公开(公告)号：WO2019110238A1

公开(公告)日：2019-06-13

申请号：PCT/EP2018/080708

申请日：2018-11-09

Applicant: ASML NETHERLANDS B.V.

Inventor： WERKMAN, Roy ,  RAJASEKHARAN, Bijoy ,  VERGAIJ-HUIZER, Lydia, Marianna ,  WILDENBERG, Jochem, Sebastiaan ,  VAN ITTERSUM, Ronald ,  SMORENBERG, Pieter, Gerardus, Jacobus ,  VAN DER HEIJDEN, Robertus, Wilhelmus ,  WEI, Xiuhong ,  YAGUBIZADE, Hadi

IPC: G03F7/20

Abstract: Disclosed is s method for determining a plurality of corrections for control of at least one manufacturing apparatus used in a manufacturing process for providing product structures to a substrate in a plurality of layers, the method comprising: determining the plurality of corrections comprising a correction for each layer, based on an actuation potential of the applicable manufacturing apparatus used in the formation of each layer, wherein said determining step comprises determining corrections for each layer simultaneously in terms of a matching parameter.

公开(公告)号：WO2022161726A1

公开(公告)日：2022-08-04

申请号：PCT/EP2021/087611

申请日：2021-12-23

Applicant: ASML NETHERLANDS B.V.

Inventor： THEEUWES, Thomas ,  WILDENBERG, Jochem, Sebastiaan ,  ZHANG, Lei ,  VAN ITTERSUM, Ronald

IPC: G03F7/20

Abstract: Disclosed is a method of determining a performance parameter or a parameter derived therefrom, the performance parameter being associated with a performance of a lithographic process for forming one or more structures on a substrate subject to the lithographic process. The method comprises obtaining a probability description distribution comprising a plurality of probability descriptions of the performance parameter, each probability description corresponding to a different position on the substrate and decomposing each probability description into a plurality of component probability descriptions to obtain a plurality of component probability description distributions. A component across-substrate-area model is determined for each of said plurality of component probability descriptions, which models its respective component probability description across a substrate area; and a value for said performance parameter or parameter derived therefrom is determined based on the component across-substrate-area models.

公开(公告)号：WO2021160365A1

公开(公告)日：2021-08-19

申请号：PCT/EP2021/050615

申请日：2021-01-14

Applicant: ASML NETHERLANDS B.V.

Inventor： WILDENBERG, Jochem, Sebastiaan ,  DILLEN, Hermanus, Adrianus ,  FENG, Fan ,  VAN ITTERSUM, Ronald ,  VAN MIERLO, Willem, Louis ,  THUIJS, Koen

IPC: G03F7/20

Abstract: Disclosed is a method and associated apparatuses for controlling a process of manufacturing semiconductor devices on a substrate. The method comprises obtaining process data relating to the process and determining a correction for the process based on the process data and a first control objective associated with the devices on the substrate. A first probability of the first control objective being achievable is determined and the correction adjusted based on said probability and at least a second control objective having a second probability of being achievable compared to the first control objective.

公开(公告)号：EP3495889A1

公开(公告)日：2019-06-12

申请号：EP17205900.8

申请日：2017-12-07

Applicant: ASML Netherlands B.V.

Inventor： WERKMAN, Roy ,  RAJASEKHARAN, Bijoy ,  VERGAIJ-HUIZER, Lydia Marianna ,  WILDENBERG, Jochem Sebastiaan ,  VAN ITTERSUM, Ronald

IPC: G03F7/20

Abstract: Disclosed is a method for determining a plurality of corrections for control of at least one manufacturing apparatus used in a manufacturing process for providing product structures to a substrate in a plurality of layers. The method comprises determining (e.g., optimizing simultaneously) the plurality of corrections comprising a correction for each layer, based on an actuation potential of the applicable manufacturing apparatus used in the formation of each layer. The method may also take into account the allowed a process window for each layer.

公开(公告)号：EP4104018A1

公开(公告)日：2022-12-21

申请号：EP21700709.5

申请日：2021-01-14

Applicant: ASML Netherlands B.V.

Inventor： WILDENBERG, Jochem, Sebastiaan ,  DILLEN, Hermanus, Adrianus ,  FENG, Fan ,  VAN ITTERSUM, Ronald ,  VAN MIERLO, Willem, Louis ,  THUIJS, Koen

IPC: G03F7/20

公开(公告)号：EP4036646A1

公开(公告)日：2022-08-03

申请号：EP21154358.2

申请日：2021-01-29

Applicant: ASML Netherlands B.V.

Inventor： THEEUWES, Thomas ,  WILDENBERG, Jochem, Sebastiaan ,  ZHANG, Lei ,  VAN ITTERSUM, Ronald

IPC: G03F7/20

Abstract: Disclosed is a method of determining a performance parameter or a parameter derived therefrom, the performance parameter being associated with a performance of a lithographic process for forming one or more structures on a substrate subject to the lithographic process. The method comprises obtaining a probability description distribution comprising a plurality of probability descriptions of the performance parameter, each probability description corresponding to a different position on the substrate and decomposing each probability description into a plurality of component probability descriptions to obtain a plurality of component probability description distributions. A component across-substrate-area model is determined for each of said plurality of component probability descriptions, which models its respective component probability description across a substrate area; and a value for said performance parameter or parameter derived therefrom is determined based on the component across-substrate-area models.

公开(公告)号：EP4285186A1

公开(公告)日：2023-12-06

申请号：EP21844025.3

申请日：2021-12-23

Applicant: ASML Netherlands B.V.

Inventor： THEEUWES, Thomas ,  WILDENBERG, Jochem, Sebastiaan ,  ZHANG, Lei ,  VAN ITTERSUM, Ronald

IPC: G03F7/20