公开(公告)号：WO2021160365A1

公开(公告)日：2021-08-19

申请号：PCT/EP2021/050615

申请日：2021-01-14

Applicant: ASML NETHERLANDS B.V.

Inventor： WILDENBERG, Jochem, Sebastiaan ,  DILLEN, Hermanus, Adrianus ,  FENG, Fan ,  VAN ITTERSUM, Ronald ,  VAN MIERLO, Willem, Louis ,  THUIJS, Koen

IPC: G03F7/20

Abstract: Disclosed is a method and associated apparatuses for controlling a process of manufacturing semiconductor devices on a substrate. The method comprises obtaining process data relating to the process and determining a correction for the process based on the process data and a first control objective associated with the devices on the substrate. A first probability of the first control objective being achievable is determined and the correction adjusted based on said probability and at least a second control objective having a second probability of being achievable compared to the first control objective.

公开(公告)号：EP4104018A1

公开(公告)日：2022-12-21

申请号：EP21700709.5

申请日：2021-01-14

Applicant: ASML Netherlands B.V.

Inventor： WILDENBERG, Jochem, Sebastiaan ,  DILLEN, Hermanus, Adrianus ,  FENG, Fan ,  VAN ITTERSUM, Ronald ,  VAN MIERLO, Willem, Louis ,  THUIJS, Koen

IPC: G03F7/20

公开(公告)号：EP3869271A1

公开(公告)日：2021-08-25

申请号：EP20158387.9

申请日：2020-02-20

Applicant: ASML Netherlands B.V.

Inventor： WILDENBERG, Jochem, Sebastiaan ,  DILLEN, Hermanus, Adrianus ,  FENG, Fan

IPC: G03F7/20

Abstract: Disclosed is a method and associated apparatuses for controlling a process of manufacturing semiconductor devices on a substrate. The method comprises obtaining process data relating to the process and determining a correction for the process based on the data and a first control objective associated with the devices on the substrate. A first probability of the first control objective being achievable is determined and the correction adjusted based on said probability and at least a second control objective having a second probability of being achievable compared to the first control objective.