Patent search ap:("ASML NETHERLANDS BV") AND inv:"ZWOL PIETER-JAN" Page 1

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发明专利
A LITHOGRAPHIC APPARATUS, RADIATION SOURCE, AND LITHOGRAPHIC SYSTEM. 未知

公开(公告)号：NL2014094A

公开(公告)日：2015-02-26

申请号：NL2014094

申请日：2015-01-08

Applicant: ASML NETHERLANDS BV

Inventor： ZWOL PIETER-JAN , YAKUNIN ANDREI MIKHAILOVICH , DHALLUIN FLORIAN DIDIER ALBIN

IPC: G03F7/20 , H05G2/00

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