公开(公告)号：WO2020182540A1

公开(公告)日：2020-09-17

申请号：PCT/EP2020/055562

申请日：2020-03-03

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DEN EIJNDEN, Pepijn ,  EUMMELEN, Erik, Henricus, Egidius, Catharina ,  KOLDEWEIJ, Robin, Bernardus, Johannes ,  ROPS, Cornelius, Maria ,  ARTS, Petrus, Martinus, Gerardus, Johannes ,  SUBHEDAR, Nupur, Rajan ,  MAESSEN, Johannes

IPC: G03F7/20

Abstract: The present invention provides a device for providing substantially laminar fluid flow in a lithographic apparatus. The device comprises an opening and a channel through which fluid flows to or from the opening, the channel defined within an enclosure formed by at least a first wall and a second wall. The device also comprises a flow laminating portion in the channel configured to provide the substantially laminar fluid flow through the opening. The flow laminating portion may comprise a plurality of pillars, and/or a plurality of sub-channels, and/or a porous layer across the channel.

公开(公告)号：WO2017009393A1

公开(公告)日：2017-01-19

申请号：PCT/EP2016/066691

申请日：2016-07-13

Applicant: ASML NETHERLANDS B.V.

Inventor： ROPS, Cornelius, Maria ,  BOUMAN, Willem, Jan ,  POLET, Theodorus, Wilhelmus

IPC: G03F7/20 ,  G02B27/00

CPC classification number: G03F7/70341 ,  G02B27/0006 ,  G03F7/2041 ,  G03F7/70783 ,  G03F7/70808 ,  G03F7/70891 ,  G03F7/70958 ,  H01L21/0274

Abstract: A lithographic apparatus, a projection system for use with an immersion lithographic apparatus, a last lens element for a projection system, a liquid control member, and a device manufacturing method are disclosed. In one arrangement, a lithographic apparatus comprises a projection system PS) configured to project a patterned radiation beam (B) through the projection system onto a target portion of a substrate (W). A liquid confinement structure (12) confines an immersion liquid in a space (10) between the projection system and the substrate. The projection system comprising: an exit surface (104) through which to project the patterned radiation beam; and a further surface (110) facing the liquid confinement structure. The further surface has a first static receding contact angle with respect to the immersion liquid. The exit surface has a second static receding contact angle with respect to the immersion liquid. The first static receding contact angle is: greater than the second static receding contact angle; and less than 65 degrees.

Abstract translation: 公开了一种光刻设备，用于浸没式光刻设备的投影系统，用于投影系统的最后一个透镜元件，液体控制元件和器件制造方法。 在一种布置中，光刻设备包括投影系统PS），其被配置为将图案化的辐射束（B）通过投影系统投影到基底（W）的目标部分上。 液体限制结构（12）将浸没液体限制在投影系统和基板之间的空间（10）中。 所述投影系统包括：出射表面（104），通过所述出射表面突出所述图案化的辐射束; 和面向液体限制结构的另一表面（110）。 另外的表面相对于浸没液体具有第一静态后退接触角。 出口表面相对于浸没液体具有第二静态后退接触角。 第一个静态后退接触角是：大于第二个静态后退接触角; 小于65度。

公开(公告)号：WO2022111919A1

公开(公告)日：2022-06-02

申请号：PCT/EP2021/079380

申请日：2021-10-22

Applicant: ASML NETHERLANDS B.V.

Inventor： ROPS, Cornelius, Maria ,  EUMMELEN, Erik, Henricus, Egidius, Catharina ,  GATTOBIGIO, Giovanni, Luca ,  BERENDSEN, Christianus, Wilhelmus, Johannes

IPC: G03F7/20

Abstract: Disclosed herein is a fluid handling system for a lithographic apparatus, wherein the fluid handling system is configured to confine immersion liquid to a liquid confinement space between a part of a projection system and a surface of a substrate in the lithographic apparatus whereby a radiation beam projected from the projection system can irradiate the surface of the substrate by passing through the immersion liquid, the fluid handling system comprising: a damper arranged between a first extraction member and a second extraction member both configured to extract fluid; wherein the damper is configured to support a meniscus of the immersion liquid between a surface of the damper and the surface of the substrate.

