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公开(公告)号：WO2021239382A1
公开(公告)日：2021-12-02
申请号：PCT/EP2021/061258
申请日：2021-04-29
Applicant: ASML NETHERLANDS B.V.
Inventor： SWERDLOW, Ethan, Marcus , BESSEMS, David , TEDROW, Jon, David , RAI, Sandeep , CAVALIER, Grant, Steven , DRIESSEN, Theodorus, Wilhelmus , SAMS, Benjamin, Andrew , TREES, Dietmar, Uwe, Herbert , ATENCIO, Edgardo, Zamora , JOHNSON, Brandon, Michael
IPC: H05G2/00
Abstract: Systems, apparatuses, and methods are provided for measuring the level of a radiation fuel in an extreme ultraviolet (EUV) radiation system. In one example, a method for measuring the fuel level includes directing an inspection beam through a fuel tank view port at a top surface of the radiation fuel at a predetermined incident angle. The method can further include receiving 5a portion of the inspection beam reflected by the top surface of the radiation fuel at a sensor located adjacent to the view port. Also, the method can include measuring a distance to the top surface of the radiation fuel, and calculating a fill level of the radiation fuel in the fuel tank based on the measured distance.
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公开(公告)号：WO2020057859A1
公开(公告)日：2020-03-26
申请号：PCT/EP2019/071531
申请日：2019-08-12
Applicant: ASML NETHERLANDS B.V.
Inventor： TEDROW, Jon, David , BESSEMS, David , CHEN, Wei-Hsun
Abstract: A conduit suitable for use in a high temperature, high pressure environment, the conduit having an elongate portion made of a first refractory metal and a fitting portion made of a second refractory metal attached to an axial end of the elongate portion. The attachment may be made by welding and the second refractory metal may have a greater yield strength than the first refractory metal.
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3.发明申请A FLUID HANDLING STRUCTURE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD 审中-公开流体处理结构，光刻设备和设备制造方法
公开(公告)号：WO2016096508A1
公开(公告)日：2016-06-23
申请号：PCT/EP2015/078842
申请日：2015-12-07
Applicant: ASML NETHERLANDS B.V.
Inventor： ROPS, Cornelius, Maria , STALS, Walter, Theodorus, Matheus , BESSEMS, David , GATTOBIGIO, Giovanni, Luca , BLANCO CARBALLO, Victor, Manuel , EUMMELEN, Erik, Henricus, Egidius, Catharina , VAN DER HAM, Ronald , VAN DER ZANDEN, Frederik, Antonius , WERNAART, Wilhelmus, Antonius
CPC classification number: G03B27/52 , B01D19/0005 , B01D19/0021 , G03F7/70341 , G03F7/70716 , G03F7/70775
Abstract: A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO 2 gas so as to provide a substantially pure CO 2 gas environment adjacent to, and radially outward of, the space.
Abstract translation: 一种用于光刻设备的流体处理结构，所述流体处理结构被构造成将浸没流体容纳到一个区域中，所述流体处理结构在一个空间的边界处具有：至少一个气刀开口，其沿径向向外方向 空间; 以及至少一个气体供应开口，所述气体供应开口相对于所述空间在至少气刀开口的径向向外方向上。 气刀开口和气体供应开口都提供基本上纯净的CO 2气体，以提供邻近并且径向向外的基本上纯的CO 2气体环境 空间。
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公开(公告)号：WO2020187617A1
公开(公告)日：2020-09-24
申请号：PCT/EP2020/056144
申请日：2020-03-09
Applicant: ASML NETHERLANDS B.V.
Inventor： GOVINDARAJU, Abhiram, Lakshmi Ganesh , BESSEMS, David , RAI, Sandeep , WILLEMS, Petrus, Adrianus , KINCAL, Serkan , LUKENS, Joshua, Mark , TEDROW, Jon, David
IPC: H05G2/00
Abstract: Provided is an apparatus that includes a first reservoir system including a first fluid reservoir configured to be in fluid communication with a nozzle supply system during operation of the nozzle supply system, a second reservoir system including a second fluid reservoir configured to be, at least part of the time during operation of the nozzle supply system, in fluid communication with the first reservoir system, a priming system configured to produce a fluid target material from a solid matter, and a fluid control system fluidly connected to the priming system, the first reservoir system, the second reservoir system, and the nozzle supply system. The fluid control system is configured to, during operation of the nozzle supply system: isolate at least one fluid reservoir and the nozzle supply system from the priming system, and maintain a fluid flow path between at least one fluid reservoir and the nozzle supply system.
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Patent Agency Ranking5.发明申请
公开(公告)号：WO2019057514A1
公开(公告)日：2019-03-28
申请号：PCT/EP2018/074057
申请日：2018-09-06
Applicant: ASML NETHERLANDS B.V.
Inventor： BESSEMS, David , TEDROW, Jon, David , ODNEAL, Colin, Michael
Abstract: A vessel having a seal that is protected from the liquid material within the vessel by a volume of gas. The vessel has a partition that divides the vessel into two volume spaces such that the seal that is in gaseous communication with the first volume space is protected from the liquid material in the second volume space by a volume of gas in the first volume space.
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公开(公告)号：EP3853512A1
公开(公告)日：2021-07-28
申请号：EP19753328.4
申请日：2019-08-12
Applicant: ASML Netherlands B.V.
Inventor： TEDROW, Jon, David , BESSEMS, David , CHEN, Wei-Hsun
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公开(公告)号：EP4202447A1
公开(公告)日：2023-06-28
申请号：EP21217592.1
申请日：2021-12-23
Applicant: ASML Netherlands B.V.
Inventor： DERKS, Sander, Catharina, Reinier , RIJPMA, Albert, Pieter , BESSEMS, David , KERSSEMAKERS, Sander
Abstract: There is described a liquid metal supply assembly for use in an EUV light source, the assembly comprising: a) a first reservoir configured to hold liquid metal at a first temperature; b) a liquid metal transportation conduit in fluid communication with the first reservoir wherein the liquid metal transportation conduit is configured to be at a second temperature different to the first temperature; c) a temperature sensor configured to measure the temperature of the liquid metal transportation conduit to detect a flow of liquid from the first reservoir through the liquid metal transportation conduit via a change in temperature of the liquid metal transportation conduit. Also described is an EUV light source, a method of detecting flow of a liquid metal, as well as the use thereof.
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公开(公告)号：EP4159009A1
公开(公告)日：2023-04-05
申请号：EP21723675.1
申请日：2021-04-29
Applicant: ASML Netherlands B.V.
Inventor： SWERDLOW, Ethan, Marcus , BESSEMS, David , TEDROW, Jon, David , RAI, Sandeep , CAVALIER, Grant, Steven , DRIESSEN, Theodorus, Wilhelmus , SAMS, Benjamin, Andrew , TREES, Dietmar, Uwe, Herbert , ATENCIO, Edgardo, Zamora , JOHNSON, Brandon, Michael
IPC: H05G2/00
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公开(公告)号：EP3939391A1
公开(公告)日：2022-01-19
申请号：EP20710883.8
申请日：2020-03-09
Applicant: ASML Netherlands B.V.
Inventor： GOVINDARAJU, Abhiram, Lakshmi Ganesh , BESSEMS, David , RAI, Sandeep , WILLEMS, Petrus, Adrianus , KINCAL, Serkan , LUKENS, Joshua, Mark , TEDROW, Jon, David
IPC: H05G2/00
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