告)号：JP2006165552A

    公开(公告)日：2006-06-22

    申请号：JP2005347924

    申请日：2005-12-01

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： DIERICHS MARCEL MATHIJS T M

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70033 ,  G03F7/7005 ,  G03F7/70175 ,  G03F7/70208

    Abstract: PROBLEM TO BE SOLVED: To solve the problem, when using EUV radiation in lithographic projection equipment. SOLUTION: An illumination system IL of lithography equipment includes a plurality of radiation sources 10, a pupil facet mirror 20, and a plurality of field face mirrors 16 and each field facet 18 of the field facet mirror forms an image of one of the radiation sources 10 on one of a plurality of pupil facets 22 on the pupil facet mirror 20. Each pupil facet directs the received radiation source image toward a predetermined region and forms projection beams PB. The optical path length, between each field facet 18 and the pupil facet 22 in cooperation with this, is substantially the same for all of the pairs of field and pupil facet. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：为了解决这个问题，在光刻投影设备中使用EUV辐射时。 解决方案：光刻设备的照明系统IL包括多个辐射源10，瞳孔面反射镜20和多个场面反射镜16以及场分面镜的每个场面18形成以下之一的图像 在瞳孔面反射镜20上的多个光瞳面22中的一个上的辐射源10.每个光瞳小面将接收的辐射源图像引导到预定区域并形成投射束PB。 与这一点配合的每个场面18和瞳孔面22之间的光程长度对于所有的场和光瞳面都是基本相同的。 版权所有（C）2006，JPO＆NCIPI

    Diffusion unit, lithography apparatus, method for homogenizing radiation beam, method of manufacturing device, and device manufactured thereby
    7.
    发明专利
    Diffusion unit, lithography apparatus, method for homogenizing radiation beam, method of manufacturing device, and device manufactured thereby 审中-公开
    扩散单元，光刻设备，用于均匀辐射光束的方法，制造装置的方法和制造的装置

    公开(公告)号：JP2006032963A

    公开(公告)日：2006-02-02

    申请号：JP2005204220

    申请日：2005-07-13

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： DIERICHS MARCEL MATHIJS T M

    IPC: H01L21/027 ,  G02B5/02 ,  G03F7/20

    CPC classification number: G03F7/70075 ,  G03F7/70083

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus comprising a diffusion unit having liquid containing a diffusion particle capable of diffusing a light beam in a radiation beam to be used for carrying out irradiation on an object such as a mask or wafer. SOLUTION: A diffusion particle may be a solid particle in liquid or an air bubble. The liquid and the diffusion particle can move vertically to radiation beam or vertically to the scanning direction of the radiation beam in, for example, a scanning lithography apparatus, in order to improve diffusion operation. Since the radiation beam to be irradiated is diffused and is homogenized, subsequent irradiation is improved. This apparatus can be used for manufacturing a CCD or the like. This is because this apparatus suitably exhibits homogeneity superior to 0.02% when it is seen by human being's eyes. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种光刻设备，其包括具有液体的扩散单元，该扩散单元包含能够在用于对诸如掩模或晶片的物体进行照射的辐射束中扩散光束的扩散粒子。 解决方案：扩散颗粒可以是液体或气泡中的固体颗粒。 液体和扩散粒子可以在例如扫描光刻设备中垂直移动到辐射束或垂直于辐射束的扫描方向，以便改进扩散操作。 由于要照射的辐射束被扩散并且被均匀化，所以随后的照射得到改善。 该装置可用于制造CCD等。 这是因为当人的眼睛看到时，该装置适当地表现出优于0.02％的均匀性。 版权所有（C）2006，JPO＆NCIPI

    Method for manufacturing device, topcoat material, and substrate
    8.
    发明专利
    Method for manufacturing device, topcoat material, and substrate 有权
    制造装置，托盘材料和基板的方法

    公开(公告)号：JP2009124187A

    公开(公告)日：2009-06-04

    申请号：JP2009056467

    申请日：2009-03-10

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： MULKENS JOHANNES CATHARINUS H ,  DIERICHS MARCEL MATHIJS T M

    IPC: H01L21/027 ,  G03F7/11 ,  G03F7/20 ,  G03F7/38

    CPC classification number: G03F7/70341 ,  G03F7/11 ,  Y10S977/773 ,  Y10S977/778 ,  Y10S977/779 ,  Y10T428/25 ,  Y10T428/261 ,  Y10T428/31504

