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公开(公告)号：US20230124558A1
公开(公告)日：2023-04-20
申请号：US17909751
申请日：2021-02-24
Applicant: ASML Netherlands B.V.
Inventor： Johannes Cornelis Jacobus DE LANGEN , Dmitry MUDRETSOV , Dongbin CAI
Abstract: An improved electron beam manipulator for manipulating an electron beam in an electron projection system and a method for manufacturing thereof are disclosed. The electron beam manipulator comprises a body having a first surface and a second surface opposing to the first surface and an interconnecting surface extending between the first surface and the second surface and forming an aperture through the body. The body comprises an electrode forming at least part of the interconnecting surface between the first surface and the second surface.
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