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    Substrate handler, lithographic apparatus and device manufacturing method
    1.
    发明专利
    Substrate handler, lithographic apparatus and device manufacturing method 有权
    基板处理器，光刻设备和器件制造方法

    公开(公告)号：JP2007017977A

    公开(公告)日：2007-01-25

    申请号：JP2006185665

    申请日：2006-07-05

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VAN DER SCHOOT HARMEN KLAAS ,  JACOBS HERNES ,  LUTTIKHUIS BERNARDUS ANTONIUS ,  VOSTERS PETRUS MATTHIJS HENRIC ,  HAZENBERG JOHANNES MARTINUS AN ,  VAN BEUZEKOM AART A

    IPC: G03F7/20 ,  H01L21/027 ,  H01L21/683

    CPC classification number: G03F7/70875 ,  G03F7/7075

    Abstract: PROBLEM TO BE SOLVED: To provide a substrate handler, a lithographic apparatus, and a device manufacturing method. SOLUTION: The substrate handler for handling a substrate comprises a conditioning device for conditioning the substrate. The substrate handler is provided with a displacing device configured so as to displace the substrate in the direction substantially parallel to a support surface. The displacing device is configured so as to displace the substrate during the conditioning process from one conditioning position to one or more other conditioning positions. The substrate handler comprises a float device configured to provide an air bed above a support surface of the substrate handler. The substrate handler is configured so as to hold the substrate on an air bed during the conditioning of the substrate. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：提供基板处理器，光刻设备和器件制造方法。 解决方案：用于处理衬底的衬底处理器包括用于调节衬底的调节装置。 衬底处理器设置有置换装置，其被配置为在基本上平行于支撑表面的方向上移位衬底。 置换装置构造成在调节过程中将衬底从一个调节位置移动到一个或多个其它调理位置。 衬底处理器包括浮动装置，其构造成在衬底处理器的支撑表面上方提供空气床。 衬底处理器被配置为在衬底调节期间将衬底保持在空气床上。 版权所有（C）2007，JPO＆INPIT

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD UTILIZING SUBSTRATE STAGE COMPENSATION
    3.
    发明专利
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD UTILIZING SUBSTRATE STAGE COMPENSATION 审中-公开

    公开(公告)号：JP2006344969A

    公开(公告)日：2006-12-21

    申请号：JP2006157940

    申请日：2006-06-07

    Applicant: ASML NETHERLANDS BV

    Inventor： COX HENRIKUS HERMAN MARIE ,  JACOBS HERNES ,  SCHOOT HARMEN KLAAS VAN DER ,  VOSTERS PETRUS MATTHIJS HENRIC

    IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a device manufacturing method utilizing substrate stage compensation. SOLUTION: The lithographic apparatus has an illumination system that conditions a radiation beam, and a patterning device support that supports a patterning device. The patterning device patterns the radiation beam. The lithographic apparatus also has a substrate support that supports a substrate, a machine frame that supports the substrate support, a projection system that projects the patterned beam onto the target of the substrate, and a substrate support drive that moves the substrate support in at least one direction. The lithographic apparatus can have a reaction mass, a balance mass, and a base frame. The substrate support drive is configured to generate a force at least in one direction between the substrate support and the reaction mass, the balance mass, or the support frame. COPYRIGHT: (C)2007,JPO&INPIT

    Lithographic apparatus and device manufacturing method utilizing positioning device for positioning object table
    4.
    发明专利
    Lithographic apparatus and device manufacturing method utilizing positioning device for positioning object table 审中-公开
    利用定位对象表的定位装置的平面设备和装置制造方法

    公开(公告)号：JP2006295160A

    公开(公告)日：2006-10-26

    申请号：JP2006102761

    申请日：2006-04-04

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： COX HENRIKUS HERMAN MARIE ,  HOL SVEN ANTOIN JOHAN ,  VOSTERS PETRUS MATTHIJS HENRIC

    IPC: H01L21/027 ,  H01L21/68 ,  H02K41/03

    CPC classification number: G03F7/70791 ,  G03F7/70716 ,  G03F7/70758

    Abstract: PROBLEM TO BE SOLVED: To provide an improved positioning device, wherein the effects of internal dynamics are mitigated, in relation to a method of manufacturing, for example, flat panel displays, integrated circuits, and other devices requiring fine structures utilizing a positioning device for positioning the object table of a lithographic apparatus. SOLUTION: A positioning device for positioning an object table 30 comprises a frame for supporting the object table 30 in a first direction, motor units 35, 36 constructed and arranged for exerting a first force on the object table 30 in a second direction substantially perpendicular to the first direction and a second force on the object table 30 in a third direction substantially perpendicular to the first direction and the second direction. The motor units 35, 36 comprise first parts 38, 39 constructed and arranged to co-operate with second parts 40, 41 for generating the first and second force, the first parts 38, 39 being arranged on the object table 30, such that both the first force and the second force are directed substantially through the center of gravity of the object table 30. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种改进的定位装置，其中减轻了内部动力学的影响，例如，制造方法，例如平板显示器，集成电路和需要使用 用于定位光刻设备的物体表的定位装置。 解决方案：用于定位物台30的定位装置包括：用于在第一方向上支撑物台30的框架;马达单元35,36，被构造和布置成在第二方向上在物台30上施加第一力 基本上垂直于第一方向的第二方向，以及基本上垂直于第一方向和第二方向的第三方向上的对象台30上的第二力。 马达单元35,36包括构造和布置为与第二部分40,41配合以用于产生第一和第二力的第一部分38,39，第一部分38,39布置在对象台30上，使得两者 第一力和第二力基本上指向物体台30的重心。版权所有（C）2007，JPO＆INPIT

    Substrate handler
    7.
    发明专利
    Substrate handler 有权
    基板处理器

    公开(公告)号：JP2009231845A

    公开(公告)日：2009-10-08

    申请号：JP2009146006

    申请日：2009-06-19

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： JACOBS HERNES ,  LUTTIKHUIS BERNARDUS ANTONIUS ,  VAN DER SCHOOT HARMEN KLAAS ,  VOSTERS PETRUS MATTHIJS HENRIC

    IPC: H01L21/027 ,  G03F7/20 ,  H01L21/677

    Abstract: PROBLEM TO BE SOLVED: To provide a substrate handler capable of functioning more efficiently. SOLUTION: The substrate handler 12 is adapted to load a substrate 8 onto a substrate table 6 before exposure and to unload the substrate 8 from the substrate table 6 after exposure. The substrate handler 12 includes at least one support surface adapted to simultaneously convey a plurality of independent substrates 8, 8, or platforms 14, 16. The substrate handler 12 moves the substrate 8 with respect to the substrate table 6 of a lithographic apparatus. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供能够更有效地起作用的基板处理器。 解决方案：衬底处理器12适于在曝光之前将衬底8加载到衬底台6上，并且在曝光之后从衬底台6卸载衬底8。 衬底处理器12包括适于同时传送多个独立衬底8,8或平台14,16的至少一个支撑表面。衬底处理器12相对于光刻设备的衬底台6移动衬底8。 版权所有（C）2010，JPO＆INPIT

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