公开(公告)号：JP2010251748A

公开(公告)日：2010-11-04

申请号：JP2010087412

申请日：2010-04-06

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KNARREN BASTIAAN ANDREAS WILHELMUS HUBERTUS ,  TURK RAYMOND ,  KOOIKER ALLARD EELCO ,  BOONEN NICO ANTONIUS JOHANNES HUBERTUS

IPC: H01L21/027 ,  G03F7/20 ,  H05K7/20

CPC classification number: G03B27/52 ,  G03F7/70825 ,  G03F7/7085 ,  G03F7/70858 ,  H01L21/67109

Abstract: PROBLEM TO BE SOLVED: To enable efficient cooling and stable positioning of an object that is a detector, such as a photodetector, disposed in a vacuum space. SOLUTION: A described cooling arrangement includes a heat sink having a first heat contact surface, an object having a second heat contact surface, and an elastic wall. The first heat contact surface and the second heat contact surface are set facing each other to form a gap. The elastic wall is part of an enclosure enclosing a space at least containing the gap. The cooling arrangement includes equipment that maintains a pressure difference between the space and an environment given by the cooling arrangement. A lithography apparatus includes this cooling arrangement. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了实现设置在真空空间中的作为诸如光电检测器的检测器的物体的有效冷却和稳定的定位。 解决方案：所描述的冷却装置包括具有第一热接触表面的散热器，具有第二热接触表面的物体和弹性壁。 第一热接触表面和第二热接触表面彼此面对设置以形成间隙。 弹性壁是封闭至少包含间隙的空间的外壳的一部分。 冷却装置包括保持空间与由冷却装置给出的环境之间的压力差的设备。 光刻设备包括这种冷却装置。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：NL2004242A

公开(公告)日：2010-10-14

申请号：NL2004242

申请日：2010-02-15

Applicant: ASML NETHERLANDS BV

Inventor： KNARREN BASTIAAN ,  TURK RAYMOND ,  KOOIKER EELCO

IPC: G03F7/20

公开(公告)号：NL2004322A

公开(公告)日：2010-10-14

申请号：NL2004322

申请日：2010-03-02

Applicant: ASML NETHERLANDS BV

Inventor： KNARREN BASTIAAN ,  TURK RAYMOND ,  KOOIKER EELCO ,  BOONEN NICO

IPC: G03F7/20

Abstract: A cooling arrangement is described and includes a heat sink having a first thermal contact surface, an object having a second thermal contact surface and a resilient wall. The first thermal contact surface and the second thermal contact surface face each other and define a gap. The resilient wall is part of an enclosure that surrounds a space at least comprising the gap, and the cooling arrangement includes a facility to maintain a pressure difference between the space and an environment of the cooling arrangement. Additionally, a lithographic apparatus comprising such a cooling arrangement is described.