公开(公告)号：WO2017121547A1

公开(公告)日：2017-07-20

申请号：PCT/EP2016/080228

申请日：2016-12-08

Applicant: ASML NETHERLANDS B.V.

Inventor： EUMMELEN, Erik, Henricus, Egidius, Catharina ,  GATTOBIGIO, Giovanni, Luca ,  MELMAN, Johannes, Cornelis, Paulus ,  LEMPENS, Han, Henricus, Aldegonda ,  YU, Miao ,  ROPS, Cornelius, Maria ,  OLIESLAGERS, Ruud ,  ULUCAN, Artunç ,  POLET, Theodorus, Wilhelmus ,  SPRUYTENBURG, Patrick, Johannes, Wilhelmus

IPC: G03F7/20

CPC classification number: G03F7/70341

Abstract: The present invention relates to a lithographic immersion apparatus comprising a fluid handling structure and a device manufacturing method. In an embodiment, the fluid handling structure is configured to confine immersion fluid to a region and comprises a gas knife system, the gas knife system comprising passages each having an exit, the passages comprising a plurality first passages having a plurality of corresponding first exits, and a plurality of second passages having a plurality of corresponding second exits, wherein at least one first passage and at least one second passage are configured such that the stagnation pressure of gas exiting the first exit is greater than the stagnation pressure of gas exiting the second exit, wherein the plurality of first passages and the plurality of second passages are intermingled and arranged in a line such that the first exits and the second exits form a side of a shape in plan view. In an embodiment, the fluid handling structure is configured to confine immersion fluid to a region and comprising a gas knife in use, the fluid handling structure comprising at least one exit, wherein the at least one exit is arranged so that the gas knife forms a side of a shape in plan view, and the at least one exit has a geometry configured to allow movement of a droplet of immersion fluid from a position radially outward of the gas knife to a position radially inward of the gas knife and configured to restrict movement of a droplet of immersion fluid from a position radially inward of the gas knife to a position radially outward of the gas knife.

Abstract translation: 本发明涉及一种包括流体处理结构和装置制造方法的光刻浸没装置。 在一个实施例中，流体处理结构被构造成将浸没流体限制到区域并且包括气刀系统，气刀系统包括各自具有出口的通路，通路包括具有多个对应的第一出口的多个第一通路， 以及具有多个对应的第二出口的多个第二通道，其中至少一个第一通道和至少一个第二通道被构造成使得离开第一出口的气体的滞止压力大于离开第二出口的气体的滞止压力 其中所述多个第一通道和所述多个第二通道相互混合并排列成一行，使得所述第一出口和所述第二出口在平面图中形成形状的一侧。 在一个实施例中，流体处理结构被构造成将浸没流体限制在区域中并且包括使用中的气刀，流体处理结构包括至少一个出口，其中该至少一个出口被布置为使得气刀形成 并且所述至少一个出口具有几何形状，所述几何形状构造成允许浸没流体的液滴从气刀的径向外部的位置移动到气刀的径向内部的位置并且被配置为限制运动 从气刀的径向内侧的位置到气刀的径向外侧的位置处的浸没流体的液滴的一部分。

公开(公告)号：WO2016096508A1

公开(公告)日：2016-06-23

申请号：PCT/EP2015/078842

申请日：2015-12-07

Applicant: ASML NETHERLANDS B.V.

Inventor： ROPS, Cornelius, Maria ,  STALS, Walter, Theodorus, Matheus ,  BESSEMS, David ,  GATTOBIGIO, Giovanni, Luca ,  BLANCO CARBALLO, Victor, Manuel ,  EUMMELEN, Erik, Henricus, Egidius, Catharina ,  VAN DER HAM, Ronald ,  VAN DER ZANDEN, Frederik, Antonius ,  WERNAART, Wilhelmus, Antonius

IPC: G03F7/20 ,  B01D19/00

CPC classification number: G03B27/52 ,  B01D19/0005 ,  B01D19/0021 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70775

Abstract: A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO 2 gas so as to provide a substantially pure CO 2 gas environment adjacent to, and radially outward of, the space.

