公开(公告)号：NL2011000A

公开(公告)日：2014-01-27

申请号：NL2011000

申请日：2013-06-18

Applicant: ASML NETHERLANDS BV

Inventor： CRAMER HUGO ,  TINNEMANS PATRICIUS ,  SOCHA ROBERT ,  VAESSEN JEAN-PIERRE

IPC: G01N21/47 ,  G03F7/20

公开(公告)号：NL2003707A

公开(公告)日：2010-05-12

申请号：NL2003707

申请日：2009-10-26

Applicant: ASML NETHERLANDS BV

Inventor： SOCHA ROBERT

IPC: G03F7/20 ,  G03F1/68 ,  G03F1/70 ,  H01L21/027

公开(公告)号：IL238969A

公开(公告)日：2019-12-31

申请号：IL23896915

申请日：2015-05-21

Applicant: ASML NETHERLANDS BV ,  CRAMER HUGO ,  SOCHA ROBERT ,  TINNEMANS PATRICIUS ,  VAESSEN JEAN PIERRE

Inventor： CRAMER HUGO ,  SOCHA ROBERT ,  TINNEMANS PATRICIUS ,  VAESSEN JEAN-PIERRE

IPC: G03F7/20

公开(公告)号：SG11201803933PA

公开(公告)日：2018-06-28

申请号：SG11201803933P

申请日：2016-11-29

Applicant: ASML NETHERLANDS BV

Inventor： SOCHA ROBERT ,  WALLOW THOMAS

IPC: G03F7/20

Abstract: A process of calibrating a model, the process including: obtaining training data including: scattered radiation information from a plurality of structures, individual portions of the scattered radiation information being associated with respective process conditions being characteristics of a patterning process of the individual structures; and calibrating a model with the training data by determining a ratio relating a change in one of the process characteristics to a corresponding change in scattered radiation information.

公开(公告)号：NL2006091A

公开(公告)日：2011-09-06

申请号：NL2006091

申请日：2011-01-28

Applicant: ASML NETHERLANDS BV

Inventor： SOCHA ROBERT

IPC: G03F7/20

Abstract: Methods, computer program products and apparatuses for optimizing design rules for producing a mask are disclosed, while keeping the optical conditions (including but not limited to illumination shape, projection optics numerical aperture (NA) etc.) fixed. A cross-correlation function is created by multiplying the diffraction order functions of the mask patterns with the eigenfunctions from singular value decomposition (SVD) of a TCC matrix. The diffraction order functions are calculated for the original design rule set, i.e., using the unperturbed condition. ILS is calculated at an edge of a calculated image of a critical polygon using the cross-correlation results and using translation properties of a Fourier transform. Once an optimum separation is calculated, it is incorporated into the design rule to optimize the mask layout for improved ILS throughout the mask.