公开(公告)号：WO2013068198A2

公开(公告)日：2013-05-16

申请号：PCT/EP2012070279

申请日：2012-10-12

Applicant: ASML NETHERLANDS BV

Inventor： VANDERHALLEN IVO ,  FRANKEN JOHANNES ,  LANSBERGEN ROBERT ,  VAN DEN WILDENBERG LAMBERTUS

IPC: G03F7/20

CPC classification number: G03F7/70916 ,  G03F7/70825

Abstract: There is disclosed a particle trap for a plasma EUV radiation source, a lithography apparatus comprising a particle trap and a device manufacturing method. In an embodiment, the particle trap includes a rotatable hub, and a plurality of blades extending outwards from the hub. Each of the blades has an end anchoring portion inserted into a complementary slot in the hub, the end anchoring portion and slot being configured to hold the blades within the hub during rotation of the hub.

Abstract translation: 公开了一种用于等离子体EUV辐射源的颗粒捕获器，包括颗粒捕获器和装置制造方法的光刻设备。 在一个实施例中，颗粒捕集器包括可旋转轮毂和从轮毂向外延伸的多个叶片。 每个叶片具有插入到毂中的互补槽中的端部锚定部分，端部锚固部分和槽被构造成在轮毂旋转期间将叶片保持在轮毂内。