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    RADIATION COLLECTOR, COOLING SYSTEM AND LITHOGRAPHIC APPARATUS
    1.
    发明申请
    RADIATION COLLECTOR, COOLING SYSTEM AND LITHOGRAPHIC APPARATUS 审中-公开
    辐射收集器，冷却系统和光刻设备

    公开(公告)号：WO2014170093A3

    公开(公告)日：2015-01-22

    申请号：PCT/EP2014055870

    申请日：2014-03-24

    Applicant: ASML NETHERLANDS BV

    Inventor： VANDERHALLEN IVO ,  STRUYCKEN ALEXANDER ,  FRANKEN JOHANNES

    IPC: G03F7/20

    CPC classification number: G02B19/0023 ,  G02B5/09 ,  G02B5/10 ,  G02B7/1815 ,  G02B19/009 ,  G02B27/0006 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70575 ,  G03F7/70891 ,  G03F7/7095

    Abstract: A radiation collector (141) comprising a plurality of reflective surfaces (400-405), wherein each of the plurality of reflective surfaces is coincident with part of one of a plurality of ellipsoids (40-45), wherein the plurality of ellipsoids have in common a first focus (12) and a second focus (16), each of the plurality of reflective surfaces coincident with a different one of the plurality of ellipsoids, wherein the plurality of reflective surfaces are configured to receive radiation originating from the first focus (12) and reflect the radiation to the second focus (16). An apparatus (820) shown in figure 11 comprising a cooling system (832) and a reflector (831), wherein the cooling system is configured to cool the reflector, the cooling system comprising: a porous structure (823) situated in thermal contact with the reflector, wherein the porous structure is configured to receive a coolant in a liquid phase state; a condenser (825) configured to receive coolant from (826) the porous structure in a vapour phase state, condense the coolant thereby causing the coolant to undergo a phase change to a liquid phase state and output the condensed coolant in the liquid phase state for entry (827) into the porous structure.

    Abstract translation: 一种辐射收集器（141），包括多个反射表面（400-405），其中所述多个反射表面中的每一个与多个椭圆体（40-45）中的一个的一部分重合，其中所述多个椭圆体 共同的第一焦点（12）和第二焦点（16），所述多个反射表面中的每一个与所述多个椭圆体中的不同的一个重合，其中所述多个反射表面被配置为接收源自所述第一焦点的辐射 12）并将辐射反射到第二焦点（16）。 图11所示的装置（820）包括冷却系统（832）和反射器（831），其中所述冷却系统构造成冷却所述反射器，所述冷却系统包括：多孔结构（823），其与 所述反射器，其中所述多孔结构被构造成接收处于液相状态的冷却剂; 冷凝器（825），被配置为以气相状态从（826）多孔结构接收冷却剂，冷凝冷却剂，从而使冷却剂经历相变至液相状态，并输出处于液相状态的冷凝的冷却剂 进入（827）进入多孔结构。

    PARTICLE TRAP FOR EUV SOURCE
    2.
    发明申请
    PARTICLE TRAP FOR EUV SOURCE 审中-公开
    用于EUV源的颗粒捕获

    公开(公告)号：WO2013068198A2

    公开(公告)日：2013-05-16

    申请号：PCT/EP2012070279

    申请日：2012-10-12

    Applicant: ASML NETHERLANDS BV

    Inventor： VANDERHALLEN IVO ,  FRANKEN JOHANNES ,  LANSBERGEN ROBERT ,  VAN DEN WILDENBERG LAMBERTUS

    IPC: G03F7/20

    CPC classification number: G03F7/70916 ,  G03F7/70825

    Abstract: There is disclosed a particle trap for a plasma EUV radiation source, a lithography apparatus comprising a particle trap and a device manufacturing method. In an embodiment, the particle trap includes a rotatable hub, and a plurality of blades extending outwards from the hub. Each of the blades has an end anchoring portion inserted into a complementary slot in the hub, the end anchoring portion and slot being configured to hold the blades within the hub during rotation of the hub.

    Abstract translation: 公开了一种用于等离子体EUV辐射源的颗粒捕获器，包括颗粒捕获器和装置制造方法的光刻设备。 在一个实施例中，颗粒捕集器包括可旋转轮毂和从轮毂向外延伸的多个叶片。 每个叶片具有插入到毂中的互补槽中的端部锚定部分，端部锚固部分和槽被构造成在轮毂旋转期间将叶片保持在轮毂内。

    6.
    发明专利
    未知

    公开(公告)号：AT453136T

    公开(公告)日：2010-01-15

    申请号：AT07808582

    申请日：2007-09-17

    Applicant: ASML NETHERLANDS BV

    Inventor： FRANKEN JOHANNES ,  BANINE VADIM ,  WASSINK ARNOUD

    IPC: G03F7/20 ,  F16C32/06

    Abstract: A contaminant trap apparatus arranged in a path of a radiation beam to trap contaminants emanating from a radiation source configured to produce the radiation beam is disclosed. The contaminant trap apparatus includes a rotor having a plurality of channel forming elements defining channels which are arranged substantially parallel to the direction of propagation of the radiation beam, the rotor including electrically chargeable material and arranged to be electrically charged as a result of the operation of the radiation source; and a bearing configured to rotatably hold the rotor with respect to a rotor carrying structure, wherein the apparatus is configured to (i) control or redirect an electrical discharge of the rotor, or (ii) suppress an electrical discharge of the rotor, or (iii) both (i) and (ii).

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