OPTICAL METROLOGY OF LITHOGRAPHIC PROCESSES USING ASYMMETRIC SUB-RESOLUTION FEATURES TO ENHANCE MEASUREMENT

    公开(公告)号:SG11201803933PA

    公开(公告)日:2018-06-28

    申请号:SG11201803933P

    申请日:2016-11-29

    Abstract: A process of calibrating a model, the process including: obtaining training data including: scattered radiation information from a plurality of structures, individual portions of the scattered radiation information being associated with respective process conditions being characteristics of a patterning process of the individual structures; and calibrating a model with the training data by determining a ratio relating a change in one of the process characteristics to a corresponding change in scattered radiation information.

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