Abstract translation: 一种用于光刻设备的流体处理结构，所述流体处理结构被构造成将浸没流体容纳到一个区域中，所述流体处理结构在一个空间的边界处具有：至少一个气刀开口，其沿径向向外方向 空间; 以及至少一个气体供应开口，所述气体供应开口相对于所述空间在至少气刀开口的径向向外方向上。 气刀开口和气体供应开口都提供基本上纯净的CO 2气体，以提供邻近并且径向向外的基本上纯的CO 2气体环境 空间。

公开(公告)号：WO2016000903A1

公开(公告)日：2016-01-07

申请号：PCT/EP2015/062525

申请日：2015-06-04

Applicant: ASML NETHERLANDS B.V.

Inventor： PIETERSE, Gerben ,  POLET, Theodorus, Wilhelmus ,  BASELMANS, Johannes, Jacobus, Matheus ,  BOUMAN, Willem, Jan ,  MODDERMAN, Theodorus, Marinus ,  ROPS, Cornelius, Maria ,  SMEETS, Bart ,  STEFFENS, Koen ,  VAN DER HAM, Ronald

IPC: G03F7/20

CPC classification number: G03F7/70891 ,  G03F7/70341

Abstract: An immersion lithographic apparatus comprising: a projection system for projecting a patterned radiation beam through an optically active part of a final lens element of the projection system towards a substrate supported by a substrate table, the final lens element having an exposed bottom surface; a liquid confinement structure configured to supply and confine immersion liquid to an immersion space between the final lens element of the projection system and a surface formed of at least one of the substrate and substrate table; and a passageway-former between the projection system and the liquid confinement structure, and a passageway between the passageway-former and the optically active part of the final lens element, the passageway being in liquid communication via an opening with the immersion space and extending radially outwardly with respect to an optical axis of the projection system at least to an edge of the exposed bottom surface of the final lens element and being constructed and configured such that in use it is filled with liquid from the immersion space by capillary action.

Abstract translation: 一种浸没式光刻设备，包括：投影系统，用于将图案化的辐射束通过投影系统的最终透镜元件的光学活性部分朝向由衬底台支撑的衬底投射，最终透镜元件具有暴露的底表面; 液体限制结构，被配置为将浸没液体供应并限制在投影系统的最终透镜元件与由至少一个基板和基板台形成的表面之间的浸没空间中; 以及在所述投影系统和所述液体限制结构之间的通道形成器以及所述通道形成器和所述最终透镜元件的光学活性部分之间的通道，所述通道经由具有所述浸没空间的开口与所述浸没空间液体连通并且径向延伸 至少相对于最终透镜元件的暴露的底部表面的边缘而相对于投影系统的光轴向外侧并且被构造和构造使得在使用中通过毛细管作用从浸没空间填充液体。

公开(公告)号：WO2016000883A1

公开(公告)日：2016-01-07

申请号：PCT/EP2015/062055

申请日：2015-06-01

Applicant: ASML NETHERLANDS B.V.

Inventor： GATTOBIGIO, Giovanni, Luca ,  EUMMELEN, Erik, Henricus, Egidius, Catharina ,  OLIESLAGERS, Ruud ,  PIETERSE, Gerben ,  ROPS, Cornelius, Maria ,  VAN BOKHOVEN, Laurentius, Johannes, Adrianus

IPC: G03F7/20

CPC classification number: G03F7/70891 ,  G03F7/70341 ,  G03F7/709

Abstract: A lithographic apparatus comprising a projection system for projecting a patterned radiation beam onto a substrate and a fluid confinement structure configured to confine immersion fluid in a localized region between a final element of the projection system and a surface of the substrate. The lithographic apparatus is configured to have a space bounded on one side by a surface of at least one of the projection system and a component of the lithographic apparatus at least partially surrounding the final element of the projection system and on the other side by a surface of the fluid confinement structure. The apparatus is configured to maximize the humidity of the gas within the space.

