公开(公告)号：US20180246422A1

公开(公告)日：2018-08-30

申请号：US15961399

申请日：2018-04-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Heine Melle MULDER ,  Andrey Sergeevich TYCHKOV ,  Willem VAN SCHAIK

IPC: G03F7/20 ,  G21K1/06

CPC classification number: G03F7/70916 ,  G03F7/70033 ,  G03F7/70933 ,  G03F7/70983 ,  G21K1/062 ,  H05G2/008

Abstract: Disclosed is a radiation source module and a radiation collector for the module with the radiation collector comprising a substrate coated with at least one reflective layer and a plurality of perforations within the reflective layer, with the plurality of holes forming vertices of a grid substantially covering the surface, and wherein the coating may comprise multiple layers.

公开(公告)号：US20210165336A1

公开(公告)日：2021-06-03

申请号：US17048834

申请日：2019-04-10

Applicant: ASML Netherlands B.V.

Inventor： Ramon Mark HOFSTRA ,  Andrey Sergeevich TYCHKOV ,  Francois Charles Dominique DENEUVILLE ,  Gerardus Hubertus Petrus Maria SWINKELS ,  Petrus Adrianu Theodorus Maria RUIJS

IPC: G03F7/20 ,  G02B27/14

Abstract: A system comprises a reflective optical element with a reflective surface that is configured to reflect a radiation beam. The reflective optical element also has a body. The system includes a thermal conditioning mechanism operative to thermally induce a deformation of the body under control of a controller. By means of controllably deforming the body, the shape of the reflective surface can be adjusted in a controlled manner.

公开(公告)号：US20220206397A1

公开(公告)日：2022-06-30

申请号：US17600763

申请日：2020-04-03

Applicant: ASML Netherlands B.V. ,  Trumpf Lasersystems For Semiconductor Manufacturing GmbH

Inventor： Ruud Antonius Catharina Maria BEERENS ,  Nico Johannes Antonius BOONEN ,  Stefan Michael Bruno BÄUMER ,  Tolga Mehmet ERGIN ,  Andreas Kristian HOPF ,  Derk Jan Wilfred KLUNDER ,  Martin Anton LAMBERT ,  Stefan PIEHLER ,  Manisha RANJAN ,  Frank Bernhard SPERLING ,  Andrey Sergeevich TYCHKOV ,  Jasper WITTE ,  Jiayue YUAN

IPC: G03F7/20 ,  H05G2/00 ,  H01S3/00

Abstract: A laser focusing system (330) for use in an EUV radiation source is described, the laser focusing system comprising: •—a first curved mirror (330.1) configured to receive a laser beam from a beam delivery system (320) and generate a first reflected laser beam (316); •—a second curved mirror (330.2) configured to receive the first reflected laser beam (316) and generate a second reflected laser beam (317), wherein the laser focusing system (330) is configured to focus the second reflected laser beam (317) to a target location (340) in a vessel (350) of the EUV radiation source (360).

公开(公告)号：US20250008634A1

公开(公告)日：2025-01-02

申请号：US18718869

申请日：2022-12-21

Applicant: ASML Netherlands B.V.

Inventor： Andrey Sergeevich TYCHKOV ,  Alexander Matthijs STRUYCKEN

IPC: H05G2/00 ,  G02B19/00 ,  G03F7/00

Abstract: An optical system for directing first and second laser pulses along an optical axis to a target to generate extreme ultraviolet radiation from said target. The optical system comprises a first optical component configured to redistribute a first laser pulse to form a shaped laser pulse having a hollow region. The optical system comprise a second optical component configured to focus the shaped laser pulse toward the target. The optical system comprises a third optical component configured to focus a second laser pulse toward the target within the hollow region of the shaped laser pulse. The first, second and third optical components are coaxially arranged on the optical axis.