    Abstract: PROBLEM TO BE SOLVED: To provide a method for manufacturing a device, a topcoat material, and a substrate with a topcoat. SOLUTION: In an immersion lithography, the conditions that if it is assumed that thickness of immersion fluid (immersion liquid 11) is d l , thickness of topcoat TC is d tc and thickness of resist R is d r , refractive index of liquid is n l , refractive index of topcoat is n tc and refractive index of resist is n r , n l ≤n tc ≤n r , thickness of immersion fluid (immersion liquid 11) d l is about five times wavelength of radiation (d l ≤5×λ) or more, and thickness d tc of topcoat TC is about five times wavelength of radiation (d tc ≤5×λ) or less are satisfied, not to allow internal reflection to occur in the final factor of a projecting system, immersion fluid (immersion liquid 11), and topcoat. In the method for manufacturing a device including a step that projects a patterned radiation beam onto a resist provided on the substrate through the liquid, λ is the wavelength of patterned radiation of the beam. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种用于制造装置，面漆材料和具有面漆的基材的方法。 解决方案：在浸没式光刻中，如果假设浸渍液（浸渍液11）的厚度为d 1 ，则顶涂层TC的厚度为d tc < SB>和抗蚀剂R的厚度为d r ，液体的折射率为n 1 ，顶涂层的折射率为n tc ，折射率 抗蚀剂的厚度为浸渍液（浸渍液体）的厚度， 11）d 1 是辐射波长的大约五倍（d 1 ≤5×λ）或更高，而顶层TC的厚度d tc 约为辐射波长的5倍（d tc ≤5×λ）以下，不能在投影系统的最终因素中产生内反射，浸没液（浸液11） 和面漆。 在用于制造包括通过液体将图案化的辐射束投影到设置在基板上的抗蚀剂上的步骤的装置的方法中，λ是光束的图案化辐射的波长。 版权所有（C）2009，JPO＆INPIT

    Lithographic apparatus and method of manufacturing device
    9.
    发明专利
    Lithographic apparatus and method of manufacturing device 有权
    光刻设备及其制造方法

    公开(公告)号：JP2006179933A

    公开(公告)日：2006-07-06

    申请号：JP2005369992

    申请日：2005-12-22

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： KRUIJSWIJK STEFAN GEERTE ,  DIERICHS MARCEL MATHIJS T M ,  MARKUS FRANCISCUS ANTONIUS EUR ,  MULDER HEINE MELLE

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70108 ,  G03F7/70275

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus in which the uniformity of a radiation beam is improved. SOLUTION: The lithographic apparatus includes an illumination system configured to provide a radiation beam, a patterning device configured to pattern the radiation beam to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a substrate. An optical assembly includes multiple optical elements two-dimensionally arranged between a radiation source and the patterning device to create a predetermined angular distribution of the radiation beam. In order to improve the uniformity of the radiation beam, the optical elements are selected from a predetermined number of optical elements having different shapes and/or sizes. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种提高辐射束均匀性的光刻设备。 解决方案：光刻设备包括被配置为提供辐射束的照明系统，配置成图案化辐射束以形成图案化辐射束的图案形成装置，以及被配置为将图案化的辐射束投影到衬底上的投影系统。 光学组件包括在辐射源和图案形成装置之间二维布置的多个光学元件，以产生辐射束的预定角度分布。 为了提高辐射束的均匀性，光学元件从具有不同形状和/或尺寸的预定数量的光学元件中选择。 版权所有（C）2006，JPO＆NCIPI

    Uniformity correction for lithographic apparatus
    10.
    发明专利
    Uniformity correction for lithographic apparatus 有权
    平面设备的均匀校正

    公开(公告)号：JP2006165581A

    公开(公告)日：2006-06-22

    申请号：JP2005354272

    申请日：2005-12-08

    Applicant: Asml Holdings Nv ,  エイエスエムエル ホールディング ナムローゼ フエンノートシャップ

    Inventor： KREMER ALEXANDER ,  DIERICHS MARCEL MATHIJS T M ,  LOOPSTRA ERIK ROELOF

    IPC: H01L21/027 ,  G02B21/06 ,  G03F7/20

    CPC classification number: G03F7/70083 ,  G03F7/70066 ,  G03F7/70558

    Abstract: PROBLEM TO BE SOLVED: To provide a uniformity correction module having movable blades which are at least partly immersed in a fluid and having a sufficiently small difference between a refractive index of each blade and a refractive index of the fluid to prevent a significant reflection and a refraction at a surface of each blade. SOLUTION: A uniformity correction module for improving the uniformity of a radiation distribution in a rectangular illumination slit having two longer sides and two shorter sides, includes a plurality of movable blades arranged along each longer side of the illumination slit and a chamber containing a fluid. Here, the movable blades are at least partly immersed in the fluid, and the difference between a refractive index of each blade and a refractive index of the fluid is sufficiently small to prevent the significant reflection and the refraction at a surface of each blade. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种均匀性校正模块，其具有至少部分地浸没在流体中并且具有足够小的每个叶片的折射率与流体的折射率之间的差异的可动叶片，以防止显着的 在每个叶片的表面上的反射和折射。 解决方案：用于提高具有两个长边和两个短边的矩形照明狭缝中的辐射分布的均匀性的均匀性校正模块包括沿照明狭缝的每个较长侧布置的多个可动刀片和包含 流体 这里，可动叶片至少部分地浸没在流体中，并且每个叶片的折射率与流体的折射率之间的差异足够小以防止在每个叶片的表面处的显着的反射和折射。 版权所有（C）2006，JPO＆NCIPI

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