Abstract translation: 一种光刻设备，包括用于将图案化的辐射束投影到衬底上的投影系统和被配置为将浸没流体限制在投影系统的最终元件与衬底的表面之间的局部区域中的流体限制结构。 光刻设备被配置为具有在一侧的边界，所述空间由至少一个投影系统和光刻设备的部件的表面至少部分地围绕投影系统的最终元件，另一侧由表面 的流体限制结构。 该装置被配置为使空间内的气体的湿度最大化。

公开(公告)号：WO2015193036A1

公开(公告)日：2015-12-23

申请号：PCT/EP2015/060427

申请日：2015-05-12

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN BEUZEKOM, Aart, Adrianus ,  ALBERTI, Jozef, Augustinus, Maria ,  SEGERS, Hubert, Marie ,  VAN DER HAM, Ronald ,  FAHRNI, Francis ,  OLIESLAGERS, Ruud ,  PIETERSE, Gerben ,  ROPS, Cornelius, Maria ,  VAN DEN EIJNDEN, Pepijn ,  VAN DONGEN, Paul ,  WILLEMS, Bas

IPC: G03F7/20

CPC classification number: G03F7/7075 ,  G03F7/70341 ,  G03F7/70991

Abstract: A lithographic apparatus comprises a substrate table, post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is for handling the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a wafer handler.

Abstract translation: 光刻设备包括基板台，曝光后处理模块，基板处理机器人和干燥台。 衬底台被配置为支撑用于曝光过程的衬底。 后曝光处理模块用于处理基板曝光后。 衬底处理机器人被配置为沿着衬底卸载路径将衬底从衬底台转移到后曝光处理模块中。 干燥站构造成主动地从基板的表面移除液体。 干燥站位于基板卸载路径中。 干燥站位于曝光后处理模块中。 后曝光处理模块可以是晶片处理器。

公开(公告)号：WO2022012830A1

公开(公告)日：2022-01-20

申请号：PCT/EP2021/065976

申请日：2021-06-14

Applicant: ASML NETHERLANDS B.V.

Inventor： ROPS, Cornelius, Maria ,  BERENDSEN, Christianus, Wilhelmus, Johannes ,  EUMMELEN, Erik, Henricus, Egidius, Catharina ,  WISMEIJER, Dagmar, Antoinette

IPC: G03F7/20 ,  B06B1/00

Abstract: A lithographic apparatus has a substrate holder configured to hold a substrate and a projection system configured to project a radiation beam onto the substrate held by the substrate holder. There is also a fluid handling system configured to confine immersion liquid to a space between a part of the projection system and a surface of the substrate whereby the radiation beam can irradiate the surface of the substrate by passing through the immersion liquid. An excitation device is provided to generate surface acoustic waves in the substrate and propagating toward the immersion liquid.

公开(公告)号：WO2018192710A1

公开(公告)日：2018-10-25

申请号：PCT/EP2018/055872

申请日：2018-03-09

Applicant: ASML NETHERLANDS B.V.

Inventor： GATTOBIGIO, Giovanni, Luca ,  BANERJEE, Nirupam ,  BECKERS, Johan, Franciscus, Maria ,  EUMMELEN, Erik, Henricus, Egidius, Catharina ,  KOX, Ronald, Frank ,  POLET, Theodorus, Wilhelmus ,  ROPS, Cornelius, Maria ,  VAN GILS, Mike, Paulus, Johannes ,  VAN SLUISVELD, Wouterus, Jozephus, Johannes

IPC: G03F7/20

Abstract: A method of performance testing working parameters of a fluid handing structure (12) in an immersion lithographic apparatus, the method comprising: placing a test substrate (TW) comprising an upper surface with a first portion (300) with a resist defining the upper surface and a second portion (310) with a material different from the resist defining the rest of the upper surface on a table in the immersion lithographic apparatus, confining liquid on a region of an upper surface of the table and/or the upper surface of the test substrate by operating the fluid handing structure using the associated working parameters, moving the table such that the region moves from the second portion to the first portion; detecting change to and/or residue on the first portion as a result of liquid being left behind on the first portion during the moving.