公开(公告)号：US20160334711A1

公开(公告)日：2016-11-17

申请号：US15112602

申请日：2014-12-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Markus Franciscus Antonius EURLINGS ,  Niek Antonius Jacobus Maria KLEEMANS ,  Antonius Johannes Josephus VAN DIJSSELDONK ,  Ramon Mark HOFSTRA ,  Oscar Franciscus Jozephus NOORDMAN ,  Tien Nang PHAM ,  Jan Bernard Plechelmus VAN SCHOOT ,  Jiun-Cheng WANG ,  Kevin Weimin ZHANG

IPC: G03F7/20 ,  G02B19/00 ,  H05G2/00

CPC classification number: G03F7/70091 ,  G02B19/0019 ,  G02B27/0905 ,  G02B27/0983 ,  G03F7/70033 ,  G03F7/70175 ,  H05G2/005 ,  H05G2/008

Abstract: A faceted reflector (32, 32″) for receiving an incident radiation beam (2) and directing a reflected radiation beam at a target. The faceted reflector comprises a plurality of facets, each of the plurality of facets comprising a reflective surface. The reflective surfaces of each of a first subset of the plurality of facets define respective parts of a first continuous surface and are arranged to reflect respective first portions of the incident radiation beam in a first direction to provide a first portion of the reflected radiation beam. The reflective surfaces of each of a second subset of the plurality of facets define respective parts of a second continuous surface and are arranged to reflect respective second portions of the incident radiation beam in a second direction to provide a second portion of the reflected radiation beam.

Abstract translation: 用于接收入射辐射束（2）并将反射的辐射束引导到目标的小面反射器（32,32“）。 小面反射器包括多个小平面，多个小面中的每个小面包括反射表面。 多个小平面的第一子集中的每一个的反射表面限定第一连续表面的相应部分，并且被布置成在第一方向上反射入射辐射束的相应第一部分以提供反射辐射束的第一部分。 多个小平面的第二子集中的每一个的反射表面限定第二连续表面的相应部分，并且被布置成在第二方向上反射入射辐射束的相应第二部分以提供反射辐射束的第二部分。

公开(公告)号：US20210165336A1

公开(公告)日：2021-06-03

申请号：US17048834

申请日：2019-04-10

Applicant: ASML Netherlands B.V.

Inventor： Ramon Mark HOFSTRA ,  Andrey Sergeevich TYCHKOV ,  Francois Charles Dominique DENEUVILLE ,  Gerardus Hubertus Petrus Maria SWINKELS ,  Petrus Adrianu Theodorus Maria RUIJS

IPC: G03F7/20 ,  G02B27/14

Abstract: A system comprises a reflective optical element with a reflective surface that is configured to reflect a radiation beam. The reflective optical element also has a body. The system includes a thermal conditioning mechanism operative to thermally induce a deformation of the body under control of a controller. By means of controllably deforming the body, the shape of the reflective surface can be adjusted in a controlled manner.

公开(公告)号：US20180031979A1

公开(公告)日：2018-02-01

申请号：US15550855

申请日：2016-01-21

Applicant: ASML Netherlands B.V.

Inventor： Arno Jan BLEEKER ,  Ramon Mark HOFSTRA ,  Erik Petrus BUURMAN ,  Johannes Hubertus Josephina MOORS ,  Alexander Matthijs STRUYCKEN ,  Harm-Jan VOORMA ,  Sumant Sukdew Ramanujan OEMRAWSINGH ,  Markus Franciscus Antonius EURLINGS ,  Peter Frans Maria MUYS

IPC: G03F7/20 ,  H01S3/23 ,  H01S3/00 ,  H05G2/00 ,  G02B27/14

CPC classification number: G03F7/70033 ,  G02B27/141 ,  G03F7/70025 ,  G03F7/70566 ,  H01S3/0064 ,  H01S3/2308 ,  H01S3/2316 ,  H05G2/005 ,  H05G2/008

Abstract: A laser radiation source for a lithographic tool comprising a laser module to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength, a beam separation device to separate the optical paths of the first and second laser beams and substantially recombine the optical paths, a beam delivery system to direct the first and second laser beams to a fuel target and an optical isolation apparatus to: adjust the polarization state of the first laser beam, adjust the polarization state of the second laser beam and to block radiation having the adjusted polarization states such that the reflection of the first laser beam and the reflection of the second laser beam are substantially blocked from propagating towards the laser module.